期刊文献+
共找到14,109篇文章
< 1 2 250 >
每页显示 20 50 100
Bridge Layer-Enabled Silicon-Based Photoanode With High Photocurrent Density for Efficient and Stable Water Splitting
1
作者 Shuyang Peng Di Liu +5 位作者 Zhiqin Ying Keyu An Chunfa Liu Weng Fai Ip Kin Ho Lo Hui Pan 《Carbon Energy》 2025年第8期60-68,共9页
Photoelectrochemical(PEC)water splitting holds significant promise for sustainable energy harvesting that enables efficient conversion of solar energy into green hydrogen.Nevertheless,achievement of high performance i... Photoelectrochemical(PEC)water splitting holds significant promise for sustainable energy harvesting that enables efficient conversion of solar energy into green hydrogen.Nevertheless,achievement of high performance is often limited by charge carrier recombination,resulting in unsatisfactory saturation current densities.To address this challenge,we present a novel strategy for achieving ultrahigh current density by incorporating a bridge layer between the Si substrate and the NiOOH cocatalyst in this paper.The optimal photoanode(TCO/n-p-Si/TCO/Ni)shows a remarkably low onset potential of 0.92 V vs.a reversible hydrogen electrode and a high saturation current density of 39.6 mA·cm^(-2),which is about 92.7%of the theoretical maximum(42.7 mA·cm^(-2)).In addition,the photoanode demonstrates stable operation for 60 h.Our systematic characterizations and calculations demonstrate that the bridge layer facilitates charge transfer,enhances catalytic performance,and provides corrosion protection to the underlying substrate.Notably,the integration of this photoanode into a PEC device for overall water splitting leads to a reduction of the onset potential.These findings provide a viable pathway for fabricating highperformance industrial photoelectrodes by integrating a substrate and a cocatalyst via a transparent and conductive bridge layer. 展开更多
关键词 bridge layer high current density photoelectrochemical water splitting silicon-based photoelectrode
在线阅读 下载PDF
Genesis of pink diamonds in lamproite and low-Ti-type kimberlite pipes on craton margins
2
作者 GROVES DI ZHANG Liang +1 位作者 CHEN ZuYan BAI Feng 《岩石学报》 北大核心 2026年第2期383-392,共10页
Diamonds were formed in the mantle lithosphere,mostly at depths of 150~200km in the centres of Precambrian cratons,the buoyant ancient cores of continents.From there they were normally transported into the upper crust... Diamonds were formed in the mantle lithosphere,mostly at depths of 150~200km in the centres of Precambrian cratons,the buoyant ancient cores of continents.From there they were normally transported into the upper crust in kimberlite pipes whose diamonds are largely colourless and light yellow related to trace element N(Ia type),although brown,green,and more rarely blue-coloured diamonds are related to lattice defect and trace amounts of H,more rarely B and Ni.Pink diamonds are extremely rare in the approximately 90 diamondiferous pipes mined globally.Although small quantities have been discovered elsewhere,about 90%have been mined from the ca.1.3Ga Argyle diamond pipe in Western Australia,with the Arkhangelskaya diamond pipe in Russia the only other significant source.The pink colour at both Argyle and Arkhangelskaya is unrelated to trace elements and instead results from absorption of light from nanoscale(550nm)defects related to shear stress and plastic deformation.Macroscopically,defects are shown by glide planes,lamellae,and grain lines imposed on the originally colourless diamonds derived from their mantle source.The key question is why these defects were uniquely acquired in diamonds in the Argyle and Arkhangelskaya pipes.Unlike most diamondiferous pipes,Argyle is a rare diamondiferous volatile-rich lamproite pipe that was emplaced into the multiply deformed and rifted NNE-trending Halls Creek Orogen on the margin of the Kimberley Craton.Similarly,Arkhangelskaya in the Devonian Lomonosov kimberlite cluster is a volatile-rich low-Ti type kimberlite,a close relative to lamproite,that was emplaced into the multiply deformed Lapland-Kola Orogen on the rifted margin of the Kola Craton.These craton margins are underlain by subduction-induced volatile-enriched metasomatized mantle lithosphere in contrast to the more primeval mantle under craton centres.It is thus likely that shear stresses were exacerbated at Argyle and Arkangelskaya by rapid vertical emplacement of the anomalous volatile-enriched magmas at supercritical pressures and temperatures,that induced catastrophic phase separation of these volatiles and'mini seismic events'during rapid pressure drops during ascent from 200km depth to the surface.Such a mechanism is consistent with the presence of strongly resorbed and plastically deformed small brown industrial diamonds in the Argyle pipe.From a China perspective,it is potentially important that at 1.3Ga the alkaline Argyle pipe in northern Australia is placed adjacent to the North China Craton(NCC),with numerous world-class mineral deposits including the giant ca.1.4~1.2Ga alkaline Bayan Obo REE system on its margin.However,it is the southeastern margin of the Yangtze Craton and the Jiangnan Orogen with their lamproite pipes derived from metasomatized mantle lithosphere that present the most prospective regions for pink diamond occurrences. 展开更多
关键词 Pink diamond Plastic deformation LAMPROITE Low-Ti-type kimberlite Craton margin
在线阅读 下载PDF
Evolution of diamond film growth modes under varied plasma conditions:insights from optical emission spectroscopy
3
作者 Pengfei Qu Guangdi Zhou +2 位作者 Peng Jin Xu Han Zhanguo Wang 《Journal of Semiconductors》 2026年第1期91-97,共7页
The synthesis of high-quality heteroepitaxial diamond films on iridium composite substrates is a critical step toward advancing diamond for electronic and optical applications.Microwave plasma chemical vapor depositio... The synthesis of high-quality heteroepitaxial diamond films on iridium composite substrates is a critical step toward advancing diamond for electronic and optical applications.Microwave plasma chemical vapor deposition,combined with in situ optical emission spectroscopy,enables precise control over growth modes through plasma parameter tuning.In this study,we examine how methane concentration,microwave power,and gas pressure influence plasma species and,consequently,the growth modes of heteroepitaxial diamond by optical emission spectroscopy and scanning electron microscope.At low nucleation densities,increased methane concentrations promote the transition from faceted polyhedral to ballas structures,driven by elevated C_(2) radical concentrations in the plasma.Conversely,at higher nucleation densities,gas pressure,and substrate temperature dominate growth mode determination,leading to diverse morphologies,such as planar,polycrystalline,octahedral,and step-flow growth.These findings elucidate the interplay among plasma species,growth parameters,and growth mode,offering critical insights for optimizing growth conditions and preparing heteroepitaxial diamond films in a specific growth mode. 展开更多
关键词 HETEROEPITAXY diamond films growth modes MPCVD OES
在线阅读 下载PDF
新生儿Diamond-Blackfan贫血1例
4
作者 魏红玲 韩彤妍 +1 位作者 朱小辉 关硕 《中国当代儿科杂志》 北大核心 2025年第10期1276-1280,共5页
患儿,男,足月儿,生后因肤色苍白30 min,呼吸困难10 min入院。体格检查示肤色苍白,眼距宽,耳位低,颈部可触及囊性包块,肝大,右拇指连接球状赘生物,右足第2足趾趾甲异位。入院后查血红蛋白44 g/L,骨髓增生减低,全外显子组测序显示患儿RPS1... 患儿,男,足月儿,生后因肤色苍白30 min,呼吸困难10 min入院。体格检查示肤色苍白,眼距宽,耳位低,颈部可触及囊性包块,肝大,右拇指连接球状赘生物,右足第2足趾趾甲异位。入院后查血红蛋白44 g/L,骨髓增生减低,全外显子组测序显示患儿RPS19基因存在c.175T>C(p.Ser59Pro)杂合致病变异,该患儿明确诊断为Diamond-Blackfan贫血。随访至2岁2个月,血红蛋白及网织红细胞计数处于正常水平。该患儿起病早、贫血程度重,其症状丰富了临床疾病谱,为临床诊疗提供思路。 展开更多
关键词 贫血 diamond-Blackfan RPS19基因 新生儿
暂未订购
Regulating the Solvation Structure of Li^(+) Enables Chemical Prelithiation of Silicon-Based Anodes Toward High-Energy Lithium-Ion Batteries 被引量:12
5
作者 Wenjie He Hai Xu +5 位作者 Zhijie Chen Jiang Long Jing Zhang Jiangmin Jiang Hui Dou Xiaogang Zhang 《Nano-Micro Letters》 SCIE EI CAS CSCD 2023年第7期293-305,共13页
The solvation structure of Li^(+) in chemical prelithiation reagent plays a key role in improving the low initial Coulombic efficiency(ICE) and poor cycle performance of silicon-based materials. Never theless, the che... The solvation structure of Li^(+) in chemical prelithiation reagent plays a key role in improving the low initial Coulombic efficiency(ICE) and poor cycle performance of silicon-based materials. Never theless, the chemical prelithiation agent is difficult to dope active Li^(+) in silicon-based anodes because of their low working voltage and sluggish Li^(+) diffusion rate. By selecting the lithium–arene complex reagent with 4-methylbiphenyl as an anion ligand and 2-methyltetrahydrofuran as a solvent, the as-prepared micro-sized Si O/C anode can achieve an ICE of nearly 100%. Interestingly, the best prelithium efficiency does not correspond to the lowest redox half-potential(E_(1/2)), and the prelithiation efficiency is determined by the specific influencing factors(E_(1/2), Li^(+) concentration, desolvation energy, and ion diffusion path). In addition, molecular dynamics simulations demonstrate that the ideal prelithiation efficiency can be achieved by choosing appropriate anion ligand and solvent to regulate the solvation structure of Li^(+). Furthermore, the positive effect of prelithiation on cycle performance has been verified by using an in-situ electrochemical dilatometry and solid electrolyte interphase film characterizations. 展开更多
关键词 Lithium-ion batteries silicon-based anodes Prelithiation Molecular dynamics simulations Solvation structure
在线阅读 下载PDF
掺杂元素X(B、Al、Sn、Co)对IDB-X/Diamond界面结合性能的影响
6
作者 简小刚 姚文山 +4 位作者 张毅 梁晓伟 胡吉博 陈哲 陈茂林 《金刚石与磨料磨具工程》 北大核心 2025年第1期37-45,共9页
基于量子力学第一性原理,建立了IDB-B/Diamond、IDB-Al/Diamond、IDB-Sn/Diamond和IDB-Co/Diamond 4种膜基界面模型,计算了膜基界面结合能、差分电荷密度和布居数,以探究孕镶金刚石钻头(impregnated diamond bits,IDB)基体中的常用元素X... 基于量子力学第一性原理,建立了IDB-B/Diamond、IDB-Al/Diamond、IDB-Sn/Diamond和IDB-Co/Diamond 4种膜基界面模型,计算了膜基界面结合能、差分电荷密度和布居数,以探究孕镶金刚石钻头(impregnated diamond bits,IDB)基体中的常用元素X(X=B、Al、Sn、Co)对IDB-X/Diamond膜基结合强度的影响机制。计算结果表明:膜基界面结合能大小为W_(ad-B)>W_(ad-Al)>W_(ad-Co)>W_(ad-Sn);B、Al是增强膜基结合强度的有益元素,因为B、Al原子的电荷主要转移到掺杂位点附近的C1~C3原子,其与C1~C3原子的键合作用强;Sn、Co会削弱膜基结合强度,这是由于Sn、Co原子与C1~C3原子的键合作用弱,同时膜基界面间的其他C原子因俘获电荷而相斥。压痕对比的实验结果与仿真结论相符。 展开更多
关键词 第一性原理 金刚石涂层 膜基结合 电荷转移 布居数 压痕实验
在线阅读 下载PDF
3D heterogeneous integration of wideband RF chips using silicon-based adapter board technology 被引量:4
7
作者 Wang Yong Wei Wei +4 位作者 Yang Dong Sun Biao Zhang Xingwen Zhang Youming Huang Fengyi 《Journal of Southeast University(English Edition)》 EI CAS 2021年第1期8-13,共6页
An ultra-wideband mixing component cascaded by a mixing multi-function chip and a frequency multiplier multi-function chip was demonstrated and implemented using 3D heterogeneous integration based on the silicon adapt... An ultra-wideband mixing component cascaded by a mixing multi-function chip and a frequency multiplier multi-function chip was demonstrated and implemented using 3D heterogeneous integration based on the silicon adapter board technology.Four layers of high-resistance silicon substrate stack packaging are implemented based on the wafer-level gold-gold bonding process.Each layer adopts though silicon via(TSV)technology to realize signal interconnection.A core monolithic integrated microwave chip(MMIC)is embedded in the silicon cavity,and the silicon-based filter is integrated with the high-resistance silicon substrate.The interconnect line,cavity and filter of the silicon-based adapter board are designed with AutoCAD,and HFSS is adopted for 3D electromagnetic field simulation.According to the measured results,the radio frequency(RF)of the mixing multi-function chip is 40-44 GHz and its intermediate frequency(IF)can cover the Ku band with a chip size of 10 mm×11 mm×1 mm.The multiplier multi-function chip operates at 16-20 GHz.The fundamental suppression is greater than 50 dB and the second harmonic suppression is better than 40 dB with a chip size of 8 mm×8 mm×1 mm.The cascaded fully assembled mixing component achieves a spur of better than-50 dBc and a gain of better than 15 dB. 展开更多
关键词 silicon-based adapter board frequency mixing frequency multiplier multi-function chip
在线阅读 下载PDF
Silicon-based optoelectronic heterogeneous integration for optical interconnection 被引量:2
8
作者 李乐良 李贵柯 +5 位作者 张钊 刘剑 吴南健 王开友 祁楠 刘力源 《Chinese Physics B》 SCIE EI CAS CSCD 2024年第2期1-9,共9页
The performance of optical interconnection has improved dramatically in recent years.Silicon-based optoelectronic heterogeneous integration is the key enabler to achieve high performance optical interconnection,which ... The performance of optical interconnection has improved dramatically in recent years.Silicon-based optoelectronic heterogeneous integration is the key enabler to achieve high performance optical interconnection,which not only provides the optical gain which is absent from native Si substrates and enables complete photonic functionalities on chip,but also improves the system performance through advanced heterogeneous integrated packaging.This paper reviews recent progress of silicon-based optoelectronic heterogeneous integration in high performance optical interconnection.The research status,development trend and application of ultra-low loss optical waveguides,high-speed detectors,high-speed modulators,lasers and 2D,2.5D,3D and monolithic integration are focused on. 展开更多
关键词 silicon-based heterogeneous integration heterogeneous integrated materials heterogeneous integrated packaging optical interconnection
原文传递
Multifunctional silicon-based light emitting device in standard complementary metal oxide semiconductor technology 被引量:2
9
作者 王伟 黄北举 +1 位作者 董赞 陈弘达 《Chinese Physics B》 SCIE EI CAS CSCD 2011年第1期677-683,共7页
A three-terminal silicon-based light emitting device is proposed and fabricated in standard 0.35 μm complementary metal-oxide-semiconductor technology. This device is capable of versatile working modes: it can emit ... A three-terminal silicon-based light emitting device is proposed and fabricated in standard 0.35 μm complementary metal-oxide-semiconductor technology. This device is capable of versatile working modes: it can emit visible to near infra-red (NIR) light (the spectrum ranges from 500 nm to 1000 nm) in reverse bias avalanche breakdown mode with working voltage between 8.35 V-12 V and emit NIR light (the spectrum ranges from 900 nm to 1300 nm) in the forward injection mode with working voltage below 2 V. An apparent modulation effect on the light intensity from the polysilicon gate is observed in the forward injection mode. Furthermore, when the gate oxide is broken down, NIR light is emitted from the polysilicon/oxide/silicon structure. Optoelectronic characteristics of the device working in different modes are measured and compared. The mechanisms behind these different emissions are explored. 展开更多
关键词 optoelectronic integrated circuit complementary metal-oxide-semiconductor technology silicon-based light emitting device ELECTROLUMINESCENCE
原文传递
Micro-Mechanism of Silicon-Based Waveguide Surface Smoothing in Hydrogen Annealing 被引量:1
10
作者 段倩倩 任馨宇 +5 位作者 菅傲群 张辉 冀健龙 张强 张文栋 桑胜波 《Chinese Physics Letters》 SCIE CAS CSCD 2016年第12期110-114,共5页
The micro-mechanism of the silicon-based waveguide surface smoothing is investigated systematically to explore the effects of silicon-hydrogen bonds on high-temperature hydrogen annealing waveguides. The effect of sil... The micro-mechanism of the silicon-based waveguide surface smoothing is investigated systematically to explore the effects of silicon-hydrogen bonds on high-temperature hydrogen annealing waveguides. The effect of silicon- hydrogen bonds on the surface migration movement of silicon atoms and the waveguide surface topography are revealed. The micro-migration from an upper state to a lower state of silicon atoms is driven by silicon- hydrogen bonding, which is the key to ameliorate the rough surface morphology of the silicon-based waveguide. The process of hydrogen annealing is experimentally validated based on the simulated parameters. The surface roughness declines from 1.523nm to 0.461 nm. 展开更多
关键词 of on Micro-Mechanism of silicon-based Waveguide Surface Smoothing in Hydrogen Annealing in IS
原文传递
Constructing high-toughness polyimide binder with robust polarity and ion-conductive mechanisms ensuring long-term operational stability of silicon-based anodes 被引量:1
11
作者 Yongjun Kang Nanxi Dong +5 位作者 Fangzhou Liu Daolei Lin Bingxue Liu Guofeng Tian Shengli Qi Dezhen Wu 《Journal of Energy Chemistry》 SCIE EI CAS CSCD 2024年第6期580-591,I0014,共13页
Silicon-based materials have demonstrated remarkable potential in high-energy-density batteries owing to their high theoretical capacity.However,the significant volume expansion of silicon seriously hinders its utiliz... Silicon-based materials have demonstrated remarkable potential in high-energy-density batteries owing to their high theoretical capacity.However,the significant volume expansion of silicon seriously hinders its utilization as a lithium-ion anode.Herein,a functionalized high-toughness polyimide(PDMI) is synthesized by copolymerizing the 4,4'-Oxydiphthalic anhydride(ODPA) with 4,4'-oxydianiline(ODA),2,3-diaminobenzoic acid(DABA),and 1,3-bis(3-aminopropyl)-tetramethyl disiloxane(DMS).The combination of rigid benzene rings and flexible oxygen groups(-O-) in the PDMI molecular chain via a rigidness/softness coupling mechanism contributes to high toughness.The plentiful polar carboxyl(-COOH) groups establish robust bonding strength.Rapid ionic transport is achieved by incorporating the flexible siloxane segment(Si-O-Si),which imparts high molecular chain motility and augments free volume holes to facilitate lithium-ion transport(9.8 × 10^(-10) cm^(2) s^(-1) vs.16 × 10^(-10) cm^(2) s~(-1)).As expected,the SiO_x@PDMI-1.5 electrode delivers brilliant long-term cycle performance with a remarkable capacity retention of 85% over 500 cycles at 1.3 A g^(-1).The well-designed functionalized polyimide also significantly enhances the electrochemical properties of Si nanoparticles electrode.Meanwhile,the assembled SiO_x@PDMI-1.5/NCM811 full cell delivers a high retention of 80% after 100 cycles.The perspective of the binder design strategy based on polyimide modification delivers a novel path toward high-capacity electrodes for high-energy-density batteries. 展开更多
关键词 Polyimide binder High toughness Robust ionic transport silicon-based anodes Lithium-ion batteries
在线阅读 下载PDF
Modification of methyl oleate for silicon-based biological lubricating base oil 被引量:2
12
作者 Shixing Cui Zhi Yun Xia Gui 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2017年第1期130-136,共7页
A new kind of silicon-based biological lubricating base oil with good viscosity-temperature behavior,viscosity index,thermostability,oxidation stability and wear resistance performance was synthesized as a derivative ... A new kind of silicon-based biological lubricating base oil with good viscosity-temperature behavior,viscosity index,thermostability,oxidation stability and wear resistance performance was synthesized as a derivative of methyl oleate.Trimethylsilylation reaction was introduced to further improve methyl oleate oxidation stability and lubricity after epoxidation and open-ring reactions.The order of effectiveness of acid binding agent was N,N-diisopropylethylamine(DIEA) > pyridine > diethylamine > triethylamine,and the effects of various parameters on the trimethylsilylation reaction as well as on the silicon-oxygen bond stability and reaction yield were studied.A maximum yield of 34.54%was achieved at hydroxyl/trimethyl chlorosilane/DIEA molar ratio of1:1.25:1,reaction temperature 40℃,reaction time 1.5 h. 展开更多
关键词 Methyl oleate Trimethyl chlorosilane Acid binding agent N N-diisopropylethylamine Lubricity silicon-based biological lubricating base oil
在线阅读 下载PDF
Research Towards Terahertz Power Amplifiers in Silicon-Based Process 被引量:1
13
作者 CHEN Jixin ZHOU Peigen +3 位作者 YU Jiayang LI Zekun LI Huanbo PENG Lin 《ZTE Communications》 2023年第2期88-94,共7页
In view of the existing design challenges for Terahertz(THz)power amplifiers(PAs),the common design methods and the efforts of the State Key Laboratory of Millimeter Wave,Southeast University,China in the development ... In view of the existing design challenges for Terahertz(THz)power amplifiers(PAs),the common design methods and the efforts of the State Key Laboratory of Millimeter Wave,Southeast University,China in the development of silicon-based THz PAs,mainly including silicon-based PAs with operating frequencies covering 100–300 GHz,are summarized in this paper.Particularly,we design an LC-balun-based two-stage differential cascode PA with a center frequency of 150 GHz and an output power of 14 dBm.Based on a Marchand balun,we report a 220 GHz three-stage differential cascode PA with a saturated output power of 9.5 dBm.To further increase the output power of THz PA,based on a four-way differential power combining technique,we report a 211–263 GHz dual-LC-tank-based broadband PA with a recorded 14.7 dBm Psat and 16.4 dB peak gain.All the above circuits are designed in a standard 130 nm silicon germanium(SiGe)BiCMOS process. 展开更多
关键词 power amplifier power combining SIGE silicon-based TERAHERTZ
在线阅读 下载PDF
Design Technologies for Silicon-Based High-Efficiency RF Power Amplifiers:A Brief Overview 被引量:1
14
作者 Ruili Wu Jerry Lopez +1 位作者 Yan Li Donald Y.C.Lie 《ZTE Communications》 2011年第3期28-35,共8页
This paper presents a brief overview of several promising design technologies for high efficiency silicon-based radio frequency (RF) power amplifiers (PAs) as well as the use of these technologies in mobile broadb... This paper presents a brief overview of several promising design technologies for high efficiency silicon-based radio frequency (RF) power amplifiers (PAs) as well as the use of these technologies in mobile broadband wireless communications. Four important aspects of PA design are addressed in this paper. First, we look at class-E PA design equations and provide an example of a class-E PA that achieves efficiency of 65-70% at 2.4 GHz. Then, we discuss state-of-the-art envelope tracking (ET) design for monolithic wideband RF mobile transmitter applications. A brief overview of Doherty PA design for the next-generation wireless handset applications is then given. Towards the end of the paper, we discuss an inherently broadband and highly efficient class-J PA design targeting future multi-band multi-standard wireless communication protocols. 展开更多
关键词 radio frequency power amplifier silicon-based power amplifier envelope tracking class-E amplifier broadband PA class-J Doherty power amplifier
在线阅读 下载PDF
Cu/diamond复合材料平面研磨实验研究
15
作者 赵翠翠 刘成炜 +2 位作者 于晓琳 焦可如 黄树涛 《表面技术》 北大核心 2025年第10期208-224,共17页
目的 为实现Cu/diamond复合材料表面高效平坦化的研磨加工提供理论和实验基础,满足该材料应用需求。方法 对Cu/diamond复合材料进行平面研磨加工实验,研究了研磨盘转速、研磨压力及磨粒粒度对研磨表面质量和材料去除率的影响。结果 实... 目的 为实现Cu/diamond复合材料表面高效平坦化的研磨加工提供理论和实验基础,满足该材料应用需求。方法 对Cu/diamond复合材料进行平面研磨加工实验,研究了研磨盘转速、研磨压力及磨粒粒度对研磨表面质量和材料去除率的影响。结果 实验结果表明:Cu/diamond复合材料研磨过程中金刚石增强颗粒的去除形式主要包括延性去除、局部破碎、整体脱落、表面和边缘微小脆性破碎几种形式;研磨表面金刚石增强颗粒与Cu基体两相之间呈现台阶现象,随着金刚石磨粒粒度的增加台阶现象越显著,增强颗粒研磨表面整体平整,增强颗粒间的基体区域较为平坦;Cu/diamond复合材料研磨过程材料去除率随研磨盘转速、研磨压力的增大先增大后减小,随磨粒粒度的增大而增大,研磨盘转速对表面粗糙度影响不大,研磨压力对表面质量的影响大于研磨盘转速,其中磨粒粒度对表面质量及材料去除率的影响最为显著;综合研磨加工效果,Cu/diamond复合材料在研磨120 min,研磨盘转速为180 r/min、研磨压力为1.2 MPa、金刚石磨粒粒度为W14的条件下加工,可以获得表面粗糙度为0.488μm的平坦表面,材料去除率可达0.785μm/min。结论 通过合理选择研磨速度、研磨压力和金刚石磨料粒度对Cu/diamond复合材料进行研磨加工,能够以较高的研磨效率获得较为平坦的表面。 展开更多
关键词 Cu/diamond复合材料 平面研磨 材料去除率 表面粗糙度 表面形貌 研磨参数
在线阅读 下载PDF
Low insertion loss silicon-based spatial light modulator with high reflective materials outside Fabry–Perot cavity
16
作者 Li-Fei Tian Ying-Xin Kuang +1 位作者 Zhong-Chao Fan Zhi-Yong Li 《Chinese Physics B》 SCIE EI CAS CSCD 2019年第10期376-380,共5页
The extinction ratio and insertion loss of spatial light modulator are subject to the material problem, thus limiting its applications. One reflection-type silicon-based spatial light modulator with high reflective ma... The extinction ratio and insertion loss of spatial light modulator are subject to the material problem, thus limiting its applications. One reflection-type silicon-based spatial light modulator with high reflective materials outside the Fabry-Perot cavity is demonstrated in this paper. The reflectivity values of the outside-cavity materials with different film layer numbers are simulated. The reflectivity values of 6-pair Ta2O5/SiO2 films at 1550 nm are experimentally verified to be as high as 99.9%. The surfaces of 6-pair Ta2O5/SiO2 films are smooth: their root-mean-square roughness values are as small as 0.53 nm. The insertion loss of the device at 1550 nm is only 1.2 dB. The high extinction ratio of the device at 1550 nm and 11 V is achieved to be 29.7 dB. The spatial light modulator has a high extinction ratio and low insertion loss for applications. 展开更多
关键词 spatial light modulator HIGH REFLECTIVE materials silicon-based FABRY-PEROT cavity
原文传递
High-performing silicon-based germanium Schottky photodetector with ITO transparent electrode
17
作者 Zhiwei Huang Shaoying Ke +4 位作者 Jinrong Zhou Yimo Zhao Wei Huang Songyan Chen Cheng Li 《Chinese Physics B》 SCIE EI CAS CSCD 2021年第3期447-453,共7页
A near-infrared germanium(Ge)Schottky photodetector(PD)with an ultrathin silicon(Si)barrier enhancement layer between the indium-doped tin oxide(ITO)electrode and Ge epilayer on Si or silicon-on-insulator(SOI)is propo... A near-infrared germanium(Ge)Schottky photodetector(PD)with an ultrathin silicon(Si)barrier enhancement layer between the indium-doped tin oxide(ITO)electrode and Ge epilayer on Si or silicon-on-insulator(SOI)is proposed and fabricated.The well-behaved ITO/Si cap/Ge Schottky junctions without intentional doping process for the Ge epilayer are formed on the Si and SOI substrates.The Si-and SOI-based ITO/Si cap/Ge Schottky PDs exhibit low dark current densities of 33 mA/cm2 and 44 mA/cm2,respectively.Benefited from the high transmissivity of ITO electrode and the reflectivity of SOI substrate,an optical responsivity of 0.19 A/W at 1550 nm wavelength is obtained for the SOI-based ITO/Si cap/Ge Schottky PD.These complementary metal–oxide–semiconductor(CMOS)compatible Si(or SOI)-based ITO/Si cap/Ge Schottky PDs are quite useful for detecting near-infrared wavelengths with high efficiency. 展开更多
关键词 silicon-based Schottky photodetector germanium epilayer indium-doped tin oxide
原文传递
Interfacial Structure and Mechanical Properties of Diamond/Copper Joint Brazed by Ag-Cu-In-Ti Low-Temperature Brazing Filler 被引量:2
18
作者 Pan Yufan Liang Jiabin +10 位作者 Nie Jialong Liu Xin Sun Huawei Chang Yunfeng Li Huaxin Lu Chuanyang Xu Dong Wang Xingxing Yang Yang Yang Jianguo He Yanming 《稀有金属材料与工程》 北大核心 2025年第2期301-310,共10页
Ag-Cu-In-Ti low-temperature filler was used to braze the diamond and copper,and the effects of brazing temperature and soaking time on the microstructure and mechanical properties of the joints were investigated.In ad... Ag-Cu-In-Ti low-temperature filler was used to braze the diamond and copper,and the effects of brazing temperature and soaking time on the microstructure and mechanical properties of the joints were investigated.In addition,the joint formation mechanism was discussed,and the correlation between joint microstructure and mechanical performance was established.Results show that adding appropriate amount of In into the filler can significantly reduce the filler melting point and enhance the wettability of filler on diamond.When the brazing temperature is 750°C and the soaking time is 10 min,a uniformly dense braze seam with excellent metallurgical bonding can be obtained,and its average joint shear strength reaches 322 MPa.The lower brazing temperature can mitigate the risk of diamond graphitization and also reduce the residual stresses during joining. 展开更多
关键词 diamond microwave window vacuum brazing Ag-Cu-In-Ti microstructure mechanical properties
原文传递
磨粒粒度对Cu/diamond复合材料研磨效果的影响
19
作者 赵翠翠 黄树涛 《机械工程与自动化》 2025年第6期49-50,共2页
对Cu/diamond复合材料进行研磨加工实验,研究不同磨粒粒度对研磨表面质量和去除率的影响。实验结果表明:Cu/diamond复合材料的研磨去除率随着磨粒粒度的增大而增大,表面粗糙度也随着磨粒粒度的增大而增大;磨粒粒度越小,研磨效率越低,表... 对Cu/diamond复合材料进行研磨加工实验,研究不同磨粒粒度对研磨表面质量和去除率的影响。实验结果表明:Cu/diamond复合材料的研磨去除率随着磨粒粒度的增大而增大,表面粗糙度也随着磨粒粒度的增大而增大;磨粒粒度越小,研磨效率越低,表面质量越好。 展开更多
关键词 Cu/diamond复合材料 表面粗糙度 材料去除率 平面研磨
在线阅读 下载PDF
Atomic surface of diamond induced by novel green photocatalytic chemical mechanical polishing with high material removal rate 被引量:1
20
作者 Zhibin Yu Zhenyu Zhang +6 位作者 Zinuo Zeng Cheng Fan Yang Gu Chunjing Shi Hongxiu Zhou Fanning Meng Junyuan Feng 《International Journal of Extreme Manufacturing》 2025年第2期661-676,共16页
Atomic surfaces are strictly required by high-performance devices of diamond.Nevertheless,diamond is the hardest material in nature,leading to the low material removal rate(MRR)and high surface roughness during machin... Atomic surfaces are strictly required by high-performance devices of diamond.Nevertheless,diamond is the hardest material in nature,leading to the low material removal rate(MRR)and high surface roughness during machining.Noxious slurries are widely used in conventional chemical mechanical polishing(CMP),resulting in the possible pollution to the environment.Moreover,the traditional slurries normally contain more than four ingredients,causing difficulties to control the process and quality of CMP.To solve these challenges,a novel green CMP for single crystal diamond was developed,consisting of only hydrogen peroxide,diamond abrasive and Prussian blue(PB)/titania catalyst.After CMP,atomic surface is achieved with surface roughness Sa of 0.079 nm,and the MRR is 1168 nm·h^(-1).Thickness of damaged layer is merely 0.66 nm confirmed by transmission electron microscopy(TEM).X-ray photoelectron spectroscopy,electron paramagnetic resonance and TEM reveal that·OH radicals form under ultraviolet irradiation on PB/titania catalyst.The·OH radicals oxidize diamond,transforming it from monocrystalline to amorphous atomic structure,generating a soft amorphous layer.This contributes the high MRR and formation of atomic surface on diamond.The developed novel green CMP offers new insights to achieve atomic surface of diamond for potential use in their high-performance devices. 展开更多
关键词 photocatalytic chemical mechanical polishing diamond photocatalytic Fenton reaction material removal rate atomic diamond surface
在线阅读 下载PDF
上一页 1 2 250 下一页 到第
使用帮助 返回顶部