In this paper, a new pre-alignment approach based on Four-Quadrant-Photo-Detector （FQPD） for IC mask is presented. The voltage outputs from FQPDs are the functions of alignment mark＇s position offsets with respect ...In this paper, a new pre-alignment approach based on Four-Quadrant-Photo-Detector （FQPD） for IC mask is presented. The voltage outputs from FQPDs are the functions of alignment mark＇s position offsets with respect to FQPDs. The functions are obtained with least squares error （LSE）-based polynomial fitting after the normalization of experimental data. As the acquired functions are not monotonic about their variables, the alignment mark＇s position offset cannot be given by direct inverse operation on the obtained functions. However, the piecewise polynomial fitting gives the inverse function, with which the alignment mark＇s position offset can be predicted according to the voltage outputs of FQPDs. On the basis of prediction, a pre-alignment control strategy is proposed. The feasibility and robustness of the pre-alignment approach is shown by experiments. Furthermore, the results demonstrate that the maximum error of mask＇s position offset in the X- and Y- directions is less than 15μm after coarse pre-alignment. Keywords： Four-Quadrant-Photo-Detector （FQPD）, pre-alignment, IC mask, polynomial fitting展开更多
A modeling method of the support vector machine combined with matrix optics is considered; a complete new measurement model for double-four quadrant photoelectric detector is built. According to the analysis of the re...A modeling method of the support vector machine combined with matrix optics is considered; a complete new measurement model for double-four quadrant photoelectric detector is built. According to the analysis of the received light spot size and its motion with the changes of the defocusing amount of detector photosensitive surface and the detector position attitude in the optical path, a mathematic expression of photoelectrical conversion is given, which can be applicable to random setting position of the detector at any time. Based on least square support vector machine (LS SVM), the mapping relationship among the output signal linear characteristic parameters (zero neighborhood gradient and intercept), the defocusing amount of the detector and the installation position attitude angle is established. Thus, the multiple dimensional high accuracy measuring and adjusting control system can be left out, and adaptive measurement of the detector parameters can be realized. Compared with existed measurement model and method, the presented model has the advantages of more clear physical meaning, closer to work mechanism of detector, acquiring more complete sample data and wiping out the dead spots or bad spots in measurement. And the accuracy of displacement measurement is increased to 3?μm. At the same time, this measurement mode provides a technical shortcut for three-dimensional small angle measurement.展开更多
基金This work was supported by National High Technology Research and Development Program of PRC (No. 2002AA420040)National 973 Program of PRC (No. 2002CB312200).
文摘In this paper, a new pre-alignment approach based on Four-Quadrant-Photo-Detector （FQPD） for IC mask is presented. The voltage outputs from FQPDs are the functions of alignment mark＇s position offsets with respect to FQPDs. The functions are obtained with least squares error （LSE）-based polynomial fitting after the normalization of experimental data. As the acquired functions are not monotonic about their variables, the alignment mark＇s position offset cannot be given by direct inverse operation on the obtained functions. However, the piecewise polynomial fitting gives the inverse function, with which the alignment mark＇s position offset can be predicted according to the voltage outputs of FQPDs. On the basis of prediction, a pre-alignment control strategy is proposed. The feasibility and robustness of the pre-alignment approach is shown by experiments. Furthermore, the results demonstrate that the maximum error of mask＇s position offset in the X- and Y- directions is less than 15μm after coarse pre-alignment. Keywords： Four-Quadrant-Photo-Detector （FQPD）, pre-alignment, IC mask, polynomial fitting
文摘A modeling method of the support vector machine combined with matrix optics is considered; a complete new measurement model for double-four quadrant photoelectric detector is built. According to the analysis of the received light spot size and its motion with the changes of the defocusing amount of detector photosensitive surface and the detector position attitude in the optical path, a mathematic expression of photoelectrical conversion is given, which can be applicable to random setting position of the detector at any time. Based on least square support vector machine (LS SVM), the mapping relationship among the output signal linear characteristic parameters (zero neighborhood gradient and intercept), the defocusing amount of the detector and the installation position attitude angle is established. Thus, the multiple dimensional high accuracy measuring and adjusting control system can be left out, and adaptive measurement of the detector parameters can be realized. Compared with existed measurement model and method, the presented model has the advantages of more clear physical meaning, closer to work mechanism of detector, acquiring more complete sample data and wiping out the dead spots or bad spots in measurement. And the accuracy of displacement measurement is increased to 3?μm. At the same time, this measurement mode provides a technical shortcut for three-dimensional small angle measurement.
