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Simulation analysis of combined UV/blue photodetector in CMOS process by technology computer-aided design
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作者 Changping CHEN Xiangliang JIN +2 位作者 Lizhen TANG Hongjiao YANG Jun LUO 《Frontiers of Optoelectronics》 EI CSCD 2014年第1期69-73,共5页
A composite ultraviolet (UV)/blue photode- tector structure has been proposed, which is composed of P-type silicon substrate, Pwelb Nwell and N-channel metal- oxide-semiconductor field-effect transistor (NMOSFET) ... A composite ultraviolet (UV)/blue photode- tector structure has been proposed, which is composed of P-type silicon substrate, Pwelb Nwell and N-channel metal- oxide-semiconductor field-effect transistor (NMOSFET) realized in the PweH. In this photodetector, lateral ring- shaped Pwell-Nwell junction was used to separate the photogenerated carriers, and non-equilibrium excess hole was injected to the Pwell bulk for changing the bulk potential and shifting the NMOSFET's threshold voltage as well as the output drain current. By technology computer-aided design (TCAD) device, simulation and analysis of this proposed photodetector were carried out. Simulation results show that the combined photodetector has enhanced responsivity to UV/blue spectrum. More- over, it exhibits very high sensitivity to weak and especially ultral-weak optical light. A sensitivity of 7000 A/W was obtained when an incident optical power of 0.01 μW was illuminated to the photodetector, which is 35000 times higher than the responsivity of a conventional silicon-based UV photodiode (usually is about 0.2 A/W). As a result, this proposed combined photodetector has great potential values for UV applications. 展开更多
关键词 ultraviolet (UV)golue photodetector weaklight detection complimentary metal-oxide-semiconductor(CMOS) technology computer-aided design tcad
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Modeling,simulations,and optimizations of gallium oxide on gallium-nitride Schottky barrier diodes
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作者 Tao Fang Ling-Qi Li +1 位作者 Guang-Rui Xia Hong-Yu Yu 《Chinese Physics B》 SCIE EI CAS CSCD 2021年第2期457-461,共5页
With technology computer-aided design(TCAD)simulation software,we design a new structure of gallium oxide on gallium-nitride Schottky barrier diode(SBD).The parameters of gallium oxide are defined as new material para... With technology computer-aided design(TCAD)simulation software,we design a new structure of gallium oxide on gallium-nitride Schottky barrier diode(SBD).The parameters of gallium oxide are defined as new material parameters in the material library,and the SBD turn-on and breakdown behavior are simulated.The simulation results reveal that this new structure has a larger turn-on current than Ga2O3 SBD and a larger breakdown voltage than Ga N SBD.Also,to solve the lattice mismatch problem in the real epitaxy,we add a Zn O layer as a transition layer.The simulations show that the device still has good properties after adding this layer. 展开更多
关键词 technology computer-aided design(tcad) gallium oxide(Ga2O3) gallium nitride(GaN) Schottky barrier diode(SBD)
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Analysis of displacement damage effects on the charge-coupled device induced by neutrons at Back-n in the China Spallation Neutron Source 被引量:2
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作者 薛院院 王祖军 +9 位作者 陈伟 郭晓强 姚志斌 何宝平 聂栩 赖善坤 黄港 盛江坤 马武英 缑石龙 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第7期435-442,共8页
Displacement damage effects on the charge-coupled device(CCD)induced by neutrons at the back-streaming white neutron source(Back-n)in the China Spallation Neutron Source(CSNS)are analyzed according to an online irradi... Displacement damage effects on the charge-coupled device(CCD)induced by neutrons at the back-streaming white neutron source(Back-n)in the China Spallation Neutron Source(CSNS)are analyzed according to an online irradiation experiment.The hot pixels,random telegraph signal(RTS),mean dark signal,dark current and dark signal non-uniformity(DSNU)induced by Back-n are presented.The dark current is calculated according to the mean dark signal at various integration times.The single-particle displacement damage and transient response are also observed based on the online measurement data.The trends of hot pixels,mean dark signal,DSNU and RTS degradation are related to the integration time and irradiation fluence.The mean dark signal,dark current and DSNU2 are nearly linear with neutron irradiation fluence when nearly all the pixels do not reach saturation.In addition,the mechanisms of the displacement damage effects on the CCD are demonstrated by combining the experimental results and technology computer-aided design(TCAD)simulation.Radiation-induced traps in the space charge region of the CCD will act as generation/recombination centers of electron-hole pairs,leading to an increase in the dark signal. 展开更多
关键词 displacement damage effects charge-coupled device(CCD) China Spallation Neutron Source(CSNS) MECHANISMS technology computer-aided design(tcad)
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硅肖特基结自滤波窄带近红外光探测器的研究
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作者 刘浩 徐艳 +2 位作者 宋龙梅 夏宇 于永强 《合肥工业大学学报(自然科学版)》 CAS 北大核心 2022年第3期342-346,共5页
窄带近红外光探测器因对特定波长有很高的灵敏度,在临床诊断、治疗设备或可穿戴的功能性监测设备等生物医学领域具有广阔的应用前景。文章基于硅基光吸收及肖特基结光生载流子收集特性的分析,首次采用Silvaco TCAD设计了光谱可调的硅/... 窄带近红外光探测器因对特定波长有很高的灵敏度,在临床诊断、治疗设备或可穿戴的功能性监测设备等生物医学领域具有广阔的应用前景。文章基于硅基光吸收及肖特基结光生载流子收集特性的分析,首次采用Silvaco TCAD设计了光谱可调的硅/石墨烯肖特基二极管窄带近红外光探测器。利用湿法转移石墨烯电极制备了硅/石墨烯肖特基二极管,光电特性表征发现,器件具有自滤光的、可见光盲的近红外窄带响应,中心波长为1010 nm,半峰宽为180 nm,成功验证了硅基肖特基窄带近红外光探测器的设计。研究结果为窄带近红外光探测器等新型光电探测器的设计提供一定的理论支持和实验参考。 展开更多
关键词 肖特基结 tcad仿真 近红外光探测器 窄带
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Impact of proton-induced alteration of carrier lifetime on single-event transient in SiGe heterojunction bipolar transistor
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作者 Jia-Nan Wei Chao-Hui He +2 位作者 Pei Li Yong-Hong Li Hong-Xia Guo 《Chinese Physics B》 SCIE EI CAS CSCD 2019年第7期375-380,共6页
This paper presents an investigation into the impact of proton-induced alteration of carrier lifetime on the singleevent transient(SET) caused by heavy ions in silicon–germanium heterojunction bipolar transistor(SiGe... This paper presents an investigation into the impact of proton-induced alteration of carrier lifetime on the singleevent transient(SET) caused by heavy ions in silicon–germanium heterojunction bipolar transistor(SiGe HBT).The ioninduced current transients and integrated charge collections under different proton fluences are obtained based on technology computer-aided design(TCAD) simulation.The results indicate that the impact of carrier lifetime alteration is determined by the dominating charge collection mechanism at the ion incident position and only the long-time diffusion process is affected.With a proton fluence of 5 × 1013 cm-2, almost no change is found in the transient feature, and the charge collection of events happened in the region enclosed by deep trench isolation(DTI), where prompt funneling collection is the dominating mechanism.Meanwhile, for the events happening outside DTI where diffusion dominates the collection process, the peak value and the duration of the ion-induced current transient both decrease with increasing proton fluence, leading to a great decrease in charge collection. 展开更多
关键词 silicon–germanium heterojunction bipolar transistor(SiGe HBT) proton irradiation MINORITY carrier lifetime single-event transient technology computer-aided design(tcad) simulation
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Sensitivity investigation of 100-MeV proton irradiation to SiGe HBT single event effect
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作者 冯亚辉 郭红霞 +7 位作者 刘益维 欧阳晓平 张晋新 马武英 张凤祁 白如雪 马晓华 郝跃 《Chinese Physics B》 SCIE EI CAS CSCD 2024年第1期554-562,共9页
The single event effect(SEE) sensitivity of silicon–germanium heterojunction bipolar transistor(Si Ge HBT) irradiated by 100-Me V proton is investigated. The simulation results indicate that the most sensitive positi... The single event effect(SEE) sensitivity of silicon–germanium heterojunction bipolar transistor(Si Ge HBT) irradiated by 100-Me V proton is investigated. The simulation results indicate that the most sensitive position of the Si Ge HBT device is the emitter center, where the protons pass through the larger collector-substrate(CS) junction. Furthermore, in this work the experimental studies are also carried out by using 100-Me V proton. In order to consider the influence of temperature on SEE, both simulation and experiment are conducted at a temperature of 93 K. At a cryogenic temperature, the carrier mobility increases, which leads to higher transient current peaks, but the duration of the current decreases significantly.Notably, at the same proton flux, there is only one single event transient(SET) that occurs at 93 K. Thus, the radiation hard ability of the device increases at cryogenic temperatures. The simulation results are found to be qualitatively consistent with the experimental results of 100-Me V protons. To further evaluate the tolerance of the device, the influence of proton on Si Ge HBT after gamma-ray(^(60)Coγ) irradiation is investigated. As a result, as the cumulative dose increases, the introduction of traps results in a significant reduction in both the peak value and duration of the transient currents. 展开更多
关键词 silicon–germanium heterojunction bipolar transistor(Si Ge HBT) 100-Me V proton technology computer-aided design(tcad) single event effect(SEE)
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28 nm工艺开发中的器件局域失配研究
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作者 蔡恩静 高金德 +2 位作者 朱巧智 魏文 李强 《半导体技术》 CAS CSCD 北大核心 2018年第9期714-719,共6页
在集成电路28 nm和14 nm等先进制造工艺开发中,采用纳米探针锁定失配器件后,依然无法通过物性分析找出失效原因,成为提升低压良率的最大瓶颈。通过对存储失效单元器件特性的分析提出了失效模型,采用计算机辅助设计技术(TCAD)工具对器... 在集成电路28 nm和14 nm等先进制造工艺开发中,采用纳米探针锁定失配器件后,依然无法通过物性分析找出失效原因,成为提升低压良率的最大瓶颈。通过对存储失效单元器件特性的分析提出了失效模型,采用计算机辅助设计技术(TCAD)工具对器件失配进行模拟,给出失效现象的直观解释和工艺改善方向并优化了工艺条件。结果表明在常规器件分析流程中引入TCAD器件模拟是一种更有效的研究低压良率器件局域失配的方法,能大大缩短工艺开发周期。同时,采用热运动的麦克斯韦-玻耳兹曼分布对器件局域失配进行讨论计算,认为注入杂质热运动引起的扩散是导致因离子注入随机波动引起器件局域失配的主导因素。 展开更多
关键词 低压(Vmin)良率 器件局域失配 离子注入随机波动(RDF) 计算机辅助设计技术(tcad)模拟 麦克斯韦-玻耳兹曼分布
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