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Defect Detection Algorithm of Patterned Fabrics Based on Convolutional Neural Network 被引量:1
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作者 XU Yang FEI Libin +1 位作者 YU Zhiqi SHENG Xiaowei 《Journal of Donghua University(English Edition)》 CAS 2021年第1期36-42,共7页
The background pattern of patterned fabrics is complex,which has a great interference in the extraction of defect features.Traditional machine vision algorithms rely on artificially designed features,which are greatly... The background pattern of patterned fabrics is complex,which has a great interference in the extraction of defect features.Traditional machine vision algorithms rely on artificially designed features,which are greatly affected by background patterns and are difficult to effectively extract flaw features.Therefore,a convolutional neural network(CNN)with automatic feature extraction is proposed.On the basis of the two-stage detection model Faster R-CNN,Resnet-50 is used as the backbone network,and the problem of flaws with extreme aspect ratio is solved by improving the initialization algorithm of the prior frame aspect ratio,and the improved multi-scale model is designed to improve detection of small defects.The cascade R-CNN is introduced to improve the accuracy of defect detection,and the online hard example mining(OHEM)algorithm is used to strengthen the learning of hard samples to reduce the interference of complex backgrounds on the defect detection of patterned fabrics,and construct the focal loss as a loss function to reduce the impact of sample imbalance.In order to verify the effectiveness of the improved algorithm,a defect detection comparison experiment was set up.The experimental results show that the accuracy of the defect detection algorithm of patterned fabrics in this paper can reach 95.7%,and it can accurately locate the defect location and meet the actual needs of the factory. 展开更多
关键词 patterned fabrics defect detection convolutional neural network(CNN) multi-scale model cascade network
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3D patterned fabric-based wearable micro-supercapacitor operating at high voltage by electrostatic actuation
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作者 Xiaoping Lin Shangbo Li +6 位作者 Xiaoyan Li Xuming Huang Luhua Jia Wei Zhang Zaisheng Cai Gunel Imanova Sridhar Komarneni 《npj Flexible Electronics》 2025年第1期1190-1202,共13页
To address the energy storage needs of wearable electronics,this study developed highperformance,flexible micro-supercapacitors(MSCs)using 2D and 3D patterned fabric-based microelectrodes.The 2D electrodes were create... To address the energy storage needs of wearable electronics,this study developed highperformance,flexible micro-supercapacitors(MSCs)using 2D and 3D patterned fabric-based microelectrodes.The 2D electrodes were created via a screen-printing method with an omnidirectional pre-stretching strategy,while 3D array-structured electrodes were formed through electrostatic actuation.Nano-MnO_(2)and Na0.77MnO_(2)were deposited to enhance pseudo-capacitive storage and widen the electrochemical window.The C-C/MnO_(2)-based MSCs exhibited a 21%pseudo-capacitance ratio,achieving an area-specific capacitance of 118.2 mF cm^(-2)at 5 mV s^(-1)and an energy density of 39.25 mWh cm^(-2)at 0.21 mW cm^(-2).These MSCs maintained 95.05%,92.04%,and 89.74%of their capacitance under stretched,twisted,and folded conditions,respectively,and showed stable performance across temperatures from^(-2)0℃to 60℃.Additionally,C-C/Na0.77MnO_(2)-based MSCs extended the electrochemical window to 1.6 V and retained 100.2%capacitance after 6500 cycles.This work offers innovative strategies for advancing portable and wearable electronic devices. 展开更多
关键词 widen electrochemical windowthe d electrodes D patterned fabric wearable electronicsthis electrostatic actuation energy storage electrostatic actuationnano mno micro supercapacitors
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Fabrication of 4-Inch Nano Patterned Wafer with High Uniformity by Laser Interference Lithography 被引量:3
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作者 Gen Yue Yu Lei +2 位作者 Jun-Hui Die Hai-Qiang Jia Hong Chen 《Chinese Physics Letters》 SCIE CAS CSCD 2018年第5期56-59,共4页
We report the fabrication of 4-inch nano patterned wafer by two-beam laser interference lithography and analyze the uniformity in detail. The profile of the dots array with a period of 800 nm divided into five regions... We report the fabrication of 4-inch nano patterned wafer by two-beam laser interference lithography and analyze the uniformity in detail. The profile of the dots array with a period of 800 nm divided into five regions is characterized by a scanning electron microscope. The average size in each region ranges from 270 nm to 320 nm,and the deviation is almost 4%, which is approaching the applicable value of 3% in the industrial process. We simulate the two-beam laser interference lithography system with MATLAB software and then calculate the distribution of light intensity around the 4 inch area. The experimental data fit very well with the calculated results. Analysis of the experimental data and calculated data indicates that laser beam quality and space filter play important roles in achieving a periodical nanoscale pattern with high uniformity and large area. There is the potential to obtain more practical applications. 展开更多
关键词 exp fabrication of 4-Inch Nano patterned Wafer with High Uniformity by Laser Interference Lithography
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Fabrication of micro-nano patterned materials mimicking the topological structure of extracellular matrix for biomedical applications
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作者 Yifeng Nie Dong Han Xiang Li 《Nano Research》 SCIE EI CSCD 2024年第5期4244-4258,共15页
With the advent of tissue engineering and biomedicine,the creation of extracellular matrix(ECM)biomaterials for in vitro applications has become a prominent and promising strategy.These ECM materials provide physical,... With the advent of tissue engineering and biomedicine,the creation of extracellular matrix(ECM)biomaterials for in vitro applications has become a prominent and promising strategy.These ECM materials provide physical,biochemical,and mechanical properties that guide cellular behaviors,such as proliferation,differentiation,migration,and apoptosis.Because micro-and nano-patterned materials have a unique surface topology and low energy replication process that directly affect cellular biological behaviors at the interface,the fabrication of micro-nano pattern biomaterials and the regulation of surface physical and chemical properties are of great significance in the fields of cell regulation,tissue engineering,and regenerative medicine.Herein,we provide a comprehensive review of the progress in the fabrication and application of patterned materials based on the coupling of mechanical action at the micro-and nano-meter scale,including photolithography,micro-contact printing,electron beam lithography,electrospinning,and 3D printing technology.Furthermore,a summary of the fabrication process,underlying principles,as well as the advantages and disadvantages of various technologies are reviewed.We also discuss the influence of material properties on the fabrication of micro-and nano-patterns. 展开更多
关键词 micro/nano hybrid materials patterning fabrication techniques extracellular matrix substrate-cell interaction biomedical engineering
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InAlGaN superluminescent diodes fabricated on patterned substrates: an alternative semiconductor broadband emitter
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作者 ANNA KAFAR SZYMON STANCZYK +6 位作者 MARCIN SARZYNSKI SZYMON GRZANKA JAKUB GOSS IRINA MAKAROWA ANNA NOWAKOWSKA-SIWINSKA TADEK SUSKI PIOTR PERLIN 《Photonics Research》 SCIE EI 2017年第2期30-34,共5页
We demonstrate InGaN violet light-emitting superluminescent diodes with large spectral width suitable for applications in optical coherence spectroscopy.This was achieved using the concept of nonlinear indium content ... We demonstrate InGaN violet light-emitting superluminescent diodes with large spectral width suitable for applications in optical coherence spectroscopy.This was achieved using the concept of nonlinear indium content profile along the superluminescent diode waveguide.A specially designed 3D substrate surface shape leads to a step-like indium content profile,with the indium concentration in the InGaN/GaN quantum wells ranging approximately between 6% and 10%.Thanks to this approach,we were able to increase the width of the spectrum in processed devices from 2.6 nm(reference diode)to 15.5 nm. 展开更多
关键词 INGAN InAlGaN superluminescent diodes fabricated on patterned substrates an alternative semiconductor broadband emitter
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Recent progress in the patterning of perovskite films for photodetector applications
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作者 Chuantao Hu Bo Li +3 位作者 Xiaoyue Wang Chi Liu Dongming Sun Huiming Cheng 《Light: Science & Applications》 2025年第11期3394-3440,共47页
Photodetectors,as the core devices for optical signal conversion,need to balance high efficiency,fast response,and low-cost fabrication.Perovskite,with its advantages of high carrier mobility and tunable band gaps,hav... Photodetectors,as the core devices for optical signal conversion,need to balance high efficiency,fast response,and low-cost fabrication.Perovskite,with its advantages of high carrier mobility and tunable band gaps,have become an ideal alternative to silicon-based materials.This paper systematically reviews the progress in the patterned fabrication techniques and device construction of perovskite photodetectors across various dimensional material systems.First,it introduces five mainstream patterned fabrication methods for perovskites:template-confined growth,inkjet printing,vapor deposition,seed-induced growth,and conventional photolithography.Then,the latest research on image sensors based on perovskite materials in different dimensions is discussed.Following this,the paper highlights two promising application directions with great development potential:flexible wearable devices and electrochemical vision systems.Finally,the challenges and potential solutions for the future development of patterned perovskite photodetectors are presented to guide the development of high-performance perovskite optoelectronic devices. 展开更多
关键词 optical signal conversionneed carrier mobility patterned fabrication techniques perovskite films patterned fabrication optical signal conversion patterned fabricatio PHOTODETECTORS
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Global alignment reference strategy for laser interference lithography pattern arrays
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作者 Xiang Gao Jingwen Li +1 位作者 Zijian Zhong Xinghui Li 《Microsystems & Nanoengineering》 2025年第2期277-287,共11页
Large-area gratings play a crucial role in various engineering fields.However,traditional interference lithography is limited by the size of optical component apertures,making large-area fabrication a challenging task... Large-area gratings play a crucial role in various engineering fields.However,traditional interference lithography is limited by the size of optical component apertures,making large-area fabrication a challenging task.Here,a method for fabricating laser interference lithography pattern arrays with a global alignment reference strategy is proposed.This approach enables alignment of each area of the laser interference lithography pattern arrays,including phase,period,and tilt angle.Two reference gratings are utilized:one is detached from the substrate,while the other remains fixed to it.To achieve global alignment,the exposure area is adjusted by alternating between moving the beam and the substrate.In our experiment,a 3×3 regions grating array was fabricated,and the−1st-order diffraction wavefront measured by the Fizeau interferometer exhibited good continuity.This technique enables effective and efficient alignment with high accuracy across any region in an interference lithography pattern array on large substrates.It can also serve as a common technique for fabricating various types of periodic structures by rotating the substrate. 展开更多
关键词 reference gratings interference lithography global alignment reference strategy laser interference lithography pattern fabricating laser interference lithography pattern arrays reference grating optical component aperturesmaking laser interference lithography
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