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TRANSMISSION ELECTRON MICROSCOPY INVESTIGATIONS OF LOW-PRESSURE CVD GROWTH AND STRAIN RELAXATION OF Ge ISLANDS ON Si(110)
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作者 E.Spiecker L.Zhang +2 位作者 H.M.Lu W.Jaeger L.Vescan 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2005年第3期427-432,共6页
Shapes, dimensions, arrangements and the microstructure of self-assembled island s fabricated by low-pressure chemical vapour deposition (LPCVD) of Ge at 700℃ o nto Si(110) substrates have been investigated for diffe... Shapes, dimensions, arrangements and the microstructure of self-assembled island s fabricated by low-pressure chemical vapour deposition (LPCVD) of Ge at 700℃ o nto Si(110) substrates have been investigated for different nominal Ge coverage by transmission electron microscopy (TEM) of plan-view and cross-section specime ns and have been compared with photoluminescence (PL) measurements of Si-capped layer samples. The transition from the 2-dimensional layer to the 3-dimensional island growth mode takes place for a Ge deposition of nominally less than 2 mono layers. Upon this transition, many coherent islands and few larger islands with extended defects are observed. The coherent islands possess a dome-like shape an d lateral sizes up to 130nm. Photoluminescence spectra show island-related peaks whose energy positions are shifted towards lower energy with higher Ge coverage . 展开更多
关键词 Si-Ge heteroepitaxy surface transmission electron microscopy NANOSTRUCTURE
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