ZrCoRE(RE denotes rare earth elements)non-evaporable getter films have significant applications in vacuum packaging of micro-electro mechanical system devices because of their excellent gas adsorption performance,low ...ZrCoRE(RE denotes rare earth elements)non-evaporable getter films have significant applications in vacuum packaging of micro-electro mechanical system devices because of their excellent gas adsorption performance,low activation temperature and environmental friendliness.The films were deposited using DC magnetron sputtering with argon and krypton gases under various deposition pressures.The effects of sputtering gas type and pressure on the morphology and hydrogen adsorption performance of ZrCoRE films were investigated.Results show that the films prepared in Ar exhibit a relatively dense structure with fewer grain boundaries.The increase in Ar pressure results in more grain boundaries and gap structures in the films.In contrast,films deposited in Kr display a higher density of grain boundaries and cluster structures,and the films have an obvious columnar crystal structure,with numerous interfaces and gaps distributed between the columnar structures,providing more paths for gas diffusion.As Kr pressure increases,the film demonstrates more pronounced continuous columnar structure growth,accompanied by deeper and wider grain boundaries.This structural configuration provides a larger specific surface area,which significantly improves the hydrogen adsorption speed and capacity.Consequently,high Ar and Kr pressures are beneficial to improve the adsorption performance.展开更多
Widely used spin-coated nickle oxide (NiOx) based perovskite solar cells often suffer from severe interfacial reactions between the NiOxand adjacent perovskite layers due to surface defect states,which inherently impa...Widely used spin-coated nickle oxide (NiOx) based perovskite solar cells often suffer from severe interfacial reactions between the NiOxand adjacent perovskite layers due to surface defect states,which inherently impair device performance in a long-term view,even with surface molecule passivation.In this study,we developed high-quality magnetron-sputtered NiOxthin films through detailed process optimization,and compared systematically sputtered and spin-coated NiOxthin film surfaces from materials to devices.These sputtered NiOxfilms exhibit improved crystallinity,smoother surfaces,and significantly reduced Ni3+or Ni vacancies compared to their spin-coated counterparts.Consequently,the interface between the perovskite and sputtered NiOxfilm shows a substantially reduced density of defect states.Perovskite solar cells (PSCs) fabricated with our optimally sputtered NiOxfilms achieved a high power conversion efficiency (PCE) of up to 19.93%and demonstrated enhanced stability,maintaining 86.2% efficiency during 500 h of maximum power point tracking under one standard sun illumination.Moreover,with the surface modification using (4-(2,7-dibromo-9,9-dimethylacridin-10(9H)-yl)butyl)p hosphonic acid (DMAcPA),the device PCE was further promoted to 23.07%,which is the highest value reported for sputtered NiOxbased PSCs so far.展开更多
In this work,we present an innovative method for fabricating high-performance proton-conductive fuel cells(PCFCs)by combining magnetron sputtering and flashlight sintering(FLS)techniques.BaZr_(0.8)Y_(0.2)O_(3–δ)(BZY...In this work,we present an innovative method for fabricating high-performance proton-conductive fuel cells(PCFCs)by combining magnetron sputtering and flashlight sintering(FLS)techniques.BaZr_(0.8)Y_(0.2)O_(3–δ)(BZY20)electrolyte thin-films are successfully prepared by improving the crystallinity while maintaining the stoichiometry.All components of PCFC,Ni-YSZ anode,BZY20 electrolyte and Pt-GDC cathode are fabricated by sequentially sputtering them onto an AAO substrate.Electrolytic sintering is performed at 550 and 650 V conditions using FLS,effectively solving the Ba evaporation problem encountered in conventional thermal sintering methods.XRD analysis confirms that the perovskite structure is retained,and crystallinity is improved in the FLS samples.Furthermore,FE-SEM and EDS analyses confirm the uniform elemental distribution and consistent thickness of the FLS-treated electrolyte.An optimized PCFC unit cell with FLS-treated electrolyte exhibits a peak power density of 200.0 mW cm^(-2) at 500℃ and an ohmic resistance of 376.0 mΩ cm^(-2).These results suggest that the combination of magnetron sputtering and FLS techniques is a promising approach for fabricating highperformance thin-film PCFCs.展开更多
Copper is a versatile material,commonly utilized in power transmission and electronic devices,but its relative high reactivity necessitates a long-lasting protective technique.Here,we report a method that combines pla...Copper is a versatile material,commonly utilized in power transmission and electronic devices,but its relative high reactivity necessitates a long-lasting protective technique.Here,we report a method that combines plasma-enhanced non-equilibrium magnetron sputtering physical vapor deposition(PEUMS-PVD)and anodization to construct a self-healing three-dimensional Ti/Al-doped TiO_(2)nanotubes/Ti_(3)AlC_(2)coating on the surface of Cu substrates.This novel strategy enhances the corrosion resistance of copper substrates in marine environments,with corrosion current densities of up to 4.5643×10^(−8)A/cm^(2).Among them,the doping of nano-aluminum particles makes the coating self-healing.The mechanistic analysis of the corrosion behaviors during early immersion experiments was conducted using electrochemical noise,and revealed that during the initial stages of coating immersion,uniform corrosion predominates,with a minor occurrence of localized corrosion.展开更多
We deposited indium-tin-oxide(ITO)films on silicon and quartz substrates by magnetron sputtering technology in pure argon.Using electrostatic quadrupole plasma diagnostic technology,we investigate the effects of disch...We deposited indium-tin-oxide(ITO)films on silicon and quartz substrates by magnetron sputtering technology in pure argon.Using electrostatic quadrupole plasma diagnostic technology,we investigate the effects of discharge power and discharge pressure on the ion flux and energy distribution function of incidence on the substrate surface,with special attention to the production of high-energy negative oxygen ions,and elucidate the mechanism behind its production.At the same time,the structure and properties of ITO films are systematically characterized to understand the potential effects of high energy oxygen ions on the growth of ITO films.Combining with the kinetic property analysis of sputtering damage mechanism of transparent conductive oxide(TCO)thin films,this study provides valuable physical understanding of optimization of TCO thin film deposition process.展开更多
Cadmium sulfide(CdS)is an n-type semiconductor with excellent electrical conductivity that is widely used as an electron transport material(ETM)in solar cells.At present,numerous methods for preparing CdS thin films h...Cadmium sulfide(CdS)is an n-type semiconductor with excellent electrical conductivity that is widely used as an electron transport material(ETM)in solar cells.At present,numerous methods for preparing CdS thin films have emerged,among which magnetron sputtering(MS)is one of the most commonly used vacuum techniques.For this type of technique,the substrate temperature is one of the key deposition parameters that affects the interfacial properties between the target film and substrate,determining the specific growth habits of the films.Herein,the effect of substrate temperature on the microstructure and electrical properties of magnetron-sputtered CdS(MS-CdS)films was studied and applied for the first time in hydrothermally deposited antimony selenosulfide(Sb_(2)(S,Se)_(3))solar cells.Adjusting the substrate temperature not only results in the design of the flat and dense film with enhanced crystallinity but also leads to the formation of an energy level arrangement with a Sb_(2)(S,Se)_(3)layer that is more favorable for electron transfer.In addition,we developed an oxygen plasma treatment for CdS,reducing the parasitic absorption of the device and resulting in an increase in the short-circuit current density of the solar cell.This study demonstrates the feasibility of MS-CdS in the fabrication of hydrothermal Sb_(2)(S,Se)_(3)solar cells and provides interface optimization strategies to improve device performance.展开更多
Series of TiO 2-ZnO heterojunction composite films with different n（Zn）/n（Ti） ratios were prepared by UDP450 magnetron sputter ion plating equipment, and the mole ratio of Zn to Ti was controlled by adjusting the ...Series of TiO 2-ZnO heterojunction composite films with different n（Zn）/n（Ti） ratios were prepared by UDP450 magnetron sputter ion plating equipment, and the mole ratio of Zn to Ti was controlled by adjusting the current values of sputtering target. The effects of n（Zn）/n（Ti） on the microstructures of TiO2-ZnO films were investigated by SEM, AFM, Raman and XPS, and their photocatalytic decomposition of methyl orange solutions was evaluated. The results show that an increase in n（Zn）/n（Ti） typically results in a decrease in the grain size of composite films firstly and then an increase of grain size, while an increase in n（Zn）/n（Ti） leads to an increase in film roughness firstly and then a decrease in film roughness. Both grain size and roughness of TiO2-ZnO films reach the maximum and minimum at n（Zn）/n（Ti） of 1/9.3, respectively. The n（Zn）/n（Ti） shows little effect on the valences of Zn and Ti elements, which mainly exist in the form of TiO2 and ZnO phases. The n（Zn）/n（Ti） has influence on the amount of anatase/rutile TiO2 heterojunction in the film. With increase of the n（Zn）/n（Ti）, the absorption intensity of the composite film increases and the absorption region extends to 450 nm, which is redshifted as much as 150 nm in comparison with the pure TiO2 films. However, the photocatalytic abilities of heterogeneous composite films do not depend on the n（Zn）/n（Ti） but rather on the microstructures of the TiO2-ZnO composite films. Degradation rate of the film reaches the maximum and the photocatalytic decomposition of pollutants works best when n（Zn）/n（Ti）=1：9.3.展开更多
The isothermal and cyclic oxidation behaviors in air and hot corrosion behaviors in Na2SO4 ＋ 25 wt% K2SO4 salt of M951 cast superalloy and a sputtered nanocrystalline coating of the same material were studied. Scanni...The isothermal and cyclic oxidation behaviors in air and hot corrosion behaviors in Na2SO4 ＋ 25 wt% K2SO4 salt of M951 cast superalloy and a sputtered nanocrystalline coating of the same material were studied. Scanning electron microscopy, energy dispersive X-ray spectroscope, X-ray diffraction, and transmission electron microscopy were employed to examine the morphologies and phase composition of the M951 alloy and nanocrystalline coating before and after oxidation and hot corrosion. The as-sputtered nanocrystalline layer has a homogeneous y phase structure of very fine grain size （30-200 nm） with the preferential growth texture of （111） parallel to the interface. Adherent AI203 rich oxide scale formed on the cast M951 alloy and its sputtered coating after isothermal oxidation at 900 and 1000 ℃. However, when being isothermal oxidized at 1100℃ and cyclic oxidized at 1000 ℃, the oxide scale formed on the cast alloy was a mixture of NiO, NiAl2O4, Al2O3 and Nb205 and spalled seriously, while that formed on the sputtered coating mainly consisted of Al2O3 and was very adherent. Nanocrystallization promoted rapid formation of Al2O3 scale during the early stage of oxidation and enhanced the adhesion of the oxide scale, thus improved the oxidation resistance of the substrate alloy. Serious corrosion occurred for the cast alloy. The sputtered nanocrystalline coating apparently improved the hot corrosion resistance of the cast alloy in the mixed sulfate by the formation of a continuous Al2O3 and Cr2O3 mixed oxide layer on the surface of the coating, and the pre- oxidation treatment of the coating led to an even better effect.展开更多
Indium tin oxide (ITO) films were prepared on polyester, Si and glass substrate with relatively high deposition rate of above 0.9 nm/s by DC reactive magnetron sputtering technique at the sputtering pressure of 0.06 P...Indium tin oxide (ITO) films were prepared on polyester, Si and glass substrate with relatively high deposition rate of above 0.9 nm/s by DC reactive magnetron sputtering technique at the sputtering pressure of 0.06 Pa system, respectively. The dependence of resistivity on deposition parameters, such as deposition rate, target-to-substrate distance (TSD), oxygen flow rate and sputtering time (thickness), has been investigated, together with the structural and the optical properties. It was revealed that all ITO films exhibited lattice expansion. The resistivity of ITO thin films shows significant substrate effect: much lower resistivity and broader process window have been reproducibly achieved for the deposition of ITO films onto polyester rather than those prepared on both Si and glass substrates. The films with resistivity of as low as 4.23 x 10^-4 Ω.cm and average transmittance of ～78% at wavelength of 400～700 nm have been achieved for the films on polyester at room temperature.展开更多
Phase structure of sputtered Ta coating in the negative glow space and LPH effect were explored.The whole coating/substrate system is substrate→physically gas-absorbed Fe surface→oxygen-enriched TaOx layer→amorphou...Phase structure of sputtered Ta coating in the negative glow space and LPH effect were explored.The whole coating/substrate system is substrate→physically gas-absorbed Fe surface→oxygen-enriched TaOx layer→amorphous Ta→αandβdual phase→singleαphase.After LPH course,micro structure of Ta coating shows intact,only a few cracks emerge after 100 laser pulses,exhibiting thin HAZ but thick Fe/Ta ICZ,without martensitic transformation.For the electrodeposited Cr coating,continuous thermal stresses produce many extra micro-crack,substrate oxidation and martensitic transformation,leading to crack propagations and final bulk delamination,without any ICZ.展开更多
The oxidation behavior of sputtered Ni-3Cr-20Al coating at 900℃ in air was investigated. A dense Al2O3 layer was formed on the sputtered Ni-3Cr-20AI coating after 200 h oxidation. However, owing to the segregation of...The oxidation behavior of sputtered Ni-3Cr-20Al coating at 900℃ in air was investigated. A dense Al2O3 layer was formed on the sputtered Ni-3Cr-20AI coating after 200 h oxidation. However, owing to the segregation of Ni3Al during oxidation process at high temperature, the spinel NiAI2O4 was also formed in the Al2O3 layer. It was found that the formation of NiAI204 had no detrimental effect on the oxidation resistance of the sputtered N?3O-20AI coating due to the excellent adhesion shown by the Al2O3 and NiAl2O4complex oxide scale.展开更多
A bond coat for thermal barrier coating (TBC), NiCrAlY coating, is subjected to vac-uum heat treatment in order to remove internal stress before ceramic top coat is de-posited. The effect of vacuum heat treatment on t...A bond coat for thermal barrier coating (TBC), NiCrAlY coating, is subjected to vac-uum heat treatment in order to remove internal stress before ceramic top coat is de-posited. The effect of vacuum heat treatment on the oxidation behavior of the sputtered NiCrAlY coating has been investigated. The as-sputtered NiCrAlY coating consists of γ-Ni and b-NiAl phases. After vacuum heat treatment, the sputtered NiCrAlY coating mainly consists of γ'-Ni3Al, β-NiAl, γ-Ni, and trace of α-Al2O3 phases. The isothermal oxidation of sputtered NiCrAlY coating with and without vacuum heat treatment has been performed at 1000℃. It is shown that a-Al2O3 formed during vacuum heat treatment acts as nuclei for the formation of a-Al2O3, and the protective a-Al2O3 scale is formed more rapidly on the vacuum heat treated NiCrAlY coating than that formed on the untreated coating. Also the a-Al2O3 scale has a better adherence to the vacuum heat treated NiCrAlY coating. Therefore the vacuum heat treatment improves the oxidation resistance of sputtered NiCrAlY coating.展开更多
ZnO films on R-sapphire substrates are prepared and characterized by x-ray diffraction and scanning electron microscopy, which indicate that the thin films are well crystallized with （1120） texture. Love wave and Ra...ZnO films on R-sapphire substrates are prepared and characterized by x-ray diffraction and scanning electron microscopy, which indicate that the thin films are well crystallized with （1120） texture. Love wave and Rayleigh wave are used for fabrications of humidity sensors, which are excited in [1100] and [0001] directions of the （1120） ZnO piezoelectric films, respectively. The experimental results show that both kinds of sensors have good humidity response and repeatability, and the performances of the Love wave sensors are better than those of the Rayleigh wave sensors at room temperature. Moreover, the theoretical calculations of the mass sensitivity of the sensors are a/so carried out and the calculated results are in good agreement with the experimental measurements.展开更多
The effect of sputtered Ti-50Al-10Cr and Ti-50A1-20Cr coatings on both isothermal and cyclic oxidation resistance at 800-900℃ and hot corrosion resistance at 850℃ of Ti-24Al-14Nb-3V was investigated. Results indicat...The effect of sputtered Ti-50Al-10Cr and Ti-50A1-20Cr coatings on both isothermal and cyclic oxidation resistance at 800-900℃ and hot corrosion resistance at 850℃ of Ti-24Al-14Nb-3V was investigated. Results indicated that Ti-24Al-14Nb-3V alloys exhibited poor oxidation resistance due to the formation of Al2O3+TiO2+AlNbO4 mixed scales in air at 800-900℃ and poor hot corrosion resistance due to the spoliation of scales formed in Na2SO4+K2SO4 melts at 850℃. Both Ti-50Al-10Cr and Ti-50Al-20Cr coatings remarkably improved the oxidation and hot corrosion resistance of Ti-24Al-14Nb-3V alloy.展开更多
The sputtered nanocrystalline coating of K38G alloy was obtained by magnetron sput-tering. The hot corrosion behaviors of cast K38G alloy and its sputtered nanocrys-talline coating by pre-deposited 75wt%Na2SO4+25wt%K2...The sputtered nanocrystalline coating of K38G alloy was obtained by magnetron sput-tering. The hot corrosion behaviors of cast K38G alloy and its sputtered nanocrys-talline coating by pre-deposited 75wt%Na2SO4+25wt%K2SO4 at 900℃ were studied. The results indicated the occurrence of internal sulfidation in the cast K38G alloy with pre-deposited sulfattes of 0.8 and 3.0mg/cm2. However, the internal sulfidation was not observed in the coating with pre-deposited 0.8mg/cm2 sulfate. The hot corrosion resistance of K38G alloy was clearly enhanced through nanocrystallinzation, although the internal sulfides were still formed for the coating with sulfate deposit of 3mg/cm2. The relevant hot corrosion mechanism was also discussed.展开更多
The isothermal and cyclic oxidation behaviors of bulk pure nickel and its magnetically sputtered Ni 0 5Y micro crystal coating were studied at 1?000?℃ in air. Scanning electronic microscopy (SEM) and transmiss...The isothermal and cyclic oxidation behaviors of bulk pure nickel and its magnetically sputtered Ni 0 5Y micro crystal coating were studied at 1?000?℃ in air. Scanning electronic microscopy (SEM) and transmission electronic microscopy (TEM) were used to examine structures of the coating and the NiO oxide films. Laser Raman spectrum was also used to measure the stress level in NiO films formed on bulk nickel and the coating. It was found that Ni 0 5Y micro crystal coating had lower oxidation rate, and the grain size of NiO formed on Ni 0 5Y coating was also relatively smaller than that formed on bulk nickel. Meanwhile, the compressive stress level of oxide film formed on Ni 0 5Y coating was lower than that formed on bulk nickel, and the oxide film’s high temperature plasticity was improved in the coating case. The improvements of anti oxidation properties of the sputtered Ni 0 5Y coating were due to the micro crystal structure and the rare earth element Y.展开更多
A copper based binary alloy containing 16.9 at % lithium has been bombarded with deuterium ions in energy range of 400 eV to 2 keV at the incidence angles of 70° and 80° away from the surface normal. The spu...A copper based binary alloy containing 16.9 at % lithium has been bombarded with deuterium ions in energy range of 400 eV to 2 keV at the incidence angles of 70° and 80° away from the surface normal. The sputtered flux was condensed on Al- strips arranged arround the target in a cylindrical cup. 1.5 MeV proton backscattering and nuclear reaction 7Li(p, α)4He were used to detect the collected atoms of Cu and Li simultaneously. The angular distribution of sputtered atoms has been shown to be different for two components and strongly anisotropic for the grazing incidence. According to direct knock-on sputtering model and the experimental results the angle for the maximum differential sputtering yield is dependent on the incidence angle α, the bombarding energy E, the energy transfer factor γ= 4M1M2/(M1+ M2)2 and the surface binding energy U. With the assumption that the sputtered particles are diffracted by a planar barrier the surface binding energies of 2.3 eV for the Li component and 3.0 eV for the Cu component have been determined by fitting the measured angles of preferred ejection to the direct knock-on sputtering model, and the results agree well with a pair-binding model.展开更多
Half metallic polycrystalline, epitaxial Fe3O4 films and Fe3O4 -based heterostructures for spintronics were fabricated by DC reactive magnetron sputtering. Large tunneling magnetoresistance was found in the polycrysta...Half metallic polycrystalline, epitaxial Fe3O4 films and Fe3O4 -based heterostructures for spintronics were fabricated by DC reactive magnetron sputtering. Large tunneling magnetoresistance was found in the polycrystalline Fe3O4 films and attributed to the insulating grain boundaries. The pinning effect of the moments at the grain boundaries leads to a significant exchange bias. Frozen interfacial/surface moments induce weak saturation of the high-field magnetoresistance. The films show a moment rotation related butterfly-shaped magnetoresistance. It was found that in the films, natural growth defects, antiphase boundaries, and magnetocrystalline anisotropy play important roles in high-order anisotropic magnetoresistance. Spin injection from Fe3O4 films to semiconductive Si and ZnO was measured to be 45% and 28.5%, respectively. The positive magnetoresistance in the Fe3O4 -based heterostructures is considered to be caused by a shift of the Fe3O4 e g ↑ band near the interface. Enhanced magnetization was observed in Fe3O4 /BiFeO 3 heterostructures experimentally and further proved by first principle calculations. The enhanced magnetization can be explained by spin moments of the thin BiFeO 3 layer substantially reversing into a ferromagnetic arrangement under a strong coupling that is principally induced by electronic orbital reconstruction at the interface.展开更多
The damage on the atomic bonding and electronic state in a SiO_x（1.4-2.3 nm）/c-Si（150 μm） interface has been investigated.This occurred in the process of depositing indium tin oxide（ITO） film onto the silicon s...The damage on the atomic bonding and electronic state in a SiO_x（1.4-2.3 nm）/c-Si（150 μm） interface has been investigated.This occurred in the process of depositing indium tin oxide（ITO） film onto the silicon substrate by magnetron sputtering.We observe that this damage is caused by energetic particles produced in the plasma（atoms,ions,and UV light）.The passivation quality and the variation on interface states of the SiO_x/c-Si system were mainly studied by using effective minority carrier lifetime（τ_（eff）） measurement as a potential evaluation.The results showed that the samples＇ τ_（eff）was reduced by more than 90%after ITO formation,declined from 107 μs to 5 μs.Following vacuum annealing at 200 ℃,the τ_（eff） can be restored to 30 μs.The components of Si to O bonding states at the SiO_x/c-Si interface were analyzed by x-ray photoelectron spectroscopy（XPS） coupled with depth profiling.The amorphous phase of the SiO_x layer and the ＂atomistic interleaving structure＂ at the SiO_x/c-Si interface was observed by a transmission electron microscope（TEM）.The chemical configuration of the Si-O fraction within the intermediate region is the main reason for inducing the variation of Si dangling bonds（or interface states） and effective minority carrier lifetime.After an appropriate annealing,the reduction of the Si dangling bonds between SiO_x and near the c-Si surface is helpful to improve the passivation effect.展开更多
Spin-orbit torque(SOT)effect is considered as an efficient way to switch the magnetization and can inspire various high-performance spintronic devices.Recently,topological insulators(TIs)have gained extensive attentio...Spin-orbit torque(SOT)effect is considered as an efficient way to switch the magnetization and can inspire various high-performance spintronic devices.Recently,topological insulators(TIs)have gained extensive attention,as they are demonstrated to maintain a large effective spin Hall angle(θeff SH),even at room temperature.However,molecular beam epitaxy(MBE),as a precise deposition method,is required to guarantee favorable surface states of TIs,which hinders the prospect of TIs towards industrial application.In this paper,we demonstrate that Bi2Te3 films grown by magnetron sputtering can provide a notable SOT effect in the heterostructure with perpendicular magnetic anisotropy CoTb ferrimagnetic alloy.By harmonic Hall measurement,a high SOT efficiency(8.7±0.9 Oe/(10^9 A/m^2))and a largeθ^eff SH(3.3±0.3)are obtained at room temperature.Besides,we also observe an ultra-low critical switching current density(9.7×10^9 A/m^2).Moreover,the low-power characteristic of the sputtered Bi2Te3 film is investigated by drawing a comparison with different sputtered SOT sources.Our work may provide an alternative to leverage chalcogenides as a realistic and efficient SOT source in future spintronic devices.展开更多
基金National Natural Science Foundation of China(62171208)Natural Science Foundation of Gansu Province(23JRRA1355)。
文摘ZrCoRE(RE denotes rare earth elements)non-evaporable getter films have significant applications in vacuum packaging of micro-electro mechanical system devices because of their excellent gas adsorption performance,low activation temperature and environmental friendliness.The films were deposited using DC magnetron sputtering with argon and krypton gases under various deposition pressures.The effects of sputtering gas type and pressure on the morphology and hydrogen adsorption performance of ZrCoRE films were investigated.Results show that the films prepared in Ar exhibit a relatively dense structure with fewer grain boundaries.The increase in Ar pressure results in more grain boundaries and gap structures in the films.In contrast,films deposited in Kr display a higher density of grain boundaries and cluster structures,and the films have an obvious columnar crystal structure,with numerous interfaces and gaps distributed between the columnar structures,providing more paths for gas diffusion.As Kr pressure increases,the film demonstrates more pronounced continuous columnar structure growth,accompanied by deeper and wider grain boundaries.This structural configuration provides a larger specific surface area,which significantly improves the hydrogen adsorption speed and capacity.Consequently,high Ar and Kr pressures are beneficial to improve the adsorption performance.
基金National Natural Science Foundation of China (NSFC)(52273266, U2001216)Shenzhen Science and Technology Innovation Committee (20231121102401001)+2 种基金Shenzhen Key Laboratory Project (ZDSYS201602261933302)GuangdongHong Kong-Macao Joint Laboratory on Micro-Nano Manufacturing Technology (2021LSYS004)SUSTech high level special funds (G03050K002)。
文摘Widely used spin-coated nickle oxide (NiOx) based perovskite solar cells often suffer from severe interfacial reactions between the NiOxand adjacent perovskite layers due to surface defect states,which inherently impair device performance in a long-term view,even with surface molecule passivation.In this study,we developed high-quality magnetron-sputtered NiOxthin films through detailed process optimization,and compared systematically sputtered and spin-coated NiOxthin film surfaces from materials to devices.These sputtered NiOxfilms exhibit improved crystallinity,smoother surfaces,and significantly reduced Ni3+or Ni vacancies compared to their spin-coated counterparts.Consequently,the interface between the perovskite and sputtered NiOxfilm shows a substantially reduced density of defect states.Perovskite solar cells (PSCs) fabricated with our optimally sputtered NiOxfilms achieved a high power conversion efficiency (PCE) of up to 19.93%and demonstrated enhanced stability,maintaining 86.2% efficiency during 500 h of maximum power point tracking under one standard sun illumination.Moreover,with the surface modification using (4-(2,7-dibromo-9,9-dimethylacridin-10(9H)-yl)butyl)p hosphonic acid (DMAcPA),the device PCE was further promoted to 23.07%,which is the highest value reported for sputtered NiOxbased PSCs so far.
基金supported by the Korea Institute of Energy Technology Evaluation and Planning and the Ministry of Trade,Industry and Energy of the Republic of Korea(No.20213030030150)by the National Research Foundation of Korea funded by the Korea government(MSIT)(No.RS-2021-NR057434).
文摘In this work,we present an innovative method for fabricating high-performance proton-conductive fuel cells(PCFCs)by combining magnetron sputtering and flashlight sintering(FLS)techniques.BaZr_(0.8)Y_(0.2)O_(3–δ)(BZY20)electrolyte thin-films are successfully prepared by improving the crystallinity while maintaining the stoichiometry.All components of PCFC,Ni-YSZ anode,BZY20 electrolyte and Pt-GDC cathode are fabricated by sequentially sputtering them onto an AAO substrate.Electrolytic sintering is performed at 550 and 650 V conditions using FLS,effectively solving the Ba evaporation problem encountered in conventional thermal sintering methods.XRD analysis confirms that the perovskite structure is retained,and crystallinity is improved in the FLS samples.Furthermore,FE-SEM and EDS analyses confirm the uniform elemental distribution and consistent thickness of the FLS-treated electrolyte.An optimized PCFC unit cell with FLS-treated electrolyte exhibits a peak power density of 200.0 mW cm^(-2) at 500℃ and an ohmic resistance of 376.0 mΩ cm^(-2).These results suggest that the combination of magnetron sputtering and FLS techniques is a promising approach for fabricating highperformance thin-film PCFCs.
基金Projects(42106051,42006046,U2106206) supported by the National Natural Science Foundation of ChinaProject(22373501D) supported by Hebei Provincial Key R&D Program,China。
文摘Copper is a versatile material,commonly utilized in power transmission and electronic devices,but its relative high reactivity necessitates a long-lasting protective technique.Here,we report a method that combines plasma-enhanced non-equilibrium magnetron sputtering physical vapor deposition(PEUMS-PVD)and anodization to construct a self-healing three-dimensional Ti/Al-doped TiO_(2)nanotubes/Ti_(3)AlC_(2)coating on the surface of Cu substrates.This novel strategy enhances the corrosion resistance of copper substrates in marine environments,with corrosion current densities of up to 4.5643×10^(−8)A/cm^(2).Among them,the doping of nano-aluminum particles makes the coating self-healing.The mechanistic analysis of the corrosion behaviors during early immersion experiments was conducted using electrochemical noise,and revealed that during the initial stages of coating immersion,uniform corrosion predominates,with a minor occurrence of localized corrosion.
基金supported by the National Key R&D Program of China(Grant No.2022YFE03050001)the National Natural Science Foundation of China(Grant Nos.12175160 and 12305284).The authors thank Suzhou Maxwell Technologies Co.,Ltd.for partial hardware and particle financial support to carry out the research.
文摘We deposited indium-tin-oxide(ITO)films on silicon and quartz substrates by magnetron sputtering technology in pure argon.Using electrostatic quadrupole plasma diagnostic technology,we investigate the effects of discharge power and discharge pressure on the ion flux and energy distribution function of incidence on the substrate surface,with special attention to the production of high-energy negative oxygen ions,and elucidate the mechanism behind its production.At the same time,the structure and properties of ITO films are systematically characterized to understand the potential effects of high energy oxygen ions on the growth of ITO films.Combining with the kinetic property analysis of sputtering damage mechanism of transparent conductive oxide(TCO)thin films,this study provides valuable physical understanding of optimization of TCO thin film deposition process.
基金supported by the National Natural Science Foundation of China(22275180)the National Key Research and Development Program of China(2019YFA0405600)the Collaborative Innovation Program of Hefei Science Center,CAS,and the University Synergy Innovation Program of Anhui Province(GXXT-2023-031).
文摘Cadmium sulfide(CdS)is an n-type semiconductor with excellent electrical conductivity that is widely used as an electron transport material(ETM)in solar cells.At present,numerous methods for preparing CdS thin films have emerged,among which magnetron sputtering(MS)is one of the most commonly used vacuum techniques.For this type of technique,the substrate temperature is one of the key deposition parameters that affects the interfacial properties between the target film and substrate,determining the specific growth habits of the films.Herein,the effect of substrate temperature on the microstructure and electrical properties of magnetron-sputtered CdS(MS-CdS)films was studied and applied for the first time in hydrothermally deposited antimony selenosulfide(Sb_(2)(S,Se)_(3))solar cells.Adjusting the substrate temperature not only results in the design of the flat and dense film with enhanced crystallinity but also leads to the formation of an energy level arrangement with a Sb_(2)(S,Se)_(3)layer that is more favorable for electron transfer.In addition,we developed an oxygen plasma treatment for CdS,reducing the parasitic absorption of the device and resulting in an increase in the short-circuit current density of the solar cell.This study demonstrates the feasibility of MS-CdS in the fabrication of hydrothermal Sb_(2)(S,Se)_(3)solar cells and provides interface optimization strategies to improve device performance.
基金Project (2010JQ6008) supported by the Natural Science Foundation of Shaanxi Province,China
文摘Series of TiO 2-ZnO heterojunction composite films with different n（Zn）/n（Ti） ratios were prepared by UDP450 magnetron sputter ion plating equipment, and the mole ratio of Zn to Ti was controlled by adjusting the current values of sputtering target. The effects of n（Zn）/n（Ti） on the microstructures of TiO2-ZnO films were investigated by SEM, AFM, Raman and XPS, and their photocatalytic decomposition of methyl orange solutions was evaluated. The results show that an increase in n（Zn）/n（Ti） typically results in a decrease in the grain size of composite films firstly and then an increase of grain size, while an increase in n（Zn）/n（Ti） leads to an increase in film roughness firstly and then a decrease in film roughness. Both grain size and roughness of TiO2-ZnO films reach the maximum and minimum at n（Zn）/n（Ti） of 1/9.3, respectively. The n（Zn）/n（Ti） shows little effect on the valences of Zn and Ti elements, which mainly exist in the form of TiO2 and ZnO phases. The n（Zn）/n（Ti） has influence on the amount of anatase/rutile TiO2 heterojunction in the film. With increase of the n（Zn）/n（Ti）, the absorption intensity of the composite film increases and the absorption region extends to 450 nm, which is redshifted as much as 150 nm in comparison with the pure TiO2 films. However, the photocatalytic abilities of heterogeneous composite films do not depend on the n（Zn）/n（Ti） but rather on the microstructures of the TiO2-ZnO composite films. Degradation rate of the film reaches the maximum and the photocatalytic decomposition of pollutants works best when n（Zn）/n（Ti）=1：9.3.
基金financially supported by the National Natural Science Foundation of China(No.51071163)the National Key Basic Research and Development Program("973 Program",Nos.2010CB631206 and 2012CB625100)the National High Technology Research and Development Program of China(No.2012AA03A512)
文摘The isothermal and cyclic oxidation behaviors in air and hot corrosion behaviors in Na2SO4 ＋ 25 wt% K2SO4 salt of M951 cast superalloy and a sputtered nanocrystalline coating of the same material were studied. Scanning electron microscopy, energy dispersive X-ray spectroscope, X-ray diffraction, and transmission electron microscopy were employed to examine the morphologies and phase composition of the M951 alloy and nanocrystalline coating before and after oxidation and hot corrosion. The as-sputtered nanocrystalline layer has a homogeneous y phase structure of very fine grain size （30-200 nm） with the preferential growth texture of （111） parallel to the interface. Adherent AI203 rich oxide scale formed on the cast M951 alloy and its sputtered coating after isothermal oxidation at 900 and 1000 ℃. However, when being isothermal oxidized at 1100℃ and cyclic oxidized at 1000 ℃, the oxide scale formed on the cast alloy was a mixture of NiO, NiAl2O4, Al2O3 and Nb205 and spalled seriously, while that formed on the sputtered coating mainly consisted of Al2O3 and was very adherent. Nanocrystallization promoted rapid formation of Al2O3 scale during the early stage of oxidation and enhanced the adhesion of the oxide scale, thus improved the oxidation resistance of the substrate alloy. Serious corrosion occurred for the cast alloy. The sputtered nanocrystalline coating apparently improved the hot corrosion resistance of the cast alloy in the mixed sulfate by the formation of a continuous Al2O3 and Cr2O3 mixed oxide layer on the surface of the coating, and the pre- oxidation treatment of the coating led to an even better effect.
文摘Indium tin oxide (ITO) films were prepared on polyester, Si and glass substrate with relatively high deposition rate of above 0.9 nm/s by DC reactive magnetron sputtering technique at the sputtering pressure of 0.06 Pa system, respectively. The dependence of resistivity on deposition parameters, such as deposition rate, target-to-substrate distance (TSD), oxygen flow rate and sputtering time (thickness), has been investigated, together with the structural and the optical properties. It was revealed that all ITO films exhibited lattice expansion. The resistivity of ITO thin films shows significant substrate effect: much lower resistivity and broader process window have been reproducibly achieved for the deposition of ITO films onto polyester rather than those prepared on both Si and glass substrates. The films with resistivity of as low as 4.23 x 10^-4 Ω.cm and average transmittance of ～78% at wavelength of 400～700 nm have been achieved for the films on polyester at room temperature.
基金financial support of the project from the National Natural Science Foundation of China(No.51701223)。
文摘Phase structure of sputtered Ta coating in the negative glow space and LPH effect were explored.The whole coating/substrate system is substrate→physically gas-absorbed Fe surface→oxygen-enriched TaOx layer→amorphous Ta→αandβdual phase→singleαphase.After LPH course,micro structure of Ta coating shows intact,only a few cracks emerge after 100 laser pulses,exhibiting thin HAZ but thick Fe/Ta ICZ,without martensitic transformation.For the electrodeposited Cr coating,continuous thermal stresses produce many extra micro-crack,substrate oxidation and martensitic transformation,leading to crack propagations and final bulk delamination,without any ICZ.
基金National Natural Science Foundation of China !under grant 59671060
文摘The oxidation behavior of sputtered Ni-3Cr-20Al coating at 900℃ in air was investigated. A dense Al2O3 layer was formed on the sputtered Ni-3Cr-20AI coating after 200 h oxidation. However, owing to the segregation of Ni3Al during oxidation process at high temperature, the spinel NiAI2O4 was also formed in the Al2O3 layer. It was found that the formation of NiAI204 had no detrimental effect on the oxidation resistance of the sputtered N?3O-20AI coating due to the excellent adhesion shown by the Al2O3 and NiAl2O4complex oxide scale.
基金The authors thank Prof.H. Y. Lou for sputtering NiCrAlY coating.
文摘A bond coat for thermal barrier coating (TBC), NiCrAlY coating, is subjected to vac-uum heat treatment in order to remove internal stress before ceramic top coat is de-posited. The effect of vacuum heat treatment on the oxidation behavior of the sputtered NiCrAlY coating has been investigated. The as-sputtered NiCrAlY coating consists of γ-Ni and b-NiAl phases. After vacuum heat treatment, the sputtered NiCrAlY coating mainly consists of γ'-Ni3Al, β-NiAl, γ-Ni, and trace of α-Al2O3 phases. The isothermal oxidation of sputtered NiCrAlY coating with and without vacuum heat treatment has been performed at 1000℃. It is shown that a-Al2O3 formed during vacuum heat treatment acts as nuclei for the formation of a-Al2O3, and the protective a-Al2O3 scale is formed more rapidly on the vacuum heat treated NiCrAlY coating than that formed on the untreated coating. Also the a-Al2O3 scale has a better adherence to the vacuum heat treated NiCrAlY coating. Therefore the vacuum heat treatment improves the oxidation resistance of sputtered NiCrAlY coating.
基金Supported by the National Natural Science Foundation of China under Grant Nos 11174142,11304160 and 11404147the National Basic Research Program of China under Grant No 2012CB921504+2 种基金the PAPD Projectthe Natural Science Foundation of Jiangsu Higher Education Institutions of China under Grant No 13KJB140008the Foundation of Nanjing University of Posts and Telecommunications under Grant No NY213018
文摘ZnO films on R-sapphire substrates are prepared and characterized by x-ray diffraction and scanning electron microscopy, which indicate that the thin films are well crystallized with （1120） texture. Love wave and Rayleigh wave are used for fabrications of humidity sensors, which are excited in [1100] and [0001] directions of the （1120） ZnO piezoelectric films, respectively. The experimental results show that both kinds of sensors have good humidity response and repeatability, and the performances of the Love wave sensors are better than those of the Rayleigh wave sensors at room temperature. Moreover, the theoretical calculations of the mass sensitivity of the sensors are a/so carried out and the calculated results are in good agreement with the experimental measurements.
文摘The effect of sputtered Ti-50Al-10Cr and Ti-50A1-20Cr coatings on both isothermal and cyclic oxidation resistance at 800-900℃ and hot corrosion resistance at 850℃ of Ti-24Al-14Nb-3V was investigated. Results indicated that Ti-24Al-14Nb-3V alloys exhibited poor oxidation resistance due to the formation of Al2O3+TiO2+AlNbO4 mixed scales in air at 800-900℃ and poor hot corrosion resistance due to the spoliation of scales formed in Na2SO4+K2SO4 melts at 850℃. Both Ti-50Al-10Cr and Ti-50Al-20Cr coatings remarkably improved the oxidation and hot corrosion resistance of Ti-24Al-14Nb-3V alloy.
文摘The sputtered nanocrystalline coating of K38G alloy was obtained by magnetron sput-tering. The hot corrosion behaviors of cast K38G alloy and its sputtered nanocrys-talline coating by pre-deposited 75wt%Na2SO4+25wt%K2SO4 at 900℃ were studied. The results indicated the occurrence of internal sulfidation in the cast K38G alloy with pre-deposited sulfattes of 0.8 and 3.0mg/cm2. However, the internal sulfidation was not observed in the coating with pre-deposited 0.8mg/cm2 sulfate. The hot corrosion resistance of K38G alloy was clearly enhanced through nanocrystallinzation, although the internal sulfides were still formed for the coating with sulfate deposit of 3mg/cm2. The relevant hot corrosion mechanism was also discussed.
文摘The isothermal and cyclic oxidation behaviors of bulk pure nickel and its magnetically sputtered Ni 0 5Y micro crystal coating were studied at 1?000?℃ in air. Scanning electronic microscopy (SEM) and transmission electronic microscopy (TEM) were used to examine structures of the coating and the NiO oxide films. Laser Raman spectrum was also used to measure the stress level in NiO films formed on bulk nickel and the coating. It was found that Ni 0 5Y micro crystal coating had lower oxidation rate, and the grain size of NiO formed on Ni 0 5Y coating was also relatively smaller than that formed on bulk nickel. Meanwhile, the compressive stress level of oxide film formed on Ni 0 5Y coating was lower than that formed on bulk nickel, and the oxide film’s high temperature plasticity was improved in the coating case. The improvements of anti oxidation properties of the sputtered Ni 0 5Y coating were due to the micro crystal structure and the rare earth element Y.
文摘A copper based binary alloy containing 16.9 at % lithium has been bombarded with deuterium ions in energy range of 400 eV to 2 keV at the incidence angles of 70° and 80° away from the surface normal. The sputtered flux was condensed on Al- strips arranged arround the target in a cylindrical cup. 1.5 MeV proton backscattering and nuclear reaction 7Li(p, α)4He were used to detect the collected atoms of Cu and Li simultaneously. The angular distribution of sputtered atoms has been shown to be different for two components and strongly anisotropic for the grazing incidence. According to direct knock-on sputtering model and the experimental results the angle for the maximum differential sputtering yield is dependent on the incidence angle α, the bombarding energy E, the energy transfer factor γ= 4M1M2/(M1+ M2)2 and the surface binding energy U. With the assumption that the sputtered particles are diffracted by a planar barrier the surface binding energies of 2.3 eV for the Li component and 3.0 eV for the Cu component have been determined by fitting the measured angles of preferred ejection to the direct knock-on sputtering model, and the results agree well with a pair-binding model.
基金Project supported by the National Natural Science Foundation of China (Grant No. 51272174)the Natural Science Foundation of Tianjin City (Grant No. 12JCYBJC11100)
文摘Half metallic polycrystalline, epitaxial Fe3O4 films and Fe3O4 -based heterostructures for spintronics were fabricated by DC reactive magnetron sputtering. Large tunneling magnetoresistance was found in the polycrystalline Fe3O4 films and attributed to the insulating grain boundaries. The pinning effect of the moments at the grain boundaries leads to a significant exchange bias. Frozen interfacial/surface moments induce weak saturation of the high-field magnetoresistance. The films show a moment rotation related butterfly-shaped magnetoresistance. It was found that in the films, natural growth defects, antiphase boundaries, and magnetocrystalline anisotropy play important roles in high-order anisotropic magnetoresistance. Spin injection from Fe3O4 films to semiconductive Si and ZnO was measured to be 45% and 28.5%, respectively. The positive magnetoresistance in the Fe3O4 -based heterostructures is considered to be caused by a shift of the Fe3O4 e g ↑ band near the interface. Enhanced magnetization was observed in Fe3O4 /BiFeO 3 heterostructures experimentally and further proved by first principle calculations. The enhanced magnetization can be explained by spin moments of the thin BiFeO 3 layer substantially reversing into a ferromagnetic arrangement under a strong coupling that is principally induced by electronic orbital reconstruction at the interface.
基金Project supported by the National Natural Science Foundation of China(Grant Nos.61274067,60876045,and 61674099)the Research and Development Foundation of SHU-SOENs PV Joint Laboratory,China(Grant No.SS-E0700601)
文摘The damage on the atomic bonding and electronic state in a SiO_x（1.4-2.3 nm）/c-Si（150 μm） interface has been investigated.This occurred in the process of depositing indium tin oxide（ITO） film onto the silicon substrate by magnetron sputtering.We observe that this damage is caused by energetic particles produced in the plasma（atoms,ions,and UV light）.The passivation quality and the variation on interface states of the SiO_x/c-Si system were mainly studied by using effective minority carrier lifetime（τ_（eff）） measurement as a potential evaluation.The results showed that the samples＇ τ_（eff）was reduced by more than 90%after ITO formation,declined from 107 μs to 5 μs.Following vacuum annealing at 200 ℃,the τ_（eff） can be restored to 30 μs.The components of Si to O bonding states at the SiO_x/c-Si interface were analyzed by x-ray photoelectron spectroscopy（XPS） coupled with depth profiling.The amorphous phase of the SiO_x layer and the ＂atomistic interleaving structure＂ at the SiO_x/c-Si interface was observed by a transmission electron microscope（TEM）.The chemical configuration of the Si-O fraction within the intermediate region is the main reason for inducing the variation of Si dangling bonds（or interface states） and effective minority carrier lifetime.After an appropriate annealing,the reduction of the Si dangling bonds between SiO_x and near the c-Si surface is helpful to improve the passivation effect.
基金Project supported by the National Natural Science Foundation of China(Grant Nos.61971024 and 51901008)Young Elite Scientist Sponsorship Program by CAST(Grant No.2017QNRC001)+2 种基金the International Mobility Project(Grant No.B16001)National Key Technology Program of China(Grant No.2017ZX01032101)P.K.A.acknowledges support by a grant from the National Science Foundation,Division of Electrical,Communications and Cyber Systems(NSF ECCS-1853879).
文摘Spin-orbit torque(SOT)effect is considered as an efficient way to switch the magnetization and can inspire various high-performance spintronic devices.Recently,topological insulators(TIs)have gained extensive attention,as they are demonstrated to maintain a large effective spin Hall angle(θeff SH),even at room temperature.However,molecular beam epitaxy(MBE),as a precise deposition method,is required to guarantee favorable surface states of TIs,which hinders the prospect of TIs towards industrial application.In this paper,we demonstrate that Bi2Te3 films grown by magnetron sputtering can provide a notable SOT effect in the heterostructure with perpendicular magnetic anisotropy CoTb ferrimagnetic alloy.By harmonic Hall measurement,a high SOT efficiency(8.7±0.9 Oe/(10^9 A/m^2))and a largeθ^eff SH(3.3±0.3)are obtained at room temperature.Besides,we also observe an ultra-low critical switching current density(9.7×10^9 A/m^2).Moreover,the low-power characteristic of the sputtered Bi2Te3 film is investigated by drawing a comparison with different sputtered SOT sources.Our work may provide an alternative to leverage chalcogenides as a realistic and efficient SOT source in future spintronic devices.
