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Mesoporous Nanofibers from Extended Electrospinning Technique 被引量:3
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作者 Pengpeng Qiu Richeng Jin +4 位作者 Younggyu Son Anqi Ju Wan Jiang Lianjun Wang Wei Luo 《Advanced Fiber Materials》 SCIE EI CAS 2024年第3期658-685,共28页
One-dimensional(1D)mesoporous nanofibers(NFs)have recently attracted tremendous interest in different fields,in virtue of their mesoporous structure and 1D geometry.However,conventional electrospinning,as a versatile ... One-dimensional(1D)mesoporous nanofibers(NFs)have recently attracted tremendous interest in different fields,in virtue of their mesoporous structure and 1D geometry.However,conventional electrospinning,as a versatile approach for producing 1D nanostructures,can only fabricate solid NFs without pores or with a microporous structure.In this review,we focus on the extensions of the electrospinning technique to create 1D mesoporous fibrous structures,which can be categorized into:(i)foaming-assisted,(ii)phase separation-induced,(iii)soft-templated,and(iv)monomicelle-directed approaches.Special focus is on the synthesis strategies of 1D mesoporous NFs,and their underlying mechanisms,with looking into the control over pore sizes,pore structures,and functionalities.Moreover,the structure-related performances of mesoporous NFs in photocatalysis,sensing,and energy-related fields are discussed.Finally,the potential challenges for the future development of 1D mesoporous fibers are examined from the viewpoint of their synthetic strategies and applications. 展开更多
关键词 NANOFIBERS ELECTROSPINNING MESOPOROUS Soft-templated Monomicelles
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Fundamental principles and development of proximity-field nanopatterning toward advanced 3D nanofabrication 被引量:1
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作者 Sang-Hyeon Nam Gayea Hyun +7 位作者 Donghwi Cho Seonggon Han Gwangmin Bae Haomin Chen Kisun Kim Youngjin Ham Junyong Park Seokwoo Jeon 《Nano Research》 SCIE EI CSCD 2021年第9期2965-2980,共16页
Three-dimensional(3D)nanoarchitectures have offered unprecedented material performances in diverse applications like energy storages,catalysts,electronic,mechanical,and photonic devices.These outstanding performances ... Three-dimensional(3D)nanoarchitectures have offered unprecedented material performances in diverse applications like energy storages,catalysts,electronic,mechanical,and photonic devices.These outstanding performances are attributed to unusual material properties at the nanoscale,enormous surface areas,a geometrical uniqueness,and comparable feature sizes with optical wavelengths.For the practical use of the unusual nanoscale properties,there have been developments for macroscale fabrications of the 3D nanoarchitectures with process areas over centimeter scales.Among the many fabrication methods for 3D structures at the nanoscale,proximity-field nanopatterning(PnP)is one of the promising techniques that generates 3D optical holographic images and transforms them into material structures through a lithographic process.Using conformal and transparent phase masks as a key factor,the PnP process has advantages in terms of stability,uniformity,and reproducibility for 3D nanostructures with periods from 300 nm to several micrometers.Other merits of realizing precise 3D features with sub-100 nm and rapid processes are attributed to the interference of coherent light diffracted by phase masks.In this review,to report the overall progress of PnP from 2003,we present a comprehensive understanding of PnP,including its brief history,the fundamental principles,symmetry control of 3D nanoarchitectures,material issues for the phase masks,and the process area expansion to the wafer-scale for the target applications.Finally,technical challenges and prospects are discussed for further development and practical applications of the PnP technique. 展开更多
关键词 proximity-field nanopatterning three-dimensional(3D)nanostructures phase mask interference lithography
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