Super-hard nanocomposite coatings have been received a great attention during recent years. Based on our previous investigations onto the several super-hard nanocomposite coating systems including nc-TiN/a-Si3N4, nc-T...Super-hard nanocomposite coatings have been received a great attention during recent years. Based on our previous investigations onto the several super-hard nanocomposite coating systems including nc-TiN/a-Si3N4, nc-TiN/a-BN. This paper reports on the nc-(Ti1.xAlxN)/a-Si3N4 nanocomposite coatings prepared by direct current plasma enhanced chemical vapor deposition (PECVD). And the effect of aluminum contents on the microstructure and hardness of the coatings have been mainly investigated. The coatings were characterized by means of X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) equipped with energy dispersive analysis of X-rays (EDX), and the hardness measurements were done by means of the automated load-depth sensing technique using Vickers diamond indenter. The thermal stability of nanocomposite coatings of TiN/a-Si3N4 was evaluated by annealing at elevated temperatures up to 1000°C. The results shows that super hardness of nc-(Ti|_xAlxN)/a-Si3N4 could be obtained with a wide aluminum content from 10at.% to 86at.% in (Ti^AlJN phase, while the silicon content can be kept at 4-5 at.%. These nanocomposite coatings shows a relatively better thermal stability of nanocrystallite size and therefore high hardness up to 1000°C, which further support our earlier concept for the design of super-hard nanocomposite coatings. These results are suggested mainly due to the formation of nanostructure, and this indicates that the aluminum has also the role of controlling the crystallite size within nc-(Ti1.xAlIN)/a-Si3N4 besides its known well property of the super anti-oxidation.展开更多
ZrO2 thin films were deposited by r.f. reactive unbalanced magnetron sputtering. The influence of electromagnetic coil current on microstructure and optical properties of the films was investigated. At low coil curren...ZrO2 thin films were deposited by r.f. reactive unbalanced magnetron sputtering. The influence of electromagnetic coil current on microstructure and optical properties of the films was investigated. At low coil current of 0.2A, small grains are produced. With the increase of coil current, the deposition rate and surface roughness are decreased and the packing density in proportion to the refractive index is increased remarkably. The refractive index is as high as 2.236 (at X=600nm) at 0.4A. At the high coil current of 0.6A, grains appear to grow up due to thermal effects and therefore optical properties of the films are deteriorated a little.展开更多
Zr-Si-N films were deposited by RF magnetron sputtering (MS) technique. A Cu film on the top of Zr-Si-N films was prepared by DC pulsed magnetron sputtering. The Cu/Zr-Si-N systems were annealed in vacuum and N2/H2 ga...Zr-Si-N films were deposited by RF magnetron sputtering (MS) technique. A Cu film on the top of Zr-Si-N films was prepared by DC pulsed magnetron sputtering. The Cu/Zr-Si-N systems were annealed in vacuum and N2/H2 gas mixture at 800°C, respectively. The structure of the films were characterized by X-ray diffraction (XRD), Auger electron spectroscopy (AES) and four-point probe method. The sheet resistances of the Cu/Zr-Si-N/Si contact systems annealed in N2/H2 gas mixture were lower than those of the specimens annealed in vacuum at 800°C. The residual oxygen contamination from vacuum annealing ambience influences the sheet resistances of the Cu/Zr-Si-N/Si contact systems due to residual oxygen contamination and/or voids in Cu films. Though thermal stabilities of the Cu/Zr-Si-N/Si systems were maintained up to 800°C when annealed in vacuum and N2/H2 gas mixture, the changes of thermal stability of specimens were noticeable. The vacuum can accelerate the oxidation and decomposition of Zr-Si-N barrier. On the contrary, N2/H2 gas mixture prevent from the Zr-Si-N barrier oxidation and decomposition.展开更多
基金supports of National High-Tech ProgramNational Natural Science Foundation of China are greatly acknowledged under grant number 2001AA338010,50271053 and 50371067.
文摘Super-hard nanocomposite coatings have been received a great attention during recent years. Based on our previous investigations onto the several super-hard nanocomposite coating systems including nc-TiN/a-Si3N4, nc-TiN/a-BN. This paper reports on the nc-(Ti1.xAlxN)/a-Si3N4 nanocomposite coatings prepared by direct current plasma enhanced chemical vapor deposition (PECVD). And the effect of aluminum contents on the microstructure and hardness of the coatings have been mainly investigated. The coatings were characterized by means of X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) equipped with energy dispersive analysis of X-rays (EDX), and the hardness measurements were done by means of the automated load-depth sensing technique using Vickers diamond indenter. The thermal stability of nanocomposite coatings of TiN/a-Si3N4 was evaluated by annealing at elevated temperatures up to 1000°C. The results shows that super hardness of nc-(Ti|_xAlxN)/a-Si3N4 could be obtained with a wide aluminum content from 10at.% to 86at.% in (Ti^AlJN phase, while the silicon content can be kept at 4-5 at.%. These nanocomposite coatings shows a relatively better thermal stability of nanocrystallite size and therefore high hardness up to 1000°C, which further support our earlier concept for the design of super-hard nanocomposite coatings. These results are suggested mainly due to the formation of nanostructure, and this indicates that the aluminum has also the role of controlling the crystallite size within nc-(Ti1.xAlIN)/a-Si3N4 besides its known well property of the super anti-oxidation.
基金supported by the“985”program of the Ministry of Education
文摘ZrO2 thin films were deposited by r.f. reactive unbalanced magnetron sputtering. The influence of electromagnetic coil current on microstructure and optical properties of the films was investigated. At low coil current of 0.2A, small grains are produced. With the increase of coil current, the deposition rate and surface roughness are decreased and the packing density in proportion to the refractive index is increased remarkably. The refractive index is as high as 2.236 (at X=600nm) at 0.4A. At the high coil current of 0.6A, grains appear to grow up due to thermal effects and therefore optical properties of the films are deteriorated a little.
基金the Natural Science Foundation of China for its financial support under the granted No.59931010
文摘Zr-Si-N films were deposited by RF magnetron sputtering (MS) technique. A Cu film on the top of Zr-Si-N films was prepared by DC pulsed magnetron sputtering. The Cu/Zr-Si-N systems were annealed in vacuum and N2/H2 gas mixture at 800°C, respectively. The structure of the films were characterized by X-ray diffraction (XRD), Auger electron spectroscopy (AES) and four-point probe method. The sheet resistances of the Cu/Zr-Si-N/Si contact systems annealed in N2/H2 gas mixture were lower than those of the specimens annealed in vacuum at 800°C. The residual oxygen contamination from vacuum annealing ambience influences the sheet resistances of the Cu/Zr-Si-N/Si contact systems due to residual oxygen contamination and/or voids in Cu films. Though thermal stabilities of the Cu/Zr-Si-N/Si systems were maintained up to 800°C when annealed in vacuum and N2/H2 gas mixture, the changes of thermal stability of specimens were noticeable. The vacuum can accelerate the oxidation and decomposition of Zr-Si-N barrier. On the contrary, N2/H2 gas mixture prevent from the Zr-Si-N barrier oxidation and decomposition.
