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Ti-containing hydrogenated carbon films fabricated by high-power plasma magnetron sputtering 被引量:5
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作者 YANG Peng SUNG Chia-chi +2 位作者 FUH Yiin-Kuen CHU Chun-lin LO Chih-hung 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2012年第6期1381-1386,共6页
To improve the characteristics of a diamond-like carbon (DLC) film, Ti-containing amorphous hydrogenated carbon thin films were deposited on sus304 stainless steel substrates by high-power plasma-sputtering with tit... To improve the characteristics of a diamond-like carbon (DLC) film, Ti-containing amorphous hydrogenated carbon thin films were deposited on sus304 stainless steel substrates by high-power plasma-sputtering with titanium metal as the solid plasma source in a mixed ArC2H2 atmosphere. The films were fabricated to obtain a multilayered structure of Ti/TiC/DLC gradient for improving adhesion and reducing residual stress. The effects of substrate bias and target-substrate distance on the films' properties were studied by glow discharge spectroscope, X-ray diffractometer, Raman spectroscope, nanoindenter, and a pin-on-disk tribometer. The results indicate that the films possess superior adhesive strength and toughness. 展开更多
关键词 high-power plasma-sputtering Me-DLC diamond-like carbon
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