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Impact of Oxygen Vacancy on Performance of Amorphous InGaZnO Based Schottky Barrier Diode 被引量:1
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作者 JIA Bin TONG Xiaowen +3 位作者 HAN Zikang QIN Ming WANG Lifeng HUANG Xiaodong 《发光学报》 北大核心 2025年第3期412-420,共9页
Rectifying circuit,as a crucial component for converting alternating current into direct current,plays a pivotal role in energy harvesting microsystems.Traditional silicon-based or germanium-based rectifier diodes hin... Rectifying circuit,as a crucial component for converting alternating current into direct current,plays a pivotal role in energy harvesting microsystems.Traditional silicon-based or germanium-based rectifier diodes hinder system integration due to their specific manufacturing processes.Conversely,metal oxide diodes,with their simple fabrication techniques,offer advantages for system integration.The oxygen vacancy defect of oxide semiconductor will greatly affect the electrical performance of the device,so the performance of the diode can be effectively controlled by adjusting the oxygen vacancy concentration.This study centers on optimizing the performance of diodes by modulating the oxygen vacancy concentration within InGaZnO films through control of oxygen flows during the sputtering process.Experimental results demonstrate that the diode exhibits a forward current density of 43.82 A·cm^(−2),with a rectification ratio of 6.94×10^(4),efficiently rectifying input sine signals with 1 kHz frequency and 5 V magnitude.These results demonstrate its potential in energy conversion and management.By adjusting the oxygen vacancy,a methodology is provided for optimizing the performance of rectifying diodes. 展开更多
关键词 INGAZNO schottky barrier diode oxygen vacancy rectifying performance
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Trimetallic MOFs derived NiFe_(2)O_(4)/MoNi_(4)-NC Schottky heterojunctions with abundant defects and dielectric-magnetic coupling for electromagnetic response 被引量:1
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作者 Ya Ning Xiao Jiang +2 位作者 Jun Huang Yanfeng Gao Xiaojun Zeng 《Journal of Materials Science & Technology》 2025年第10期1-13,共13页
There is limited research reported on the multiple loss mechanism of electromagnetic waves(EMW)and the development of interface models.Dielectric loss and magnetic loss,as the two primary attenuation mechanisms in EMW... There is limited research reported on the multiple loss mechanism of electromagnetic waves(EMW)and the development of interface models.Dielectric loss and magnetic loss,as the two primary attenuation mechanisms in EMW absorbers,still pose challenges,especially in elucidating the correlation between composition,morphology,interface,and performance.Here,we construct 3D hierarchical porous conducting network structures and Schottky heterojunctions(MoNi_(4)@NC-NiFe_(2)O_(4)@NC)with a high density of defects,using trimetallic NiMoFe-MOFs.Synergistic enhancement of the dielectric and magnetic losses is realized through manipulation of the defects,interfaces,phase engineering,and magnetic resonance.In particular,the even dispersion of magnetic MoNi_(4) and NiFe_(2)O_(4)nanoparticles(NPs)within the carbon matrix triggers the creation of multiple heterogeneous interfaces.These inseparable interfaces,along with oxygen vacancies,play a role in enhancing dielectric polarization,while the closely spaced interactions among magnetic units contribute to magnetic loss.After optimizing the interfacial structure,NiFe_(2)O_(4)/MoNi_(4)-NC exhibits remarkable EMW absorption properties.A reflection loss(RL)value of-67.91 dB can be achieved at an ultra-thin thickness of 1.95 mm,and the effective absorption bandwidth(EAB,RL≤-10 dB)is as high as 5.76 GHz.Furthermore,we conducted radar scattering cross-section(RCS)simulations using computer simulation technology(CST)software,which revealed that NiFe_(2)O_(4)/MoNi_(4)-NC exhibits an RCS reduction value of 39.1 dB m^(2).Hence,this work provides comprehensive guidance for the construction of Schottky heterojunctions for lightweight EMW absorbers from a mechanistic point of view. 展开更多
关键词 Trimetallic NiMoFe-MOFs Multiple loss mechanisms Heterogeneous interfaces schottky heterojunctions Electromagnetic response
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Precision storage lifetime measurements of highly charged heavy ions in the CSRe storage ring using a Schottky resonator
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作者 Qian Wang Xin-Liang Yan +13 位作者 Guang-Yu Zhu Shahab Sanjari Li-Jun Mao He Zhao Yuri ALitvinov Rui-Jiu Chen Meng Wang Yu-Hu Zhang You-Jin Yuan Jun-Xia Wu Hong-Yang Jiao Yue Yu Zu-Yi Chen Yin-Fang Luo 《Nuclear Science and Techniques》 2025年第1期150-160,共11页
Schottky mass spectrometry utilizing heavy-ion storage rings is a powerful technique for the precise mass and decay half-life measurements of highly charged ions.Owing to the nondestructive ion detection features of S... Schottky mass spectrometry utilizing heavy-ion storage rings is a powerful technique for the precise mass and decay half-life measurements of highly charged ions.Owing to the nondestructive ion detection features of Schottky noise detectors,the number of stored ions in the ring is determined by the peak area in the measured revolution frequency spectrum.Because of their intrinsic amplitude-frequency characteristic(AFC),Schottky detector systems exhibit varying sensitivities at different frequencies.Using low-energy electron-cooled stored ions,a new method is developed to calibrate the AFC curve of the Schottky detector system of the Experimental Cooler Storage Ring(CSRe)storage ring located in Lanzhou,China.Using the amplitude-calibrated frequency spectrum,a notable refinement was observed in the precision of both the peak position and peak area.As a result,the storage lifetimes of the electron-cooled fully ionized^(56)Fe^(26+)ions were determined with high precision at beam energies of 13.7 and 116.4 MeV/u,despite of frequency drifts during the experiment.When electron cooling was turned off,the effective vacuum condition experienced by the 116.4 MeV/u^(56)Fe^(26+)ions was determined using amplitude-calibrated spectra,revealing a value of 2×10^(−10)mbar,which is consistent with vacuum gauge readings along the CSRe ring.The method reported herein will be adapted for the next-generation storage ring of the HIAF facility under construction in Huizhou,China.It can also be adapted to other storage ring facilities worldwide to improve precision and enhance lifetime measurements using many ions in the ring. 展开更多
关键词 Lifetime measurement schottky mass spectrometry Sensitivity response Highly charged heavy ion RESONATOR UH vacuum Nondestructive diagnostics
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Advances in Schottky parameter extraction and applications
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作者 Peihua Wangyang Xiaolin Huang +11 位作者 Xiao-Lei Shi Niuniu Zhang Yu Ye Shuangzhi Zhao Jiamin Zhang Yingbo Liu Fabi Zhang Xingpeng Liu Haiou Li Tangyou Sun Ying Peng Zhi-Gang Chen 《Journal of Materials Science & Technology》 2025年第15期317-335,共19页
Schottky contacts have attracted widespread attention from both the electronic device industry and researchers since their discovery.The Schottky characteristics make these contacts highly suitable for use in field-ef... Schottky contacts have attracted widespread attention from both the electronic device industry and researchers since their discovery.The Schottky characteristics make these contacts highly suitable for use in field-effect transistors(FETs),photodetectors(PDs),solar cells(SCs),resistive-switching memories(RSMs),thin-film transistors(TFTs),etc.However,how do Schottky contacts affect the device performance?The answer lies simply in the Schottky parameters.This review focuses on the extraction of Schottky parameters,i.e.,the Schottky barrier height(SBH),ideality factor(IF),and series resistance(SR),from the current-voltage(I−V)curve to understand and analyze the characteristics of Schottky devices.First,the current research progress in this field and the principles of Schottky contacts are presented.Second,this article delves into some classic and widely used extraction methods as well as the latest extraction methods,providing an objective evaluation based on their practical effectiveness.Then,several research applications,including studies that require extraction,simple extraction,and delicate extraction,are enumerated to demonstrate the necessity and importance of Schottky parameter analysis.Finally,an outlook and future research prospects are discussed based on recent progress,and a comprehensive summary is given. 展开更多
关键词 schottky parameter extraction PHOTODETECTORS Solar cells Resistive-switching memory Thin-film transistors
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Schottky junction coupling with metal size effect for the enhancement of photocatalytic nitrate reduction
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作者 Xuemeng Sun Jianan Liu +2 位作者 Qi Li Cheng Wang Baojiang Jiang 《Chinese Journal of Catalysis》 2025年第6期358-367,共10页
Nitrate pollution poses a significant environmental challenge,and photocatalytic nitrate reduction has garnered considerable attention due to its efficiency and environmental advantages.Among these,the development of ... Nitrate pollution poses a significant environmental challenge,and photocatalytic nitrate reduction has garnered considerable attention due to its efficiency and environmental advantages.Among these,the development of Schottky junctions shows considerable potential for practical applications.However,the impact of metal nanoparticle size within Schottky junctions on photocatalytic nitrate reduction remains largely unexplored.In this study,we propose a novel method to modulate metal nanoparticle size within Schottky junctions by controlling light intensity during the photodeposition process.Smaller Au nanoparticles were found to enhance electron accumulation at active sites by promoting charge transfer from COF to Au,thereby improving internal electron transport.Additionally,the Schottky barrier effectively suppressed reverse electron transfer while enhancing NO_(3)^(–)adsorption and activation.The Au_(2-)COF exhibited remarkable nitrate reduction performance,achieving an ammonia yield of 382.48μmol g^(–1)h^(–1),5.7 times higher than that of pure COF.This work provides novel theoretical and practical insights into using controlled light intensity to regulate metal nanoparticle size within Schottky junctions,thereby enhancing photocatalytic nitrate reduction. 展开更多
关键词 schottky junction Nitrate reduction PHOTOCATALYSIS Covalent organic frameworks
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Optimizing the Schottky barrier in AuAg alloy decorated TiO_(2)nanofibers to enhance hot-electron-induced CO_(2)reduction
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作者 Na Lu Tingting Pang +7 位作者 Xuedong Jing Yongan Zhu Linqun Yu Sining Ben Yuchan Song Shiwen Du Wei Lu Zhenyi Zhang 《Chinese Journal of Structural Chemistry》 2025年第8期71-80,共10页
Plasmon-induced hot electron can transfer from noble metal to its cohesive semiconductor in their heterostructure to initiate the photocatalytic reaction upon resonance excitation.However,the co-excitation of semicond... Plasmon-induced hot electron can transfer from noble metal to its cohesive semiconductor in their heterostructure to initiate the photocatalytic reaction upon resonance excitation.However,the co-excitation of semiconductor in the heterostructure would also lead to the inversus transfer of photo-electron from semiconductor to noble metal,which inevitably limits the use of active electrons.After co-excitation of both localized surface plasmon resonance(LSPR)of noble metal and interband transition of semiconductor,the interfacial electron transfer process strongly depends on the energy band configuration of their heterostructure.When the Au content in the AuAg alloy nanoparticles(NPs)changes from 0 to 100 at.%,the interfacial energy band configuration at AuAg NPs/TiO_(2) NPs in the electrospun nanofibers(NFs)shifts from Ohmic to Schottky contacts.Further investigation finds that the optimal Schottky barrier configuration in Au_(0.25)Ag_(0.75)/TiO_(2) NFs can not only boost the plasmon-induced hot electron transfer from Au_(0.25)Ag_(0.75) to TiO_(2) NPs,but also suppresses the backflow of photo-electrons from TiO_(2) to Au_(0.25)Ag_(0.75) NPs in NFs.Thus,upon UV-visible light irradiation,the CO_(2) photo-reduction activity of Au_(0.25)Ag_(0.75)/TiO_(2) NFs is~3 and~2 times higher than that of either Ag/TiO_(2) or Au/TiO_(2) NFs. 展开更多
关键词 Photocatalysis Plasmonic hot-electron injection schottky barrier AuAg alloy CO_(2)reduction
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Unlocking of Schottky Barrier Near the Junction of MoS_(2)Heterostructure Under Electrochemical Potential
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作者 Kubra Aydin Mansu Kim +8 位作者 Hyunho Seok Chulwoo Bae Jinhyoung Lee Muyoung Kim Jonghwan Park Joseph T.Hupp Dongmok Whang Hyeong-U Kim Taesung Kim 《Energy & Environmental Materials》 2025年第1期323-329,共7页
The exploration of heterostructures composed of two-dimensional(2D)transition metal dichalcogenide(TMDc)materials has garnered significant research attention due to the distinctive properties of each individual compon... The exploration of heterostructures composed of two-dimensional(2D)transition metal dichalcogenide(TMDc)materials has garnered significant research attention due to the distinctive properties of each individual component and their phase-dependent unique properties.Using the plasma-enhanced chemical vapor deposition(PECVD)method,we analyze the fabrication of heterostructures consisting of two phases of molybdenum disulfide(MoS_(2))in four different cases.The initial hydrogen evolution reaction(HER)polarization curve indicates that the activity of the heterostructure MoS_(2)is consistent with that of the underlying MoS_(2),rather than the surface activity of the upper MoS_(2).This behavior can be attributed to the presence of Schottky barriers,which include contact resistance,which significantly hampers the efficient charge transfer at junctions between the two different phases of MoS_(2)layers and is mediated by van der Waals bonds.Remarkably,the energy barrier at the junction dissipates upon reaching a certain electrochemical potential,indicating surface activation from the top phase of MoS_(2)in the heterostructure.Notably,the 1T/2H MoS_(2)heterostructure demonstrates enhanced electrochemical stability compared to its metastable 1T-MoS_(2).This fundamental understanding paves the way for the creation of phase-controllable heterostructures through an experimentally viable PECVD,offering significant promise for a wide range of applications. 展开更多
关键词 hydrogen evolution reaction(HER) molybdenum disulfide(MoS_(2)) plasmaenhanced chemical vapor deposition(PECVD) schottky barrier van der Waals(vdW)heterostructure
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Schottky探针研制与测试研究 被引量:3
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作者 陈立新 肖国青 +9 位作者 郭忠言 詹文龙 孙志宇 李加兴 王猛 毛瑞士 陈志强 白洁 胡正国 李琛 《原子核物理评论》 CAS CSCD 北大核心 2004年第1期30-33,共4页
利用Schottky质谱仪进行远离β稳定线核质量测量研究是九五国家大科学工程兰州重离子加速器冷却储存环上的一个重要研究方向.简要分析了Schottky探针的工作原理和利用Schot tky质谱仪进行质量测量,给出了对用于HIRFL CSR束流诊断与测量... 利用Schottky质谱仪进行远离β稳定线核质量测量研究是九五国家大科学工程兰州重离子加速器冷却储存环上的一个重要研究方向.简要分析了Schottky探针的工作原理和利用Schot tky质谱仪进行质量测量,给出了对用于HIRFL CSR束流诊断与测量的Schottky探针的研制与测试结果. 展开更多
关键词 schottky探针 肖特基质谱仪 冷却储存环 质量测量 飞行时间测量 束流位置测量
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An Analytical Model of Drain Current for Ultra-Thin Body and Double-Gate Schottky Source/Drain MOSFETs Accounting for Quantum Effects 被引量:2
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作者 栾苏珍 刘红侠 +3 位作者 贾仁需 蔡乃琼 王瑾 匡潜玮 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第5期869-874,共6页
A compact drain current including the variation of barrier heights and carrier quantization in ultrathin-body and double-gate Schottky barrier MOSFETs (UTBDG SBFETs) is developed. In this model, Schrodinger's equat... A compact drain current including the variation of barrier heights and carrier quantization in ultrathin-body and double-gate Schottky barrier MOSFETs (UTBDG SBFETs) is developed. In this model, Schrodinger's equation is solved using the triangular potential well approximation. The carrier density thus obtained is included in the space charge density to obtain quantum carrier confinement effects in the modeling of thin-body devices. Due to the quantum effects, the first subband is higher than the conduction band edge, which is equivalent to the band gap widening. Thus, the barrier heights at the source and drain increase and the carrier concentration decreases as the drain current decreases. The drawback of the existing models,which cannot present an accurate prediction of the drain current because they mainly consider the effects of Schottky barrier lowering (SBL) due to image forces,is eliminated. Our research results suggest that for small nonnegative Schottky barrier (SB) heights,even for zero barrier height, the tunneling current also plays a role in the total on-state currents. Verification of the present model was carried out by the device numerical simulator-Silvaco and showed good agreement. 展开更多
关键词 schottky barrier quantum effects the effective mass electron density
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Ti/4H-SiC Schottky Barrier Diodes with Field Plate and B^+ Implantation Edge Termination Technology 被引量:2
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作者 陈刚 李哲洋 +1 位作者 柏松 任春江 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2007年第9期1333-1336,共4页
This paper describes the fabrication and electrical characteristics of Ti/4H-SiC Schottky barrier diodes (SBDs). The ideality factor n = 1.08 and effective Schottky barrier heightφ= 1.05eV of the SBDs were measured... This paper describes the fabrication and electrical characteristics of Ti/4H-SiC Schottky barrier diodes (SBDs). The ideality factor n = 1.08 and effective Schottky barrier heightφ= 1.05eV of the SBDs were measured with the method of forward current density-voltage (J-V). A low reverse leakage current below 5.96 ×10^-3A/cm^2 at a bias voltage of - 1. 1kV was obtained. By using B^+ implantation,an amorphous layer as the edge termination was formed. We used the PECVD SiO2 as the field plate dielectric. The SBDs have an on-state current density of 430A/cm^2 at a forward voltage drop of about 4V. The specific on-resistance Ro, was found to be 6. 77mΩ2 · cm^2 . 展开更多
关键词 4H-SIC schottky barrier ideal factor barrier height IMPLANTATION
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SiC和Si混合PiN/Schottky二极管的模拟和设计 被引量:3
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作者 张玉明 牛新军 张义门 《电力电子技术》 CSCD 北大核心 2002年第1期56-59,共4页
介绍一种具有肖特基正向特性和PN结反向特性的新型整流器混合PiN/Schottky二极管 (MPS) ,它速度快、击穿电压高、漏电流小、正向压降低 ,适合功率系统使用。理论分析了该器件的正向导通、反向阻断和击穿特性。主要考虑 4HSiC ,模拟和优... 介绍一种具有肖特基正向特性和PN结反向特性的新型整流器混合PiN/Schottky二极管 (MPS) ,它速度快、击穿电压高、漏电流小、正向压降低 ,适合功率系统使用。理论分析了该器件的正向导通、反向阻断和击穿特性。主要考虑 4HSiC ,模拟和优化设计了器件的外延层掺杂浓度和厚度、肖特基接触和PN结网格宽度、PN结深度和掺杂浓度等主要的结构参数。 展开更多
关键词 半导体器件 碳化硅 模拟 混合PiN/schottky二级管 整流器
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混凝土中钢筋钝化膜的Mott—Schottky研究 被引量:3
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作者 张云莲 史美伦 陈志源 《腐蚀科学与防护技术》 CAS CSCD 北大核心 2005年第B12期453-456,共4页
运用Mott—Schottky图可分析混凝土中钢筋钝化膜的半导体特性.对饱和氢氧化钙溶液中和混凝土中钢筋钝化膜的测定表明,在-0.8V~0.3V范围,混凝土中钢筋钝化膜的Csc^-2-E呈Mott—Schottky线性关系,且斜率为正,即钢筋钝化膜为n-型... 运用Mott—Schottky图可分析混凝土中钢筋钝化膜的半导体特性.对饱和氢氧化钙溶液中和混凝土中钢筋钝化膜的测定表明,在-0.8V~0.3V范围,混凝土中钢筋钝化膜的Csc^-2-E呈Mott—Schottky线性关系,且斜率为正,即钢筋钝化膜为n-型半导体,施主密度为10^26m^-3数量级.在本实验条件下,在模拟孔隙液中添加氯离子,钝化膜破坏严重;而硫酸根离子对钢筋钝化膜无明显影响;亚硝酸根离子能缓解和修补氯离子对钢筋钝化膜的破坏. 展开更多
关键词 钢筋 钝化膜Mott—schottky 模拟混凝土孔隙液
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Pt/CdS Schottky紫外探测器的光电性能研究 被引量:2
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作者 姚官生 张向锋 +1 位作者 丁嘉欣 吕衍秋 《红外技术》 CSCD 北大核心 2014年第6期443-445,共3页
制备了Pt/CdS Schottky紫外探测器,对Pt/CdS Schottky紫外芯片对中波红外(3~5μm)的透过率进行了研究,并对器件光电性能进行了测试分析。通过优化 Pt 电极制备条件及对 SiO2增透膜的研究,使Pt/CdS Schottky紫外芯片对中波红外波... 制备了Pt/CdS Schottky紫外探测器,对Pt/CdS Schottky紫外芯片对中波红外(3~5μm)的透过率进行了研究,并对器件光电性能进行了测试分析。通过优化 Pt 电极制备条件及对 SiO2增透膜的研究,使Pt/CdS Schottky紫外芯片对中波红外波段的透过率达到85%。室温300 K下,所制备Pt/CdS Schottky紫外探测器在零偏压处的背景光电流为-0.063 nA,在+6 V时的暗电流密度为7.6×10^-7 A/cm^2,R0A达到7.2×10^4Ω·cm^2,其50%截止波长为510 nm。 展开更多
关键词 Pt/CdS schottky 紫外探测器 红外透过率
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Design and Fabrication of Schottky Diode with Standard CMOS Process 被引量:1
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作者 李强 王俊宇 +1 位作者 韩益锋 闵昊 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2005年第2期238-242,共5页
Design and fabrication of Schottky barrier diodes (SBD) with a commercial standard 0 35μm CMOS process are described.In order to reduce the series resistor of Schottky contact,interdigitating the fingers of schottky... Design and fabrication of Schottky barrier diodes (SBD) with a commercial standard 0 35μm CMOS process are described.In order to reduce the series resistor of Schottky contact,interdigitating the fingers of schottky diode layout is adopted.The I-V,C-V ,and S parameter are measured.The parameters of realized SBD such as the saturation current,breakdown voltage,and the Schottky barrier height are given.The SPICE simulation model of the realized SBDs is given. 展开更多
关键词 CMOS schottky diode INTEGRATION
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双面Schottky势垒型GaAs粒子探测器特性 被引量:3
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作者 邵传芬 史常忻 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2000年第8期792-797,共6页
双面肖特基势垒型 Ga As粒子探测器由半绝缘砷化镓材料制成 ,器件结构为金属 -半导体-金属结构 ,该探测器能经受能量为 1 .5Me V、剂量高达 1 0 0 0 k Gy的电子、50 0 k Gy的 γ射线、β粒子、X射线等粒子的辐照测试 ,辐照后器件击穿曲... 双面肖特基势垒型 Ga As粒子探测器由半绝缘砷化镓材料制成 ,器件结构为金属 -半导体-金属结构 ,该探测器能经受能量为 1 .5Me V、剂量高达 1 0 0 0 k Gy的电子、50 0 k Gy的 γ射线、β粒子、X射线等粒子的辐照测试 ,辐照后器件击穿曲线坚挺 ,反向漏电流最低为 0 .48μA.器件的另一特征是其反向漏电流与 X射线的照射量呈线性关系 .该探测器在 2 4 1Am( Eα=5.48Me V) α粒子辐照下 ,其最大的电荷收集率和能量分辩率分别为 45%和 7% .在由 90 Sr( Eβ=2 .2 7Me V)发出的 β粒子辐照下 ,探测器有最小的电离粒子谱 . 展开更多
关键词 粒子探测器 schottky势垒 砷化镓
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扩展的Schottky发射高分辨扫描电镜 被引量:3
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作者 陈文雄 徐军 《电子显微学报》 CAS CSCD 1995年第6期449-457,共9页
本文从理论上评述了扫描电镜中作为电子源的五种发射制式,对冷场发射,热场发射,Schottky发射和扩展的Schottky发射四种制式,就虚源,能量分散,亮度,噪声等一些重要方面进行了详细的比较,指出了扩展的Schot... 本文从理论上评述了扫描电镜中作为电子源的五种发射制式,对冷场发射,热场发射,Schottky发射和扩展的Schottky发射四种制式,就虚源,能量分散,亮度,噪声等一些重要方面进行了详细的比较,指出了扩展的Schottky发射的优越性。同时给出了我们应用扩展的Schottky发射扫描电镜(AMRAY1910FE)所获得的一些高分辨形貌像。 展开更多
关键词 显微镜 场发射 schottky发射 扫描电镜
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关于Schottky定理与Hayman常数 被引量:3
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作者 高建福 《数学杂志》 CSCD 北大核心 2007年第6期720-724,共5页
本文对于在单位圆盘中不取值0与1的正则函数,利用了这种函数的对数导数模的准确上界与及Hayman常数有关的上界,得到了这种函数模的显式上界与Hayman常数的关系及这种函数的正规级.
关键词 schottky定理 Hayman常数 正规级 显式上界
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Improvements in reverse breakdown characteristics of THz GaAs Schottky barrier varactor based on metal-brim structure 被引量:3
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作者 Lu-Wei Qi Xiao-Yu Liu +2 位作者 Jin Meng De-Hai Zhang Jing-Tao Zhou 《Chinese Physics B》 SCIE EI CAS CSCD 2020年第5期464-468,共5页
The excellent reverse breakdown characteristics of Schottky barrier varactor(SBV)are crucially required for the application of high power and high efficiency multipliers.The SBV with a novel Schottky structure named m... The excellent reverse breakdown characteristics of Schottky barrier varactor(SBV)are crucially required for the application of high power and high efficiency multipliers.The SBV with a novel Schottky structure named metal-brim is fabricated and systemically evaluated.Compared with normal structure,the reverse breakdown voltage of the new type SBV improves from-7.31 V to-8.75 V.The simulation of the Schottky metal-brim SBV is also proposed.Three factors,namely distribution of leakage current,the electric field,and the area of space charge region are mostly concerned to explain the physical mechanism.Schottky metal-brim structure is a promising approach to improve the reverse breakdown voltage and reduce leakage current by eliminating the accumulation of charge at Schottky electrode edge. 展开更多
关键词 breakdown characteristics schottky metal-brim schottky barrier varactor GAAS
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Schottky Barrier Characteristics of Polycrystalline and Epitaxial CoSi_2/n-Si(111) Contacts Formed by Solid State Reaction
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作者 竺士炀 茹国平 +1 位作者 屈新萍 李炳宗 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2001年第6期689-694,共6页
Polycrystalline and epitaxial CoSi 2 films are formed on the n-Si (111) substrates by solid state reaction of the as-deposited Co single-layer and Co/Ti bilayer with Si,respectively at different annealing phase.The C... Polycrystalline and epitaxial CoSi 2 films are formed on the n-Si (111) substrates by solid state reaction of the as-deposited Co single-layer and Co/Ti bilayer with Si,respectively at different annealing phase.The CoSi 2/Si Schottky contacts are measured with the current-voltage and capacitance-voltage (I-V/C-V) techniques within the range of temperature from 90K to room temperature.The measured I-V characteristics have been analyzed with a model based on the inhomogeneity in Schottky barrier height,i.e.,at high temperatures (≥~200K) or low temperatures but with a large bias,the I-V curves can be described by using the thermionic emission theory with a Gaussian distributed barrier height over the whole junction,while at low temperatures and with a small bias,the current is dominated by some small patches with low barrier height.It results in a plateau-like section in the low temperature I-V curves around 10 -7 A.At room temperature,the barrier height of polycrystalline CoSi 2/Si deduced from the I-V curve is about 0 57eV.For epitaxial CoSi 2,the barrier height depends on its final annealing temperature and increases from 0 54eV to 0 60eV with the annealing temperature increasing from 700℃ to 900℃. 展开更多
关键词 schottky barrier SILICIDE I-V/C-V INHOMOGENEITY
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A Simple Method of Surface Parameter Extraction for Gate Schottky Contact in 4H-SiC MESFETs
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作者 吕红亮 张义门 +2 位作者 张玉明 车勇 孙明 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第3期458-460,共3页
We investigate the effects of the surface states on the Schottky contacts in 4H-SiC MESFET. The Ti/Pt/Au gate metal contacts are deposited by electron beam evaporation and patterned by a lift-off process. Based on the... We investigate the effects of the surface states on the Schottky contacts in 4H-SiC MESFET. The Ti/Pt/Au gate metal contacts are deposited by electron beam evaporation and patterned by a lift-off process. Based on thermionic theory,a simple parameter extraction method is developed for determination of the surface states in metal/4H-SiC Schottky contacts. The interface state density and interface capacitance are calculated to be 4. 386 × 10^12 cm^-2 · eV^- 1 and 6. 394 × 10^-6 F/cm^2 ,which are consistent with the device's terminal characteristics. 展开更多
关键词 silicon carbide schottky contacts surface states device modeling
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