As the channel length of metal-oxide-semiconductor field-effect transistors （MOSFETs） scales into the nanometer regime, quantum mechanical effects are becoming more and more significant. In this work, a model for th...As the channel length of metal-oxide-semiconductor field-effect transistors （MOSFETs） scales into the nanometer regime, quantum mechanical effects are becoming more and more significant. In this work, a model for the surrounding-gate （SG） nMOSFET is developed. The SchrSdinger equation is solved analytically. Some of the solutions are verified via results obtained from simulations. It is found that the percentage of the electrons with lighter conductivity mass increases as the silicon body radius decreases, or as the gate voltage reduces, or as the temperature decreases. The eentroid of inversion-layer is driven away from the silicon-oxide interface towards the silicon body, therefore the carriers will suffer less scattering from the interface and the electrons effective mobility of the SG nMOSFETs will be enhanced.展开更多
本文应用非傍轴矢量矩理论 ,分析了 6 70 nm Al Ga In P/Ga In P分别限制应变单量子阱 (SCH S-SQW)激光器在弱激射和正常激射条件下的垂直于结面方向的光束质量因子 M2⊥ 。分析结果表明 ,在两种情况下 ,M2⊥ 均小于 1,而且前者具有更小...本文应用非傍轴矢量矩理论 ,分析了 6 70 nm Al Ga In P/Ga In P分别限制应变单量子阱 (SCH S-SQW)激光器在弱激射和正常激射条件下的垂直于结面方向的光束质量因子 M2⊥ 。分析结果表明 ,在两种情况下 ,M2⊥ 均小于 1,而且前者具有更小的 M2⊥ 。展开更多
基金Support of Shanghai Science Foundation under Grant No.09ZR1402900 the National Science Foundation of China under Grant No.60676020 Supported in part by the Special Funds for Major State Basic Research (973 Project) under Grant No.2006CB302703
文摘As the channel length of metal-oxide-semiconductor field-effect transistors （MOSFETs） scales into the nanometer regime, quantum mechanical effects are becoming more and more significant. In this work, a model for the surrounding-gate （SG） nMOSFET is developed. The SchrSdinger equation is solved analytically. Some of the solutions are verified via results obtained from simulations. It is found that the percentage of the electrons with lighter conductivity mass increases as the silicon body radius decreases, or as the gate voltage reduces, or as the temperature decreases. The eentroid of inversion-layer is driven away from the silicon-oxide interface towards the silicon body, therefore the carriers will suffer less scattering from the interface and the electrons effective mobility of the SG nMOSFETs will be enhanced.
