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Studies on high-moment soft magnetic FeCo/Co thin films
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作者 付煜 杨正 +2 位作者 松本光功 刘小晰 森迫昭光 《Chinese Physics B》 SCIE EI CAS CSCD 2006年第6期1351-1355,共5页
The dependences of soft magnetic properties and microstructures of the sputtered FeCo (=Fe65Co35) films on Co underlayer thickness tCo, FeCo thickness tFeCo, substrate temperature Ts and taxget-substrate spacing dT-... The dependences of soft magnetic properties and microstructures of the sputtered FeCo (=Fe65Co35) films on Co underlayer thickness tCo, FeCo thickness tFeCo, substrate temperature Ts and taxget-substrate spacing dT-s are studied. FeCo single layer generally shows a high coercivity with no obvious magnetic anisotropy. Excellent soft magnetic properties with saturation magnetization μ0Ms of 2.35 T and hard axis coercivity Hch of 0.25 kA/m in FeCo films can be achieved by introducing a Co underlayer. It is shown that sandwiching a Co underlayer causes a change in orientation and reduction in grain size from 70 nm to about 10 nm in the FeCo layer. The magnetic softness can be explained by the Hoffmann's ripple theory due to the effect of grain size. The magnetic anisotropy can be controlled by changing dT-S, and a maximum of 14.3 kA/m for anisotropic field Hk is obtained with dT-S=18.0 cm. 展开更多
关键词 FeCo film sputtering conditions high saturation magnetization soft magnetic properties
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PREPARATION OF NANO-CRYSTALLINE Fe-Cu THIN FILMS AND THEIR MAGNETIC PROPERTIES
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作者 X.F. Bi S.K. Gong +1 位作者 H.B. Xu K.I 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2002年第1期109-112,共4页
Fe-Cu thin films of 0.2 mum in thickness with different Cu contents wereprepared by using r.f. magnetron sputtering onto glass substrate. The effect of sputteringparameters, including Ar gas pressure and input rf powe... Fe-Cu thin films of 0.2 mum in thickness with different Cu contents wereprepared by using r.f. magnetron sputtering onto glass substrate. The effect of sputteringparameters, including Ar gas pressure and input rf power, on the structure and magnetic propertieswas investigated. It was found that when the power is lower than 70W, the structure of the filmsremained single bcc-Fe phase with Cu solubility of up to 50at. percent. TEM observations for thebcc-Fe phase showed that the grain size was in the nanometer range of less than 20nm. The coercivityof Fe- Cu films was largely affected by not only Ar gas pressure but also rf power, and reachedabout 2.5Oe in the pressure of 0.67-6.67Pa and in the power of less than 100W. In addition,saturation magnetization, with Cu content less than 60at. percent, was about proportional to thecontent of bcc-Fe. When Cu content was at 60at. percent, however, saturation magnetization was muchsmaller than its calculation value. 展开更多
关键词 Fe-Cu thin film magnetic property sputtering condition NANO-CRYSTALLINE
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