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Channel Lateral Pocket or Halo Region of NMOSFET Characterized by Interface State R G Current of the Forward Gated Diode
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作者 何进 黄爱华 +1 位作者 张兴 黄如 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2001年第7期826-831,共6页
The channel lateral pocket or halo region of NMOSFET characterized by interface state R G current of a forward gated diode has been investigated numerically for the first time.The result of numerical analysis demons... The channel lateral pocket or halo region of NMOSFET characterized by interface state R G current of a forward gated diode has been investigated numerically for the first time.The result of numerical analysis demonstrates that the effective surface doping concentration and the interface state density of the pocket or halo region are interface states R G current peak position dependent and amplitude dependent,respectively.It can be expressed quantitatively according to the device physics knowledge,thus,the direct characterization of the interface state density and the effective surface doping concentration of the pocket or halo becomes very easy. 展开更多
关键词 forward gated diode R G current MOSFET pocket or halo implant region interface states effective surface doping concentration
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