Strained germanium hole spin qubits are promising for quantum computing,but the devices hosting these qubits face challenges from high interface trap density,which originates from the naturally oxidized surface of the...Strained germanium hole spin qubits are promising for quantum computing,but the devices hosting these qubits face challenges from high interface trap density,which originates from the naturally oxidized surface of the wafer.These traps can degrade the device stability and cause an excessively high threshold voltage.Surface passivation is regarded as an effective method to mitigate these impacts.In this study,we perform low-thermal-budget chemical passivation using the nitric acid oxidation of silicon method on the surface of strained germanium devices and investigate the impact of passivation on the device stability.The results demonstrate that surface passivation effectively reduces the interface defect density.This not only improves the stability of the device's threshold voltage but also enhances its long-term static stability.Furthermore,we construct a band diagram of hole surface tunneling at the static operating point to gain a deeper understanding of the physical mechanism through which passivation affects the device stability.This study provides valuable insights for future optimization of strained Ge-based quantum devices and advances our understanding of how interface states affect device stability.展开更多
The slow kinetics of the cathode CO_(2) reduction reaction and the decomposition reaction of Li2CO3,a widebandwidth insulating product,lead to difficult CO_(2) capture and high charging potential in Li-CO_(2) batterie...The slow kinetics of the cathode CO_(2) reduction reaction and the decomposition reaction of Li2CO3,a widebandwidth insulating product,lead to difficult CO_(2) capture and high charging potential in Li-CO_(2) batteries.To improve the reaction kinetics and decrease the reaction overpotential,we synthesized mesoporous Pt nanosheets with high tensile strain.The presence of many unsaturated coordinated Pt atoms around the pores gives rise to tensile strain in the mesoporous Pt nanosheets.This tensile strain plays a key role in regulating the interactions between the catalytic surface of Pt and the adsorbed intermediates.The two-dimensional structure provides more active sites on the surface for the catalytic reactions.These superiorities enable a low overpotential of 0.36 V at a cutoff capacity of 100μAh·cm^(−2) at a current density of 10μA·cm^(−2) over more than 2000 h.This study opens new possibilities for the rational design of metal-based materials with strain engineering for electrochemical energy storage.展开更多
The fabrication and characterization of strained-Si material grown on a relaxed Si0.79 Ge0.21/graded Si1-x- Gex/Si virtual substrate, using reduced pressure chemical vapor deposition, are presented. The Ge concentrati...The fabrication and characterization of strained-Si material grown on a relaxed Si0.79 Ge0.21/graded Si1-x- Gex/Si virtual substrate, using reduced pressure chemical vapor deposition, are presented. The Ge concentration of the constant composition SiGe layer and the grading rate of the graded SiGe layer are estimated with double-crystal X-ray diffraction and further confirmed by SIMS measurements. The surface root mean square roughness of the strained Si cap layer is 2.36nm,and the strain is about 0.83% as determined by atomic force microscopy and Raman spectra, respectively. The threading dislocation density is on the order of 4 × 10^4cm^-2. Furthermore, it is found that the stress in the strained Si cap layer is maintained even after the high thermal budget process, nMOSFET devices are fabricated and measured in strained-Si and unstrained bulk-Si channels. Compared to the co-processed bulk-Si MOSFETs at room temperature,a significant low vertical field mobility enhancement of about 85% is observed in the strained-Si devices.展开更多
We investigate the binding energies of excitons in a strained （111）-oriented zinc-blende GaN/Al0.3 Ga0.7 N quantum well screened by the electron-hole （e-h） gas under hydrostatic pressure by combining a variational...We investigate the binding energies of excitons in a strained （111）-oriented zinc-blende GaN/Al0.3 Ga0.7 N quantum well screened by the electron-hole （e-h） gas under hydrostatic pressure by combining a variational method and a selfconsistent procedure. A built-in electric field produced by the strain-induced piezoelectric polarization is considered in our calculations. The result indicates that the binding energies of excitons increase nearly linearly with pressure,even though the modification of strain with hydrostatic pressure is considered, and the influence of pressure is more apparent under higher e-h densities. It is also found that as the density of an e-h gas increases,the binding energies first increase slowly to a maximum and then decrease rapidly when the e-h density is larger than about 1 ×10^11 cm^-2. The excitonic binding energies increase obviously as the barrier thickness decreases due to the decrease of the built-in electric field.展开更多
Based on an analysis of symmetry, the dispersion relations near the Ai valley in strained Si1-x Gex （0≤x〈0.45）/ （001）, （111）, （101）Si are derived using the KP method with perturbation theory. These relations...Based on an analysis of symmetry, the dispersion relations near the Ai valley in strained Si1-x Gex （0≤x〈0.45）/ （001）, （111）, （101）Si are derived using the KP method with perturbation theory. These relations demonstrate that △^i levels in strained Si1-x Gex are different from the △1 level in relaxed Si1-x Gex, while the longitudinal and transverse masses （m1^＊ and mt^＊ ） are unchanged under strain. The energy shift between the △^i levels and the △1 level follows the linear deformation potential theory. Finally,a description of the conduction band （CB） edge in biaxially strained layers is given.展开更多
A band edge model in （101）-biaxial strained Si on relaxed Si1-x Gex alloy,or monoclinic Si （m-Si）,is presented using the k · p perturbation method coupled with deformation potential theory. Results show that ...A band edge model in （101）-biaxial strained Si on relaxed Si1-x Gex alloy,or monoclinic Si （m-Si）,is presented using the k · p perturbation method coupled with deformation potential theory. Results show that the [001], [001], [100], [100] valleys constitute the conduction band （CB） edge,which moves up in electron energy as the Ge fraction （x） increases. Furthermore,the CB splitting energy is in direct proportion to x and all the valence band （VB） edges move up in electron energy as x increases. In addition, the decrease in the indirect bandgap and the increase in the VB edge splitting energy as x increases are found. The quantitative data from the models supply valuable references for the design of the devices.展开更多
GSMBE grown 1 84 micron wavelength InGaAs/InGaAsP/InP strained quantum well lasers are reported. Lasers with 800 micron long cavity and 40 micron wide planar electrical stripe have been operated under the pulsed r...GSMBE grown 1 84 micron wavelength InGaAs/InGaAsP/InP strained quantum well lasers are reported. Lasers with 800 micron long cavity and 40 micron wide planar electrical stripe have been operated under the pulsed regime at room temperature. At 20℃, the threshold current density is 3 8kA/cm 2 and the external different quantum efficiency is 9 3%.展开更多
Based on the analysis of vertical electric potential distribution across the dual-channel strained p-type Si/strained Si1-xGex/relaxd Si1-yGey（s-Si/s-SiGe/Si1-yGey） metal-oxide-semiconductor field-effect transistor ...Based on the analysis of vertical electric potential distribution across the dual-channel strained p-type Si/strained Si1-xGex/relaxd Si1-yGey（s-Si/s-SiGe/Si1-yGey） metal-oxide-semiconductor field-effect transistor （PMOSFET）, analytical expressions of the threshold voltages for buried channel and surface channel are presented. And the maximum allowed thickness of s-Si is given, which can ensure that the strong inversion appears earlier in the buried channel （compressive strained SiGe） than in the surface channel （tensile strained Si）, because the hole mobility in the buried channel is higher than that in the surface channel. Thus they offer a good accuracy as compared with the results of device simulator ISE. With this model, the variations of threshold voltage and maximum allowed thickness of s-Si with design parameters can be predicted, such as Ge fraction, layer thickness, and doping concentration. This model can serve as a useful tool for p-channel s-Si/s-SiGe/Si1-yGey metal-oxide-semiconductor field-effect transistor （MOSFET） designs.展开更多
The valence subband energies and wave functions of a tensile strained quantum well are calculated by the plane wave expansion method within the 6×6 Luttinger Kohn model.The effect of the number and period of pla...The valence subband energies and wave functions of a tensile strained quantum well are calculated by the plane wave expansion method within the 6×6 Luttinger Kohn model.The effect of the number and period of plane waves used for expansion on the stability of energy eigenvalues is examined.For practical calculation,it should choose the period large sufficiently to ensure the envelope functions vanish at the boundary and the number of plane waves large enough to ensure the energy eigenvalues keep unchanged within a prescribed range.展开更多
An analytical model of electron mobility for strained-silicon channel nMOSFETs is proposed in this paper. The model deals directly with the strain tensor,and thus is independent of the manufacturing process. It is sui...An analytical model of electron mobility for strained-silicon channel nMOSFETs is proposed in this paper. The model deals directly with the strain tensor,and thus is independent of the manufacturing process. It is suitable for （100〉/ 〈110） channel nMOSFETs under biaxial or （100〉/〈 110 ） uniaxial stress and can be implemented in conventional device simulation tools .展开更多
A semiconductor optical amplifier gate based on tensile strained quasi bulk InGaAs is developed.At injection current of 80mA,a 3dB optical bandwidth of more than 85nm is achieved due to dominant band filling effect...A semiconductor optical amplifier gate based on tensile strained quasi bulk InGaAs is developed.At injection current of 80mA,a 3dB optical bandwidth of more than 85nm is achieved due to dominant band filling effect.Moreover,the most important is that very low polarization dependence of gain (<0 7dB),fiber to fiber lossless operation current (70～90mA) and a high extinction ratio (>50dB) are simultaneously obtained over this wide 3dB optical bandwidth (1520～1609nm) which nearly covers the spectral region of the whole C band (1525～1565nm) and the whole L band (1570～1610nm).The gating time is also improved by decreasing carrier lifetime.The wide band polarization insensitive SOA gate is promising for use in future dense wavelength division multiplexing (DWDM) communication systems.展开更多
The compressively strained InGaAs/InGaAsP quantum well distributed feedback laser with ridge-wave- guide is fabricated at 1.74μm. It is grown by low-pressure metal organic chemical vapor deposition（MOCVD）. A strain...The compressively strained InGaAs/InGaAsP quantum well distributed feedback laser with ridge-wave- guide is fabricated at 1.74μm. It is grown by low-pressure metal organic chemical vapor deposition（MOCVD）. A strain buffer layer is used to avoid indium segregation. The threshold current of the device uncoated with length of 300μm is 11.5mA. The maximum output power is 14mW at 100mA. A side mode suppression ratio of 35.5dB is obtained.展开更多
The feature of conduction band （CB） of Tensile-Strained Si（TS-Si） on a relaxed Si1-xGex substrate is systematically investigated, including the number of equivalent CB edge energy extrema, CB energy minima, the po...The feature of conduction band （CB） of Tensile-Strained Si（TS-Si） on a relaxed Si1-xGex substrate is systematically investigated, including the number of equivalent CB edge energy extrema, CB energy minima, the position of the extremal point, and effective mass. Based on an analysis of symmetry under strain, the number of equivalent CB edge energy extrema is presented; Using the K.P method with the help of perturbation theory, dispersion relation near minima of CB bottom energy, derived from the linear deformation potential theory, is determined, from which the parameters, namely, the position of the extremal point, and the longitudinal and transverse masses （m1^＊ and mt^＊）are obtained.展开更多
A novel vertical stack heterostructure CMOSFET is investigated, which is structured by strained SiGe/Si with a hole quantum well channel in the compressively strained Sil-xGex layer for p-MOSFET and an electron quantu...A novel vertical stack heterostructure CMOSFET is investigated, which is structured by strained SiGe/Si with a hole quantum well channel in the compressively strained Sil-xGex layer for p-MOSFET and an electron quantum well channel in the tensile strained Si layer for n-MOSFET. The device possesses several advantages including： 1） the integration of electron quantum well channel with hole quantum well channel into the same vertical layer structure; 2） the gate work function modifiability due to the introduction of poly-SiGe as a gate material; 3） better transistor matching; and 4） flexibility of layout design of CMOSFET by adopting exactly the same material lays for both n-channel and p-channel. The MEDICI simulation result shows that p-MOSFET and n-MOSFET have approximately the same matching threshold voltages. Nice performances are displayed in transfer characteristic, transconductance and cut-off frequency. In addition, its operation as an inverter confirms the CMOSFET structured device to be normal and effective in function.展开更多
Based on the exact resultant solution of two-dimensional Poisson＇s equation in strained Si and Si1-xCex layer, a simple and accurate two-dimensional.analytical model including surface channel potential, surface chann...Based on the exact resultant solution of two-dimensional Poisson＇s equation in strained Si and Si1-xCex layer, a simple and accurate two-dimensional.analytical model including surface channel potential, surface channel electric field, threshold voltage and subthreshold swing for fully depleted gate stack strained Si on silicon-germanium-on-insulator （SGOI） MOSFETs has been developed. The results show that this novel structure can suppress the short channel effects （SCE）, the drain-induced barrier-lowering （DIBL） and improve the subthreshold performance in nanoelectronics application. The model is verified by numerical simulation. The model provides the basic designing guidance of gate stack strained Si on SGOI MOSFETs.展开更多
Constrained groove pressing（CGP） is a new severe plastic deformation method suitable for producing ultra-fine grained sheet metals. In this work, the processing efficiency for a muti-pass CGP of pure copper was inve...Constrained groove pressing（CGP） is a new severe plastic deformation method suitable for producing ultra-fine grained sheet metals. In this work, the processing efficiency for a muti-pass CGP of pure copper was investigated. With a relatively small groove width of 2 mm and tight constraint, a sharp variation of mechanical properties with pass number is observed. Subgrains with the size of＊0.5 lm have distinct boundaries, which is the predominant feature in the microstructure after three passes. The evolution of deformation homogeneity characterized by micro-hardness distribution was examined in detail.Observations of optical micrographs and fracture surface morphology confirm the evolution rule. The relation between electrical resistivity and accumulative plastic strain was discussed. Crystalline defects, micro-cracks, and microstructure uniformity together determine the change of electrical resistivity of CGP copper.展开更多
The electronic structures of (CdSe)n/(ZnSe)m strained-lager soperfattice (SLS) were investigated by the recursion method in the tight-bindiop opproximation. The total,local, and partial density of states were calculat...The electronic structures of (CdSe)n/(ZnSe)m strained-lager soperfattice (SLS) were investigated by the recursion method in the tight-bindiop opproximation. The total,local, and partial density of states were calculated for n=1, m=5.The total density of states (TDOS) for bulk CdSe, ZnSe and n=1, 3, m=1, 3, 5, for SLS were investigated.Fermi energy, the band gap, the valence of an atom, and the ionization potential and the electron affinity were discassed.展开更多
In this study,the conversion efficiency(CE),open-circuit voltage(V_(OC))and short-circuit current density(J_(SC))of wurtzite In_(x)Ga_(1-x)N/ZnSnN_(2)core/shell quantum dot(QD)solar cells are studied by using the deta...In this study,the conversion efficiency(CE),open-circuit voltage(V_(OC))and short-circuit current density(J_(SC))of wurtzite In_(x)Ga_(1-x)N/ZnSnN_(2)core/shell quantum dot(QD)solar cells are studied by using the detailed balance model.The effects of strain and external electric field have been considered.The results show that with the increase of the core size,the V_(OC)increases,while the J_(SC)and CE decrease.With the increase of shell size or In content,the V_(OC)decreases,while the J_(SC)and CE increase.In addition,our calculations show that the band gap of QD increases due to strain,which leads to an increase of the V_(OC),but decreases of the CE and J_(SC).By contrast,the situation is opposite under the effect of external electric field.展开更多
The screening effect of the random-phase-approximation on the states of shallow donor impurities in free strained wurtzite GaN/AlxGa1-xN heterojunctions under hydrostatic pressure and an external electric field is inv...The screening effect of the random-phase-approximation on the states of shallow donor impurities in free strained wurtzite GaN/AlxGa1-xN heterojunctions under hydrostatic pressure and an external electric field is investigated by using a variational method and a simplified coherent potential approximation. The variations of Stark energy shift with electric field, impurity position, A1 component and areal electron density are discussed. Our results show that the screening dramatically reduces both the blue and red shifts as well as the binding energies of impurity states. For a given impurity position, the change in binding energy is more sensitive to the increase in hydrostatic pressure in the presence of the screening effect than that in the absence of the screening effect. The weakening of the blue and red shifts, induced by the screening effect, strengthens gradually with the increase of electric field. Furthermore, the screening effect weakens the mixture crystal effect, thereby influencing the Stark effect. The screening effect strengthens the influence of energy band bending on binding energy due to the areal electron density.展开更多
The effect of bismuth on the optical properties of InGaAsBi/GaAs quantum well structures is investigated using the temperature-dependent photoluminescence from 12 K to 450 K.The incorporation of bismuth in the InGaAsB...The effect of bismuth on the optical properties of InGaAsBi/GaAs quantum well structures is investigated using the temperature-dependent photoluminescence from 12 K to 450 K.The incorporation of bismuth in the InGaAsBi quantum well is confirmed and found to result in a red shift of photoluminescence wavelength of 27.3 meV at 300 K.The photoluminescence intensity is significantly enhanced by about 50 times at 12 K with respect to that of the InGaAs quantum well due to the surfactant effect of bismuth.The temperature-dependent integrated photoluminescence intensities of the two samples reveal different behaviors related to various non-radiative recombination processes.The incorporation of bismuth also induces alloy non-uniformity in the quantum well,leading to an increased photoluminescence linewidth.展开更多
基金Project supported by the National Natural Science Foundation of China(Grant Nos.92265113,12034018,12474490,and 62404248)the Innovation Program for Quantum Science and Technology(Grant No.2021ZD0302300)。
文摘Strained germanium hole spin qubits are promising for quantum computing,but the devices hosting these qubits face challenges from high interface trap density,which originates from the naturally oxidized surface of the wafer.These traps can degrade the device stability and cause an excessively high threshold voltage.Surface passivation is regarded as an effective method to mitigate these impacts.In this study,we perform low-thermal-budget chemical passivation using the nitric acid oxidation of silicon method on the surface of strained germanium devices and investigate the impact of passivation on the device stability.The results demonstrate that surface passivation effectively reduces the interface defect density.This not only improves the stability of the device's threshold voltage but also enhances its long-term static stability.Furthermore,we construct a band diagram of hole surface tunneling at the static operating point to gain a deeper understanding of the physical mechanism through which passivation affects the device stability.This study provides valuable insights for future optimization of strained Ge-based quantum devices and advances our understanding of how interface states affect device stability.
基金supported by the National Natural Science Foundation of China(52002366,22075263,22571288)the Fundamental Research Funds for the Central Universities(WK2060000091,WK2060250115,WK2060000039)the Students’Innovation and Entrepreneurship Foundation of USTC(CY2023C021).
文摘The slow kinetics of the cathode CO_(2) reduction reaction and the decomposition reaction of Li2CO3,a widebandwidth insulating product,lead to difficult CO_(2) capture and high charging potential in Li-CO_(2) batteries.To improve the reaction kinetics and decrease the reaction overpotential,we synthesized mesoporous Pt nanosheets with high tensile strain.The presence of many unsaturated coordinated Pt atoms around the pores gives rise to tensile strain in the mesoporous Pt nanosheets.This tensile strain plays a key role in regulating the interactions between the catalytic surface of Pt and the adsorbed intermediates.The two-dimensional structure provides more active sites on the surface for the catalytic reactions.These superiorities enable a low overpotential of 0.36 V at a cutoff capacity of 100μAh·cm^(−2) at a current density of 10μA·cm^(−2) over more than 2000 h.This study opens new possibilities for the rational design of metal-based materials with strain engineering for electrochemical energy storage.
文摘The fabrication and characterization of strained-Si material grown on a relaxed Si0.79 Ge0.21/graded Si1-x- Gex/Si virtual substrate, using reduced pressure chemical vapor deposition, are presented. The Ge concentration of the constant composition SiGe layer and the grading rate of the graded SiGe layer are estimated with double-crystal X-ray diffraction and further confirmed by SIMS measurements. The surface root mean square roughness of the strained Si cap layer is 2.36nm,and the strain is about 0.83% as determined by atomic force microscopy and Raman spectra, respectively. The threading dislocation density is on the order of 4 × 10^4cm^-2. Furthermore, it is found that the stress in the strained Si cap layer is maintained even after the high thermal budget process, nMOSFET devices are fabricated and measured in strained-Si and unstrained bulk-Si channels. Compared to the co-processed bulk-Si MOSFETs at room temperature,a significant low vertical field mobility enhancement of about 85% is observed in the strained-Si devices.
文摘We investigate the binding energies of excitons in a strained （111）-oriented zinc-blende GaN/Al0.3 Ga0.7 N quantum well screened by the electron-hole （e-h） gas under hydrostatic pressure by combining a variational method and a selfconsistent procedure. A built-in electric field produced by the strain-induced piezoelectric polarization is considered in our calculations. The result indicates that the binding energies of excitons increase nearly linearly with pressure,even though the modification of strain with hydrostatic pressure is considered, and the influence of pressure is more apparent under higher e-h densities. It is also found that as the density of an e-h gas increases,the binding energies first increase slowly to a maximum and then decrease rapidly when the e-h density is larger than about 1 ×10^11 cm^-2. The excitonic binding energies increase obviously as the barrier thickness decreases due to the decrease of the built-in electric field.
文摘Based on an analysis of symmetry, the dispersion relations near the Ai valley in strained Si1-x Gex （0≤x〈0.45）/ （001）, （111）, （101）Si are derived using the KP method with perturbation theory. These relations demonstrate that △^i levels in strained Si1-x Gex are different from the △1 level in relaxed Si1-x Gex, while the longitudinal and transverse masses （m1^＊ and mt^＊ ） are unchanged under strain. The energy shift between the △^i levels and the △1 level follows the linear deformation potential theory. Finally,a description of the conduction band （CB） edge in biaxially strained layers is given.
基金the National Ministries and Commissions of China(Nos.51308040203,9140A08060407DZ0103)~~
文摘A band edge model in （101）-biaxial strained Si on relaxed Si1-x Gex alloy,or monoclinic Si （m-Si）,is presented using the k · p perturbation method coupled with deformation potential theory. Results show that the [001], [001], [100], [100] valleys constitute the conduction band （CB） edge,which moves up in electron energy as the Ge fraction （x） increases. Furthermore,the CB splitting energy is in direct proportion to x and all the valence band （VB） edges move up in electron energy as x increases. In addition, the decrease in the indirect bandgap and the increase in the VB edge splitting energy as x increases are found. The quantitative data from the models supply valuable references for the design of the devices.
文摘GSMBE grown 1 84 micron wavelength InGaAs/InGaAsP/InP strained quantum well lasers are reported. Lasers with 800 micron long cavity and 40 micron wide planar electrical stripe have been operated under the pulsed regime at room temperature. At 20℃, the threshold current density is 3 8kA/cm 2 and the external different quantum efficiency is 9 3%.
基金Project supported by the National Defence Pre-research Foundation of China (Grant Nos. 51308040203,9140A08060407DZ0103,and 6139801)
文摘Based on the analysis of vertical electric potential distribution across the dual-channel strained p-type Si/strained Si1-xGex/relaxd Si1-yGey（s-Si/s-SiGe/Si1-yGey） metal-oxide-semiconductor field-effect transistor （PMOSFET）, analytical expressions of the threshold voltages for buried channel and surface channel are presented. And the maximum allowed thickness of s-Si is given, which can ensure that the strong inversion appears earlier in the buried channel （compressive strained SiGe） than in the surface channel （tensile strained Si）, because the hole mobility in the buried channel is higher than that in the surface channel. Thus they offer a good accuracy as compared with the results of device simulator ISE. With this model, the variations of threshold voltage and maximum allowed thickness of s-Si with design parameters can be predicted, such as Ge fraction, layer thickness, and doping concentration. This model can serve as a useful tool for p-channel s-Si/s-SiGe/Si1-yGey metal-oxide-semiconductor field-effect transistor （MOSFET） designs.
文摘The valence subband energies and wave functions of a tensile strained quantum well are calculated by the plane wave expansion method within the 6×6 Luttinger Kohn model.The effect of the number and period of plane waves used for expansion on the stability of energy eigenvalues is examined.For practical calculation,it should choose the period large sufficiently to ensure the envelope functions vanish at the boundary and the number of plane waves large enough to ensure the energy eigenvalues keep unchanged within a prescribed range.
文摘An analytical model of electron mobility for strained-silicon channel nMOSFETs is proposed in this paper. The model deals directly with the strain tensor,and thus is independent of the manufacturing process. It is suitable for （100〉/ 〈110） channel nMOSFETs under biaxial or （100〉/〈 110 ） uniaxial stress and can be implemented in conventional device simulation tools .
文摘A semiconductor optical amplifier gate based on tensile strained quasi bulk InGaAs is developed.At injection current of 80mA,a 3dB optical bandwidth of more than 85nm is achieved due to dominant band filling effect.Moreover,the most important is that very low polarization dependence of gain (<0 7dB),fiber to fiber lossless operation current (70～90mA) and a high extinction ratio (>50dB) are simultaneously obtained over this wide 3dB optical bandwidth (1520～1609nm) which nearly covers the spectral region of the whole C band (1525～1565nm) and the whole L band (1570～1610nm).The gating time is also improved by decreasing carrier lifetime.The wide band polarization insensitive SOA gate is promising for use in future dense wavelength division multiplexing (DWDM) communication systems.
文摘The compressively strained InGaAs/InGaAsP quantum well distributed feedback laser with ridge-wave- guide is fabricated at 1.74μm. It is grown by low-pressure metal organic chemical vapor deposition（MOCVD）. A strain buffer layer is used to avoid indium segregation. The threshold current of the device uncoated with length of 300μm is 11.5mA. The maximum output power is 14mW at 100mA. A side mode suppression ratio of 35.5dB is obtained.
文摘The feature of conduction band （CB） of Tensile-Strained Si（TS-Si） on a relaxed Si1-xGex substrate is systematically investigated, including the number of equivalent CB edge energy extrema, CB energy minima, the position of the extremal point, and effective mass. Based on an analysis of symmetry under strain, the number of equivalent CB edge energy extrema is presented; Using the K.P method with the help of perturbation theory, dispersion relation near minima of CB bottom energy, derived from the linear deformation potential theory, is determined, from which the parameters, namely, the position of the extremal point, and the longitudinal and transverse masses （m1^＊ and mt^＊）are obtained.
文摘A novel vertical stack heterostructure CMOSFET is investigated, which is structured by strained SiGe/Si with a hole quantum well channel in the compressively strained Sil-xGex layer for p-MOSFET and an electron quantum well channel in the tensile strained Si layer for n-MOSFET. The device possesses several advantages including： 1） the integration of electron quantum well channel with hole quantum well channel into the same vertical layer structure; 2） the gate work function modifiability due to the introduction of poly-SiGe as a gate material; 3） better transistor matching; and 4） flexibility of layout design of CMOSFET by adopting exactly the same material lays for both n-channel and p-channel. The MEDICI simulation result shows that p-MOSFET and n-MOSFET have approximately the same matching threshold voltages. Nice performances are displayed in transfer characteristic, transconductance and cut-off frequency. In addition, its operation as an inverter confirms the CMOSFET structured device to be normal and effective in function.
基金Project supported by the National Natural Science Foundation of China (Grant Nos. 60976068 and 60936005)the Cultivation Fund of the Key Scientific and Technical Innovation Project, Ministry of Education of China (Grant No. 708083)the Specialized Research Fund for the Doctoral Program of Higher Education of China (Grant No. 200807010010)
文摘Based on the exact resultant solution of two-dimensional Poisson＇s equation in strained Si and Si1-xCex layer, a simple and accurate two-dimensional.analytical model including surface channel potential, surface channel electric field, threshold voltage and subthreshold swing for fully depleted gate stack strained Si on silicon-germanium-on-insulator （SGOI） MOSFETs has been developed. The results show that this novel structure can suppress the short channel effects （SCE）, the drain-induced barrier-lowering （DIBL） and improve the subthreshold performance in nanoelectronics application. The model is verified by numerical simulation. The model provides the basic designing guidance of gate stack strained Si on SGOI MOSFETs.
基金financially supported by the National Natural Science Foundation of China (No.51375269)Program for New Century Excellent Talents in University (No.NCET-080337)Graduate Independent Innovation Foundation of Shandong University (No. yzc12122)
文摘Constrained groove pressing（CGP） is a new severe plastic deformation method suitable for producing ultra-fine grained sheet metals. In this work, the processing efficiency for a muti-pass CGP of pure copper was investigated. With a relatively small groove width of 2 mm and tight constraint, a sharp variation of mechanical properties with pass number is observed. Subgrains with the size of＊0.5 lm have distinct boundaries, which is the predominant feature in the microstructure after three passes. The evolution of deformation homogeneity characterized by micro-hardness distribution was examined in detail.Observations of optical micrographs and fracture surface morphology confirm the evolution rule. The relation between electrical resistivity and accumulative plastic strain was discussed. Crystalline defects, micro-cracks, and microstructure uniformity together determine the change of electrical resistivity of CGP copper.
文摘The electronic structures of (CdSe)n/(ZnSe)m strained-lager soperfattice (SLS) were investigated by the recursion method in the tight-bindiop opproximation. The total,local, and partial density of states were calculated for n=1, m=5.The total density of states (TDOS) for bulk CdSe, ZnSe and n=1, 3, m=1, 3, 5, for SLS were investigated.Fermi energy, the band gap, the valence of an atom, and the ionization potential and the electron affinity were discassed.
基金supported by the National Natural Science Foundation of China(No.12164033)the Natural Science Foundation of Inner Mongolia(Nos.2019MS01006 and 2020MS01008)。
文摘In this study,the conversion efficiency(CE),open-circuit voltage(V_(OC))and short-circuit current density(J_(SC))of wurtzite In_(x)Ga_(1-x)N/ZnSnN_(2)core/shell quantum dot(QD)solar cells are studied by using the detailed balance model.The effects of strain and external electric field have been considered.The results show that with the increase of the core size,the V_(OC)increases,while the J_(SC)and CE decrease.With the increase of shell size or In content,the V_(OC)decreases,while the J_(SC)and CE increase.In addition,our calculations show that the band gap of QD increases due to strain,which leads to an increase of the V_(OC),but decreases of the CE and J_(SC).By contrast,the situation is opposite under the effect of external electric field.
基金Project supported by the National Natural Science Foundation of China (Grant No 60566002)the Specialized Research Fundfor the Doctoral Program of Higher Education of China (Grant No 20070126001)
文摘The screening effect of the random-phase-approximation on the states of shallow donor impurities in free strained wurtzite GaN/AlxGa1-xN heterojunctions under hydrostatic pressure and an external electric field is investigated by using a variational method and a simplified coherent potential approximation. The variations of Stark energy shift with electric field, impurity position, A1 component and areal electron density are discussed. Our results show that the screening dramatically reduces both the blue and red shifts as well as the binding energies of impurity states. For a given impurity position, the change in binding energy is more sensitive to the increase in hydrostatic pressure in the presence of the screening effect than that in the absence of the screening effect. The weakening of the blue and red shifts, induced by the screening effect, strengthens gradually with the increase of electric field. Furthermore, the screening effect weakens the mixture crystal effect, thereby influencing the Stark effect. The screening effect strengthens the influence of energy band bending on binding energy due to the areal electron density.
基金Project supported by the National Basic Research Program of China (Grant No. 2012CB619200)the National Natural Science Foundation of China (Grant Nos. 61275113,61204133,and 60906047)+1 种基金the Innovative Founding of Shanghai Institute of Microsystem and Information Technology,Chinese Academy of Sciencesthe Swedish Research Council
文摘The effect of bismuth on the optical properties of InGaAsBi/GaAs quantum well structures is investigated using the temperature-dependent photoluminescence from 12 K to 450 K.The incorporation of bismuth in the InGaAsBi quantum well is confirmed and found to result in a red shift of photoluminescence wavelength of 27.3 meV at 300 K.The photoluminescence intensity is significantly enhanced by about 50 times at 12 K with respect to that of the InGaAs quantum well due to the surfactant effect of bismuth.The temperature-dependent integrated photoluminescence intensities of the two samples reveal different behaviors related to various non-radiative recombination processes.The incorporation of bismuth also induces alloy non-uniformity in the quantum well,leading to an increased photoluminescence linewidth.
