A new method was used to prepare erbium-doped high silica （SiO2 % 〉 96 % ） glasses by sintering nanoporous glasses. The concentration of erbium ions in high silica glasses can be considerably more than that in sili...A new method was used to prepare erbium-doped high silica （SiO2 % 〉 96 % ） glasses by sintering nanoporous glasses. The concentration of erbium ions in high silica glasses can be considerably more than that in silica glasses prepared by using conventional methods. The fluorescence of 1532 nm has an FWHM （Full Wave at Half Maximum） of 50 nm, wider than 35 nm of EDSFA （erbium-doped silica fiber amplifer）, and hence the glass possesses potential application in broadband fiber amplifiers. The Judd-Ofelt theoretical analysis reflects that the quantum efficiency of this erbium-doped glass is about 0.78, although the erbium concentration in this glass （6 × 10^3） is about twenty times higher than that in silica glass. These excellent characteristics of Er-doped high silica glass will be conducive to its usage in optical amplifiers and microchip lasers.展开更多
A method to fabricate europium ions doped-high silica glass for transparent fluorescence materials based on the fabrication and sintering technique of nano-porous silica glass was reported. Glasses impregnated with Eu...A method to fabricate europium ions doped-high silica glass for transparent fluorescence materials based on the fabrication and sintering technique of nano-porous silica glass was reported. Glasses impregnated with Eu ions and sintered at above 1150℃in a reduction atmosphere show a very strong blue light from an emission band at about 430 nm due to the 4f65d→4f7(8S7/2) transition of the Eu2+ ions. On the other hand, the Eu-doped glass obtained by co-impregnated with Y3+ and V5+ ions and sintering in oxidation atmosphere behaves a very strong red emission band at about 615 nm with a UV excitation. An appearance of vanadate band in the excitation spectrum of Eu3+ , Y3+ .and V5+ ions co-doped high silica glass implies an effective energy transferring from VO43- to Eu3+ and effective excitation of Eu3+ by about 500 nm strong broad emission of VO43- .展开更多
A new kind of Nd^3＋-doped high silica glass （SiO2 〉 96% （mass fraction）） was obtained by sintering porous glass impregnated with Nd^3 ＋ ions. The absorption and luminescence properties of high silica glass dope...A new kind of Nd^3＋-doped high silica glass （SiO2 〉 96% （mass fraction）） was obtained by sintering porous glass impregnated with Nd^3 ＋ ions. The absorption and luminescence properties of high silica glass doped with different Nd^3 ＋ concentrations were studied. The intensity parameters Ωt （t = 2, 4, 6）, spontaneous emission probability, fluorescence lifetime, radiative quantum efficiency, fluorescence branching ratio, and stimulated emission cross section were calculated using the Judd-Ofelt theory. The optimal Nd^3＋ concentration in high silica glass was 0.27% （mole fraction） because of its high quantum efficiency and emission intensity. By comparing the spectroscopic parameters with other Nd^3 ＋- doped oxide glasses and commercial silicate glasses, the Nd^3 ＋ -doped high silica glasses are likely to be a promising material used for high power and high repetition rate lasers.展开更多
基金Project supported bythe National Natural Science Foundation of China (50125258 and 60377040)
文摘A new method was used to prepare erbium-doped high silica （SiO2 % 〉 96 % ） glasses by sintering nanoporous glasses. The concentration of erbium ions in high silica glasses can be considerably more than that in silica glasses prepared by using conventional methods. The fluorescence of 1532 nm has an FWHM （Full Wave at Half Maximum） of 50 nm, wider than 35 nm of EDSFA （erbium-doped silica fiber amplifer）, and hence the glass possesses potential application in broadband fiber amplifiers. The Judd-Ofelt theoretical analysis reflects that the quantum efficiency of this erbium-doped glass is about 0.78, although the erbium concentration in this glass （6 × 10^3） is about twenty times higher than that in silica glass. These excellent characteristics of Er-doped high silica glass will be conducive to its usage in optical amplifiers and microchip lasers.
基金Project supported by Shanghai Nanotechnology Promotion Center (0352nm042)
文摘A method to fabricate europium ions doped-high silica glass for transparent fluorescence materials based on the fabrication and sintering technique of nano-porous silica glass was reported. Glasses impregnated with Eu ions and sintered at above 1150℃in a reduction atmosphere show a very strong blue light from an emission band at about 430 nm due to the 4f65d→4f7(8S7/2) transition of the Eu2+ ions. On the other hand, the Eu-doped glass obtained by co-impregnated with Y3+ and V5+ ions and sintering in oxidation atmosphere behaves a very strong red emission band at about 615 nm with a UV excitation. An appearance of vanadate band in the excitation spectrum of Eu3+ , Y3+ .and V5+ ions co-doped high silica glass implies an effective energy transferring from VO43- to Eu3+ and effective excitation of Eu3+ by about 500 nm strong broad emission of VO43- .
基金Project supported bythe National Natural Science Foundation of China (50125258 and 60377040) ,the Shanghai Nano-TechPromote Center (0352nm042)
文摘A new kind of Nd^3＋-doped high silica glass （SiO2 〉 96% （mass fraction）） was obtained by sintering porous glass impregnated with Nd^3 ＋ ions. The absorption and luminescence properties of high silica glass doped with different Nd^3 ＋ concentrations were studied. The intensity parameters Ωt （t = 2, 4, 6）, spontaneous emission probability, fluorescence lifetime, radiative quantum efficiency, fluorescence branching ratio, and stimulated emission cross section were calculated using the Judd-Ofelt theory. The optimal Nd^3＋ concentration in high silica glass was 0.27% （mole fraction） because of its high quantum efficiency and emission intensity. By comparing the spectroscopic parameters with other Nd^3 ＋- doped oxide glasses and commercial silicate glasses, the Nd^3 ＋ -doped high silica glasses are likely to be a promising material used for high power and high repetition rate lasers.
