Nanomeasuring machines developed at the Technische Universitat Ilmenau enable three-dimensional measurements and manufacturing processes with the lowest uncertainties.Due to the requirements for these processes,a high...Nanomeasuring machines developed at the Technische Universitat Ilmenau enable three-dimensional measurements and manufacturing processes with the lowest uncertainties.Due to the requirements for these processes,a highly reproducible and long-term stable tool changing system is needed.For this purpose,kinematically determined couplings are widely used.The state-of-the-art investigations on those are not sufficient for the highest demands on the reproducibility required for this application.A theoretical determination of the reproducibility based on analytical or numerical methods is possible,however not in the desired nanometer range.Due to this,a measurement setup for the determination of the reproducibility in five degrees of freedom with nanometer uncertainty was developed.First,potential measuring devices are systematically examined and measurement principles were developed out of this.A three-dimensional vector-based uncertainty analysis is performed to prove the feasibility of the measurement principle and provides a basis for further design.As a result,a transla-tory measurement uncertainty of 10 nm and a rotatory uncertainty of 11 nrad can be reached.Afterwards,the measurement setup is designed,focusing on the metrological frame and the lift-off device.The developed setup exceeds the uncertainties of the measurement setups presented in the state-of-the-art by an order of magnitude,allowing new in-depth investigations of the reproducibility of kinematic couplings.展开更多
Since the first realization of two-photon direct laser writing(DLW)in Maruo et al.(Opt Lett 22:132-134,1997),the manufacturing using direct laser writing techniques spread out in many laboratories all over the world.P...Since the first realization of two-photon direct laser writing(DLW)in Maruo et al.(Opt Lett 22:132-134,1997),the manufacturing using direct laser writing techniques spread out in many laboratories all over the world.Photosensitive materials with different material properties open a new field for micro-and nanofabrication.The achievable structuring resolution using this technique is reported to be sub-100 nm(Paz et al.in J.Laser Appl.24:042004,2012),while a smallest linewidth of 25 nm could be shown in Tan et al.(Appl Phys Lett 90:071106,2007).In our approach,the combination of DLW with the nanopositioning and nanomeasuring machine NMM-1 offers an improvement of the technique from the engineering side regarding the ultra-precise positioning(Weidenfeller et al.in Adv Fabr Technol Micro/Nano Opt Photon Ⅺ 10544:105440E,2018).One big benefit besides the high positioning resolution of 0.1 nm is offered by the positioning range of 25 mm×25 mm×5 mm(Jager et al.in Technisches Messen 67:319-323,2000;Manske et al.in Meas Sci Technol 18:520-527,2007).Thus,a trans-scale fabrication without any stitching or combination of different positioning systems is necessary.The immense synergy between the highly precise positioning and the DLW is demonstrated by the realization of resist lines and trenches whose center-to-center distance undergoes the modified diffraction limit for two-photon processes.The precise positioning accuracy enables a defined distance between illuminated lines.Hence,with a comparable huge width of the trenches of 1.655|im due to a low effective numerical aperture of 0.16,a resist line of 30 nm between two written trenches could be achieved.Although the interrelationships for achieving such narrow trenches have not yet been clarified,much smaller resist lines and trench widths are possible with this approach in the near future.展开更多
基金the support by the Deutsche Forschungsgemeinschaft(DFG)in the framework of Research Training Group"Tip-and laser-based 3D-Nanofabrication inextended macroscopic working areas"(GRK 2182)at the Technische Universiat Ilmenau,Germany.
文摘Nanomeasuring machines developed at the Technische Universitat Ilmenau enable three-dimensional measurements and manufacturing processes with the lowest uncertainties.Due to the requirements for these processes,a highly reproducible and long-term stable tool changing system is needed.For this purpose,kinematically determined couplings are widely used.The state-of-the-art investigations on those are not sufficient for the highest demands on the reproducibility required for this application.A theoretical determination of the reproducibility based on analytical or numerical methods is possible,however not in the desired nanometer range.Due to this,a measurement setup for the determination of the reproducibility in five degrees of freedom with nanometer uncertainty was developed.First,potential measuring devices are systematically examined and measurement principles were developed out of this.A three-dimensional vector-based uncertainty analysis is performed to prove the feasibility of the measurement principle and provides a basis for further design.As a result,a transla-tory measurement uncertainty of 10 nm and a rotatory uncertainty of 11 nrad can be reached.Afterwards,the measurement setup is designed,focusing on the metrological frame and the lift-off device.The developed setup exceeds the uncertainties of the measurement setups presented in the state-of-the-art by an order of magnitude,allowing new in-depth investigations of the reproducibility of kinematic couplings.
基金the support by the Deutsche Forschungsgemeinschaft(DFG)in the framework of Research Training Group Tip-and laser-based 3D-Nanofcibrication in extended macroscopic working areas(GRK 2182)at the Technische Universitat Ilmenau,Germanyfinancial support from the DFG from the grant RE3012/4-1.
文摘Since the first realization of two-photon direct laser writing(DLW)in Maruo et al.(Opt Lett 22:132-134,1997),the manufacturing using direct laser writing techniques spread out in many laboratories all over the world.Photosensitive materials with different material properties open a new field for micro-and nanofabrication.The achievable structuring resolution using this technique is reported to be sub-100 nm(Paz et al.in J.Laser Appl.24:042004,2012),while a smallest linewidth of 25 nm could be shown in Tan et al.(Appl Phys Lett 90:071106,2007).In our approach,the combination of DLW with the nanopositioning and nanomeasuring machine NMM-1 offers an improvement of the technique from the engineering side regarding the ultra-precise positioning(Weidenfeller et al.in Adv Fabr Technol Micro/Nano Opt Photon Ⅺ 10544:105440E,2018).One big benefit besides the high positioning resolution of 0.1 nm is offered by the positioning range of 25 mm×25 mm×5 mm(Jager et al.in Technisches Messen 67:319-323,2000;Manske et al.in Meas Sci Technol 18:520-527,2007).Thus,a trans-scale fabrication without any stitching or combination of different positioning systems is necessary.The immense synergy between the highly precise positioning and the DLW is demonstrated by the realization of resist lines and trenches whose center-to-center distance undergoes the modified diffraction limit for two-photon processes.The precise positioning accuracy enables a defined distance between illuminated lines.Hence,with a comparable huge width of the trenches of 1.655|im due to a low effective numerical aperture of 0.16,a resist line of 30 nm between two written trenches could be achieved.Although the interrelationships for achieving such narrow trenches have not yet been clarified,much smaller resist lines and trench widths are possible with this approach in the near future.
