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Stimulated photoluminescence emission and trap states in Si/SiO_2 interface formed by irradiation of laser 被引量:2
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作者 黄伟其 许丽 +5 位作者 王海旭 金峰 吴克跃 刘世荣 秦朝建 秦水介 《Chinese Physics B》 SCIE EI CAS CSCD 2008年第5期1817-1820,共4页
Stimulated photoluminescence (PL) emission has been observed from an oxide structure of silicon when optically excited by a radiation of 514nm laser. Sharp twin peaks at 694 and 692nm are dominated by stimulated emi... Stimulated photoluminescence (PL) emission has been observed from an oxide structure of silicon when optically excited by a radiation of 514nm laser. Sharp twin peaks at 694 and 692nm are dominated by stimulated emission, which can be demonstrated by its threshold behaviour and linear transition of emission intensity as a function of pump power. The oxide structure is formed by laser irradiation on silicon and its annealing treatment. A model for explaining the stimulated emission is proposed, in which the trap states of the interface between an oxide of silicon and porous nanocrystal play an important role. 展开更多
关键词 interface states stimulated emission oxide structure of silicon laser irradiation
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