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Effect of diode size and series resistance on barrier height and ideality factor in nearly ideal Au/n type-GaAs micro Schottky contact diodes 被引量:2
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作者 M. A. Yeganeh Sh. Rahmatallahpur +1 位作者 A. Nozad R. K. Mamedov 《Chinese Physics B》 SCIE EI CAS CSCD 2010年第10期477-484,共8页
Small high-quality Au/n type-GaAs Schottky barrier diodes (SBDs) with low reverse leakage current are produced using lithography. Their effective barrier heights (BHs) and ideality factors from current-voltage (... Small high-quality Au/n type-GaAs Schottky barrier diodes (SBDs) with low reverse leakage current are produced using lithography. Their effective barrier heights (BHs) and ideality factors from current-voltage (I-V) characteristics are measured by a Pico ampere meter and home-built I-V instrument. In spite of the identical preparation of the diodes there is a diode-to-diode variation in ideality factor and barrier height parameters. Measurement of topology of a surface of a thin metal film with atomic force microscope (AFM) shows that Au-n type-GaAS SD consists of a set of parallel-connected micro and nanocontacts diodes with sizes approximately in a range of 100-200 nm. Between barrier height and ideality factor there is an inversely proportional dependency. With the diameter of contact increasing from 5 μm up to 200 μm, the barrier height increases from 0.833 up to 0.933 eV and its ideality factor decreases from 1.11 down to 1.006. These dependencies show the reduction of the contribution of the peripheral current with the diameter of contact increasing. We find the effect of series resistance on barrier height and ideality factor. 展开更多
关键词 Schottky barrier diodes conducting probe-atomic force microscope barrier height andideality factor
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Barrier height and ideality factor dependency on identically produced small Au/p-Si Schottky barrier diodes
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作者 M.A.Yeganeh S.H.Rahmatollahpur 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2010年第7期16-21,共6页
Small high-quality Au/P-Si Schottky barrier diodes(SBDs) with an extremely low reverse leakage current using wet lithography were produced.Their effective barrier heights(BHs) and ideality factors from current-vol... Small high-quality Au/P-Si Schottky barrier diodes(SBDs) with an extremely low reverse leakage current using wet lithography were produced.Their effective barrier heights(BHs) and ideality factors from current-voltage (Ⅰ-Ⅴ) characteristics were measured by a conducting probe atomic force microscope(C-AFM).In spite of the identical preparation of the diodes there was a diode-to-diode variation in ideality factor and barrier height parameters.By extrapolating the plots the built in potential of the Au /p-Si contact was obtained as V_(bi)=0.5425 V and the barrier height valueΦ_(b(c-V)) was calculated to beΦ_(B(C-V))=0.7145 V for Au/p-Si.It is found that for the diodes with diameters smaller than 100μm,the diode barrier height and ideality factor dependency to their diameters and correlation between the diode barrier height and its ideality factor are nonlinear,where similar to the earlier reported different metal semiconductor diodes in the literature,these parameters for the here manufactured diodes with diameters more than 100μm are also linear.Based on the very obvious sub-nanometer C-AFM produced pictures the scientific evidence behind this controversy is also explained. 展开更多
关键词 Schottky barrier diodes conducting probe-atomic force microscope barrier height and ideality factor
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