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Pulsed Laser Deposition of VO_(2)Single Crystal Thin Films on Sapphire Substrates 被引量:1
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作者 ZHU Pei-ran S.Yamamoto +1 位作者 A.Miyashita H.Naramoto 《Chinese Physics Letters》 SCIE CAS CSCD 1998年第12期904-906,共3页
Thin films of VO_(2)single-crystalline on(0001)sapphire substrates have been prepared by visible pulsed laser ablation technique.The crystal quality and properties of the films are evaluated through electrical resista... Thin films of VO_(2)single-crystalline on(0001)sapphire substrates have been prepared by visible pulsed laser ablation technique.The crystal quality and properties of the films are evaluated through electrical resistance measurement,x-ray diffraction(XRD),and Rutherford-backscattering spectroscopy/channeling(RBS/C)analysis.The dependence of the surface electrical resistance of the films on the temperature shows semiconductor-to-metal transitions with the resistance change of 7×10^(3)-2×10^(4).The hysteresis widths are from less than 1 to 3 K.XRD and RBS/C data reveal that the films prepared in particular conditions are single-crystalline VO_(2)with the(010)planes parallel to the surface of the sapphire substrate. 展开更多
关键词 technique. SAPPHIRE CRYSTAL
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