Inverse lithography technology(ILT)is one of the promising resolution enhancement techniques,as the advanced IC technology nodes still use the 193 nm light source.In ILT,optical proximity correction(OPC)is treated as ...Inverse lithography technology(ILT)is one of the promising resolution enhancement techniques,as the advanced IC technology nodes still use the 193 nm light source.In ILT,optical proximity correction(OPC)is treated as an inverse imaging problem to find the optimal solution using a set of mathematical approaches.Among all the algorithms for ILT,the level-set-based ILT(LSB-ILT)is a feasible choice with good production in practice.However,the manufacturability of the optimized mask is one of the critical issues in ILT;that is,the topology of its result is usually too complicated to manufacture.We put forward a new algorithm with high pattern fidelity called regularized LSB-ILT implemented in partially coherent illumination(PCI),which has the advantage of reducing mask complexity by suppressing the isolated irregular holes and protrusions in the edges generated in the optimization process.A new regularization term named the Laplacian term is also proposed in the regularized LSB-ILT optimization process to further reduce mask complexity in contrast with the total variation(TV)term.Experimental results show that the new algorithm with the Laplacian term can reduce the complexity of mask by over 40%compared with the ordinary LSB-ILT.展开更多
为了实现含有复杂背景和弱边界图像的快速准确分割,传统的水平集常采用重新初始化的方法,但是这种方法存在计算量大、分割不准确等问题。因此,结合显著性区域,该文提出一种基于边缘信息与区域局部信息结合的变水平集图像快速分割方法。...为了实现含有复杂背景和弱边界图像的快速准确分割,传统的水平集常采用重新初始化的方法,但是这种方法存在计算量大、分割不准确等问题。因此,结合显著性区域,该文提出一种基于边缘信息与区域局部信息结合的变水平集图像快速分割方法。首先用元胞自动机模型检测出图像的显著性区域,得到图像的初始化边界曲线。然后,采用改进的距离正规化水平集演化(Distance Regularized Level Set Evolution,DRLSE)模型把图像的局部信息结合到变分能量方程中,用改进的能量方程去指导曲线的演化。实验结果表明,与DRLSE模型相比,提出的算法平均消耗的时间只需要前者的2.76%,且具有较高的分割准确性。展开更多
文摘Inverse lithography technology(ILT)is one of the promising resolution enhancement techniques,as the advanced IC technology nodes still use the 193 nm light source.In ILT,optical proximity correction(OPC)is treated as an inverse imaging problem to find the optimal solution using a set of mathematical approaches.Among all the algorithms for ILT,the level-set-based ILT(LSB-ILT)is a feasible choice with good production in practice.However,the manufacturability of the optimized mask is one of the critical issues in ILT;that is,the topology of its result is usually too complicated to manufacture.We put forward a new algorithm with high pattern fidelity called regularized LSB-ILT implemented in partially coherent illumination(PCI),which has the advantage of reducing mask complexity by suppressing the isolated irregular holes and protrusions in the edges generated in the optimization process.A new regularization term named the Laplacian term is also proposed in the regularized LSB-ILT optimization process to further reduce mask complexity in contrast with the total variation(TV)term.Experimental results show that the new algorithm with the Laplacian term can reduce the complexity of mask by over 40%compared with the ordinary LSB-ILT.
文摘为了实现含有复杂背景和弱边界图像的快速准确分割,传统的水平集常采用重新初始化的方法,但是这种方法存在计算量大、分割不准确等问题。因此,结合显著性区域,该文提出一种基于边缘信息与区域局部信息结合的变水平集图像快速分割方法。首先用元胞自动机模型检测出图像的显著性区域,得到图像的初始化边界曲线。然后,采用改进的距离正规化水平集演化(Distance Regularized Level Set Evolution,DRLSE)模型把图像的局部信息结合到变分能量方程中,用改进的能量方程去指导曲线的演化。实验结果表明,与DRLSE模型相比,提出的算法平均消耗的时间只需要前者的2.76%,且具有较高的分割准确性。
