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Entegris发布高纯度气体纯化系统平台
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《中国集成电路》 2017年第3期34-34,共1页
Entegris近日宣布引进新的先进气体纯化平台,以提高半导体和LED应用的晶圆良率。新系列GateKeeper气体纯化系统(GPS)采用新的纯化介质,可在各种流量下提供一流的气体纯度,且设备占用空间更少。
关键词 高纯度气体 纯化系统 平台 GATEKEEPER 气体纯化 纯化介质 气体纯度 占用空间
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利用超高过滤面积的液体过滤器实现高流量和低压损的纳米级颗粒过滤
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作者 蔚健 《集成电路应用》 2006年第10期43-46,共4页
使用孔径更小的颗粒过滤器会带来更大的液体压力损失,导致流量降低。300mm的制程需要液体有更高的流量。所以过滤技术必须有所提高。
关键词 液体过滤器 纳米级颗粒 流量 过滤面积 压损 颗粒过滤器 压力损失 过滤技术
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PREVENTING LITHOGRAPHY-INDUCED MAVERICK YIELD EVENTS WITH A DISPENSE SYSTEM ADVANCED EQUIPMENT CONTROL METHOD
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作者 Jennifer Broggin 《电子工业专用设备》 2012年第9期60-67,共8页
As semiconductor manufacturers march to thedrum beat of Moore's Law there is very little roomfor yield maverieks, especially those that can beprevented. Critical process errors are costly andphotolithography is on... As semiconductor manufacturers march to thedrum beat of Moore's Law there is very little roomfor yield maverieks, especially those that can beprevented. Critical process errors are costly andphotolithography is one of the few processes insemiconductor manufacturing where there is anopportunity to correct errors. Small changes inphotoresist-dispensed volume may have severeimpact on film thickness uniformity and can ulti-mately affect patterning It is important to monitorphoto dispense conditions to detect real-timeevents that may have a direct negative impact onprocess yield and be able to react to these eventsas quickly as possible.This paper presents an evaluation of the IntelliGen Mini, a photoresist dispense system manufacturedby Entegris, Inc. This system utilizes advancedequipment control software, known as dispenseconfirmation, to detect variations in photo dis-pense. These variations, caused by bubbles inthe dispense line, valve errors and accidentally-changed chemistries can all create maverick yieldevents that can go undetected until metrology,defeet inspection or wafer final testThe ability of an advanced dispense system todetect events and create alerts is a very powerfultool, but it can be most effective when that infor-mation is collected and analyzed by an automatedsystem. In a modern fabricator this is most likely astatistical process control chart that is monitoringa track's progress and is ready to stop the trackwhen a maverick event occurs or alert personnelto trends they may not otherwise catch with otherinline ntetrology data. Dispense confirmation,when Combined with networking capabilities,can meet this need.After a brief description of the pump, data from sim-ulated yield-affecting events will be examined toevaluate the IntelliGen Mini's ability to detect them.This discussion will eonclude with a brief analysisof the ultilnate time and cost savings of utilizingdispense confirmation with networking capabilitiesto detect and eliminate poorly-coated wafers. 展开更多
关键词 《电子工业专用设备》 期刊 编辑工作 发行工作
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在光阻材料中过滤器吸附机制的作用(英文)
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作者 Tetsu Kohyama 《电子工业专用设备》 2012年第11期22-27,共6页
近来尼龙过滤被广泛用于光刻工艺流程来改善良率,因为许多IC和光阻制造商有实验性证据表明尼龙滤膜能吸附杂质。然而,尼龙滤膜降低缺陷的机制尚不清楚。通过致力于特定的光阻成分来研究不同的缺陷发生机制是十分有用的。利用表面改性和... 近来尼龙过滤被广泛用于光刻工艺流程来改善良率,因为许多IC和光阻制造商有实验性证据表明尼龙滤膜能吸附杂质。然而,尼龙滤膜降低缺陷的机制尚不清楚。通过致力于特定的光阻成分来研究不同的缺陷发生机制是十分有用的。利用表面改性和不同的光阻成分进行了各种吸附试验来测量尼龙滤膜的耐受性,包括表面张力,光酸发生剂和光酸抑制剂。最后,研究希望通过致力于如何最佳贯彻尼龙过滤策略来确定最有效的方法提高良率。 展开更多
关键词 光阻材料 过滤器 吸附试验 尼龙滤膜耐受性
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