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Lorentz Force Velocimetry for Poorly Conducting Fluids-Development and Validation of a Novel Flow Rate Measurement Device
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作者 WEGFRASS Andre RESAGK Christian +4 位作者 DIETHOLD Christian FRHLICH Thomas WERNER Michael HALBEDEL Bernd THESS Andre 《Journal of Iron and Steel Research International》 SCIE EI CAS CSCD 2012年第S2期613-616,共4页
The paper demonstrated the feasibility of Lorentz Force Velocimetry for flow rate measurements of weakly conducting electrolytes using experimental results on salt water flow exposed to a permanent magnet system.This ... The paper demonstrated the feasibility of Lorentz Force Velocimetry for flow rate measurements of weakly conducting electrolytes using experimental results on salt water flow exposed to a permanent magnet system.This innovative flow measurement technique allows the non-contact determination of flow rates and relies on the interaction between a magnetic field and a moving conducting fluid.When an electrically conducting fluid moves through the magnetic field a Lorentz force is generated and acts on the measurement system.The present report provides an overview about the experimental setups and the first measurement results. 展开更多
关键词 Lorentz force velocimetry flow measurement electrolytes non-contact measurement
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Fundamental Investigations in the Design of Five-Axis Nanopositioning Machines for Measurement and Fabrication Purposes
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作者 Ralf Schienbein Florian Fern +3 位作者 Rene Theska Shraddha Supreeti Roland FuBl Eberhard Manske 《Nanomanufacturing and Metrology》 2021年第3期156-164,共9页
The majority of nanopositioning and nanomeasuring machines(NPMMs)are based on three independent linear movements in a Cartesian coordinate system.This in combination with the specific nature of sensors and tools limit... The majority of nanopositioning and nanomeasuring machines(NPMMs)are based on three independent linear movements in a Cartesian coordinate system.This in combination with the specific nature of sensors and tools limits the addressable part geometries.An enhancement of an NPMM is introduced by the implementation of rotational movements while keeping the precision in the nanometer range.For this purpose,a parameter-based dynamic evaluation system with quantifiable technological parameters has been set up and employed to identify and assess general solution concepts and adequate substructures.Evaluations taken show high potential for three linear movements of the object in combination with two angular movements of the tool.The influence of the additional rotation systems on the existing structure of NPMMs has been investigated further on.Test series on the repeatability of an NPMM enhanced by a chosen combination of a rotary stage and a goniometer setup are realized.As a result of these test series,the necessity of in situ position determination of the tool became very clear.The tool position is measured in situ in relation to a hemispherical reference mirror by three Fabry-Perot interferometers.FEA optimization has been used to enhance the overall system structure with regard to reproducibility and long-term stability.Results have been experimentally investigated by use of a retroreflector as a tool and the various laser interferometers of the NPMM.The knowledge gained has been formed into general rules for the verification and optimization of design solutions for multiaxial nanopositioning machines. 展开更多
关键词 Multiaxial nanopositioning and nanomanufacturing Ultra-precision machine designs 5-Axis operation Ultraprecision rotations
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Tip-and Laser-based 3D Nanofabrication in Extended Macroscopic Working Areas
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作者 Ingo Ortlepp Thomas Frohlich +26 位作者 Roland FuBl Johann Reger Christoph Schaffel Stefan Sinzinger Steffen Strehle ReneTheska Lena Zentner Jens-Peter Zollner Ivo WRangelow Carsten Reinhardt Tino Hausotte Xinrui Cao Oliver Dannberg Florian Fern David Fischer Stephan Gorges Martin Hofmann Johannes Kirchner Andreas Meister Taras Sasiuk Ralf Schienbein Shraddha Supreeti Laura Mohr-Weidenfeller Christoph Weise Christoph Reuter Jaqueline Stauffenberg Eberhard Manske 《Nanomanufacturing and Metrology》 2021年第3期132-148,共17页
The field of optical lithography is subject to intense research and has gained enormous improvement.However,the effort necessary for creating structures at the size of 20 nm and below is considerable using conventiona... The field of optical lithography is subject to intense research and has gained enormous improvement.However,the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional technologies.This effort and the resulting financial requirements can only be tackled by few global companies and thus a paradigm change for the semiconductor industry is conceivable:custom design and solutions for specific applications will dominate future development(Fritze in:Panning EM,Liddle JA(eds)Novel patterning technologies.International society for optics and photonics.SPIE,Bellingham,2021.https://doi.org/10.1117/12.2593229).For this reason,new aspects arise for future lithography,which is why enormous effort has been directed to the development of alternative fabrication technologies.Yet,the technologies emerging from this process,which are promising for coping with the current resolution and accuracy challenges,are only demonstrated as a proof-of-concept on a lab scale of several square micrometers.Such scale is not adequate for the requirements of modern lithography;therefore,there is the need for new and alternative cross-scale solutions to further advance the possibilities of unconventional nanotechnologies.Similar challenges arise because of the technical progress in various other fields,realizing new and unique functionalities based on nanoscale effects,e.g.,in nanophotonics,quantum computing,energy harvesting,and life sciences.Experimental platforms for basic research in the field of scale-spanning nanomeasuring and nanofabrication are necessary for these tasks,which are available at the Technische Universitiit Ilmenau in the form of nanopositioning and nanomeasuring(NPM)machines.With this equipment,the limits of technical structurability are explored for high-performance tip-based and laser-based processes for enabling real 3D nanofabrication with the highest precision in an adequate working range of several thousand cubic millimeters. 展开更多
关键词 Nanomeasuring NANOPOSITIONING NANOMANUFACTURING Scale-spanning Tip-based Laser-based Nanofabrication
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Heterodyne Standing-Wave Interferometer with Improved Phase Stability 被引量:1
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作者 Ingo Ortlepp Jens-Peter Zollner +1 位作者 Ivo W.Rangelow Eberhard Manske 《Nanomanufacturing and Metrology》 2021年第3期190-199,共10页
This paper describes a standing-wave interferometer with two laser sources of different wavelengths,diametrically opposed and emitting towards each other.The resulting standing wave has an intensity profile which is m... This paper describes a standing-wave interferometer with two laser sources of different wavelengths,diametrically opposed and emitting towards each other.The resulting standing wave has an intensity profile which is moving with a constant velocity,and is directly detected inside the laser beam by two thin and transparent photo sensors.The first sensor is at a fixed position,serving as a phase reference for the second one which is moved along the optical axis,resulting in a frequency shift,proportional to the velocity.The phase difference between both sensors is evaluated for the purpose of interferometric length measurements. 展开更多
关键词 Standing wave INTERFEROMETER HETERODYNE Ultrathin photo diode
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