Organosilicone thin films were prepared through plasma polymerization(pp)in a plasma enhance chemical vapour deposition(PECVD)system,utilizing hexamethyldisilazane(HMDSN)as a monomer precursor,at varying distances(25 ...Organosilicone thin films were prepared through plasma polymerization(pp)in a plasma enhance chemical vapour deposition(PECVD)system,utilizing hexamethyldisilazane(HMDSN)as a monomer precursor,at varying distances(25 mm,35 mm,45 mm,55 mm,and 65 mm)from the plasma source to the substrate.Research has examined how the distance between the substrate and plasma source impacts the properties of thin films,including their thickness,surface morphology,and photoluminescence(PL).It was discovered that as the distance increased,both film thickness and PL intensity also increased.Additionally,the film was observed to be more uniform and smoother when deposited 45 mm below the plasma source.展开更多
High power pulsed magnetron sputtering（HPPMS）, a novel physical vapor deposition technology, was applied to prepare vanadium films on aluminum alloy substrate in this paper. The influence of target–substrate dista...High power pulsed magnetron sputtering（HPPMS）, a novel physical vapor deposition technology, was applied to prepare vanadium films on aluminum alloy substrate in this paper. The influence of target–substrate distance（Dt–s）（ranging from 8 to 20 cm） on phase structure, surface morphology, deposition rate, and corrosion resistance of vanadium films was investigated. The results show that the vanadium films are textured with a preferential orientation in the（111） direction except for that fabricated at 20 cm. With Dt–sincreasing, the intensity of（111） diffraction peak of the films decreases and there exists a proper distance leading to the minimum surface roughness of 0.65 nm. The deposition rate decreases with Dt–sincreasing. All the V-coated aluminum samples possess better corrosion resistance than the control sample. The sample fabricated at Dt–sof 12 cm demonstrates the best corrosion resistance with the corrosion potential increasing by 0.19 V and the corrosion current decreasing by an order of magnitude compared with that of the substrate. The samples gain further improvement in corrosion resistance after annealing, and if compared with that of annealed aluminum alloy, then the corrosion potential of the sample fabricated at 20 cm increases by 0.415 V and the corrosion current decreases by two orders of magnitude after annealed at 200 °C. If the annealing temperature further rises to 300 °C, then the corrosion resistance of samples increases less obviously than that of the control sample.展开更多
The Be films were prepared by thermal evaporation at different sources to substrate distances（SSD） on glass substrates. The decrease of SSD from 90 mm to 50 mm caused the increase of substrate temperature and the ri...The Be films were prepared by thermal evaporation at different sources to substrate distances（SSD） on glass substrates. The decrease of SSD from 90 mm to 50 mm caused the increase of substrate temperature and the rising density of incident Be atoms, thus the properties of Be films greatly changed accordingly. The experimental results showed that the grain diameter in the Be films transited from below 100 nm to 300 nm, the film growth rate increased from 2.35 nm/min to 4.73 nm/min and the roughness increased from 7 nm to 49 nm. The performance study suggested that the friction coefficient of Be films increased from 0.13 to 0.27 and was related to the surface roughness and inner structure, the near-infrared reflectance of Be films increased from 40% to 85% with the increase of wavelength and concurrently decreased with the decrease of SSD, respectively. The performance study indicated that the Be film had the potential application in specific near-infrared reflectance optical system.展开更多
Highly transparent and conducting Al-Zr co-doped zinc oxide （ZAZO） thin films were successfully prepared on glass substrate by direct current （DC） magnetron sputtering at room temperature. The distance between tar...Highly transparent and conducting Al-Zr co-doped zinc oxide （ZAZO） thin films were successfully prepared on glass substrate by direct current （DC） magnetron sputtering at room temperature. The distance between target and substrate was varied from 45 to 70 mm. All the deposited films are polycrystalline with a hexagonal structure and have a preferred orientation along the c-axis perpendicular to the substrate. The crystallinity increases obviously and the electrical resistivity decreases when the distance between target and substrate decreases from 70 to 50 mm. However, as the distance decreases further, the crystallinity decreases and the electrical resistivity increases. When the distance between target and substrate is 50 ram, it is found that the lowest resistivity is 6.9 × 10^-4Ω cm. All the deposited films show a high average transmittance of above 92% in the visible range.展开更多
This research proposes a simple and practical method to make low-stray-light gratings, where the substrate shifts about a 1 mm distance in the direction parallel or perpendicular to the exposure interference fringes. ...This research proposes a simple and practical method to make low-stray-light gratings, where the substrate shifts about a 1 mm distance in the direction parallel or perpendicular to the exposure interference fringes. When the substrate shifts, a reference grating next to the substrate is used to adjust in real time the phase of the exposure interference fringes relative to the substrate. Shifting eliminates the exposure defects and therefore decreases the stray light of gratings. Several gratings are successfully made by using this method, which have straighter grooves,smoother surfaces, and lower stray light than gratings made in conventional interference lithography.展开更多
基金the AECS for its financial support of this study
文摘Organosilicone thin films were prepared through plasma polymerization(pp)in a plasma enhance chemical vapour deposition(PECVD)system,utilizing hexamethyldisilazane(HMDSN)as a monomer precursor,at varying distances(25 mm,35 mm,45 mm,55 mm,and 65 mm)from the plasma source to the substrate.Research has examined how the distance between the substrate and plasma source impacts the properties of thin films,including their thickness,surface morphology,and photoluminescence(PL).It was discovered that as the distance increased,both film thickness and PL intensity also increased.Additionally,the film was observed to be more uniform and smoother when deposited 45 mm below the plasma source.
基金financially supported by the National Natural Science Foundation of China (Nos. 51175118 and U1330110)the Open Foundation of Science and Technology on Surface Physics and Chemistry Laboratory (No. SPC201104)
文摘High power pulsed magnetron sputtering（HPPMS）, a novel physical vapor deposition technology, was applied to prepare vanadium films on aluminum alloy substrate in this paper. The influence of target–substrate distance（Dt–s）（ranging from 8 to 20 cm） on phase structure, surface morphology, deposition rate, and corrosion resistance of vanadium films was investigated. The results show that the vanadium films are textured with a preferential orientation in the（111） direction except for that fabricated at 20 cm. With Dt–sincreasing, the intensity of（111） diffraction peak of the films decreases and there exists a proper distance leading to the minimum surface roughness of 0.65 nm. The deposition rate decreases with Dt–sincreasing. All the V-coated aluminum samples possess better corrosion resistance than the control sample. The sample fabricated at Dt–sof 12 cm demonstrates the best corrosion resistance with the corrosion potential increasing by 0.19 V and the corrosion current decreasing by an order of magnitude compared with that of the substrate. The samples gain further improvement in corrosion resistance after annealing, and if compared with that of annealed aluminum alloy, then the corrosion potential of the sample fabricated at 20 cm increases by 0.415 V and the corrosion current decreases by two orders of magnitude after annealed at 200 °C. If the annealing temperature further rises to 300 °C, then the corrosion resistance of samples increases less obviously than that of the control sample.
基金Funded by the Laboratory of Precision Manufacturing Technology,China Academy of Engineering Physics(No.ZZ15011)
文摘The Be films were prepared by thermal evaporation at different sources to substrate distances（SSD） on glass substrates. The decrease of SSD from 90 mm to 50 mm caused the increase of substrate temperature and the rising density of incident Be atoms, thus the properties of Be films greatly changed accordingly. The experimental results showed that the grain diameter in the Be films transited from below 100 nm to 300 nm, the film growth rate increased from 2.35 nm/min to 4.73 nm/min and the roughness increased from 7 nm to 49 nm. The performance study suggested that the friction coefficient of Be films increased from 0.13 to 0.27 and was related to the surface roughness and inner structure, the near-infrared reflectance of Be films increased from 40% to 85% with the increase of wavelength and concurrently decreased with the decrease of SSD, respectively. The performance study indicated that the Be film had the potential application in specific near-infrared reflectance optical system.
文摘Highly transparent and conducting Al-Zr co-doped zinc oxide （ZAZO） thin films were successfully prepared on glass substrate by direct current （DC） magnetron sputtering at room temperature. The distance between target and substrate was varied from 45 to 70 mm. All the deposited films are polycrystalline with a hexagonal structure and have a preferred orientation along the c-axis perpendicular to the substrate. The crystallinity increases obviously and the electrical resistivity decreases when the distance between target and substrate decreases from 70 to 50 mm. However, as the distance decreases further, the crystallinity decreases and the electrical resistivity increases. When the distance between target and substrate is 50 ram, it is found that the lowest resistivity is 6.9 × 10^-4Ω cm. All the deposited films show a high average transmittance of above 92% in the visible range.
基金supported by the National Natural Science Foundation of China under Grant No.51427805
文摘This research proposes a simple and practical method to make low-stray-light gratings, where the substrate shifts about a 1 mm distance in the direction parallel or perpendicular to the exposure interference fringes. When the substrate shifts, a reference grating next to the substrate is used to adjust in real time the phase of the exposure interference fringes relative to the substrate. Shifting eliminates the exposure defects and therefore decreases the stray light of gratings. Several gratings are successfully made by using this method, which have straighter grooves,smoother surfaces, and lower stray light than gratings made in conventional interference lithography.
