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Ga intercalation in van der Waals layers for advancing p-type Bi_(2)Te_(3)-based thermoelectrics 被引量:1
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作者 陈艺源 石青 +5 位作者 钟艳 李瑞恒 林黎蔚 任丁 刘波 昂然 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第6期510-516,共7页
Tetradymite-structured chalcogenides,such as Bi_(2)Te_(3) and Sb_(2)Te_(3),are quasi-two-dimensional(2D)layered compounds,which are significant thermoelectric materials applied near room temperature.The intercalation ... Tetradymite-structured chalcogenides,such as Bi_(2)Te_(3) and Sb_(2)Te_(3),are quasi-two-dimensional(2D)layered compounds,which are significant thermoelectric materials applied near room temperature.The intercalation of vip species in van der Waals(vdW)gap implemented for tunning properties has attracted much attention in recent years.We attempt to insert Ga atoms in the vdW gap between the Te layers in p-type Bi_(0.3)Sb_(1.7)Te_(3)(BST)for further improving thermoelectrics.The vdW-related defects(including extrinsic interstitial and intrinsic defects)induced by Ga intercalation can not only modulate the carrier concentration but also enhance the texture,thereby yielding excellent electrical properties,which are reflected in the power factor PF~4.43 mW·m^(-1)·K^(-2).Furthermore,the intercalation of Ga produces multi-scale lattice imperfections such as point defects,Te precipitations,and nanopores,realizing the low lattice thermal conductivity in BST-Ga samples.Ultimately,a peak zT~1.1 at 373 K is achieved in the BST-1%Ga sample and greatly improved by~22%compared to the pristine BST.The weak bonding of vdW interlayer interaction can boost the synergistic effect for advancing BST-based or other layered thermoelectrics. 展开更多
关键词 THERMOELECTRICITY p-type(bi Sb)_2Te_(3) van der Waals gap defects texture alignment
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生长速度对N型和P型Bi-Te热电材料性能的影响
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作者 顾永明 郭燕明 《上海大学学报(自然科学版)》 CAS CSCD 1999年第4期311-316,共6页
本文报导了采用移动加热器法生长 N 型和 P型 Bi Te 热电材料时不同生长速度对其性能影响的研究结果.结果表明较低的生长速度导致 N 型和 P型合金较完整的晶体结构和较高的优值系数.然而生长速度对各自的热电参数的影响是... 本文报导了采用移动加热器法生长 N 型和 P型 Bi Te 热电材料时不同生长速度对其性能影响的研究结果.结果表明较低的生长速度导致 N 型和 P型合金较完整的晶体结构和较高的优值系数.然而生长速度对各自的热电参数的影响是不同的.对 N 型合金来说,慢的生长速度导致塞贝克系数增大,热导率和电阻率减小.对 P型合金来说,塞贝克系数和热导率(较小程度上)随生长速度的变化类似 N 型合金的变化,但电阻率随生长速度减小而增大,这种现象与 P型合金中富 Te 的第二相存在有关.在研究中也发现,当生长速度较慢且添加的过量 Te 较少时,在整个 展开更多
关键词 生长速度 N型 P型 热电材料 晶体结构 铋碲合金
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Structure and Thermoelectric Properties of Nanostructured (Bi, Sb)<sub>2</sub>Te<sub>3</sub>(Review)
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作者 Igor A. Drabkin Vladimir V. Karataev +3 位作者 Vladimir B. Osvenski Aleksandr I. Sorokin Gennady I. Pivovarov Natalie Yu. Tabachkova 《Advances in Materials Physics and Chemistry》 2013年第2期119-132,共14页
The investigation of the structure and thermoelectric properties of nanostructured solid solutions (Bi, Sb)2Te3 p-type has been carried out. The samples were obtained by grinding of original compositions in a planetar... The investigation of the structure and thermoelectric properties of nanostructured solid solutions (Bi, Sb)2Te3 p-type has been carried out. The samples were obtained by grinding of original compositions in a planetary ball mill and by spark plasma sintering (SPS). Initial powder has an average particle size of 10 - 12 nm according to transmission electron microscopy, and the size of the coherent scattering region (CSR) obtained by X-ray line broadening. During sintering at Ts = 250°C - 400°C, the grain size and CSR increased, which was associated with the processes of recrystallization. The maximum of size distribution of CSR shifts to larger sizes when Ts increases so that no broadening of X-ray lines at Ts = 400°C can take place. At higher Ts, the emergence of new nanograins is observed. The formation of nanograins is conditioned by reducing of quantity of the intrinsic point defects produced in the grinding of the source materials. The study of the electrical conductivity and the Hall effect in a single crystal allows to estimate the mean free path of the holes-L in the single crystal Bi0.5Sb1.5Te3 which at room temperature is 2 - 5 nm (it is much smaller than the dimensions of CSR in the samples). The method for evaluation of L in polycrystalline samples is proposed. At room temperature, L is close to the mean free path in single crystals. Scattering parameter holes in SPS samples obtained from the temperature dependence of the Seebeck coefficient are within the measurement error equal to the parameter of the scattering of holes in a single crystal. The figure of merit ZT of SPS samples as a function of composition and sintering temperature has been investigated. Maximum ZT, equal to 1.05 at room temperature, is obtained for the composition Bi0.4Sb1.6Te3 at Ts = 500°C and a pressure of 50 MPa. The causes of an apparent increase in thermoelectric efficiency are discussed. 展开更多
关键词 Solid Solutions (bi Sb)2Te3 p-type Nanostructure Spark Plasma Sintering CONDUCTIVITY Hall Effect Hole Free Path SEEBECK Coefficient Thermal CONDUCTIVITY Figure of Merit
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Atomic-defect-suppressed pristine p-type Bi_(0.3)Sb_(1.7)Te_(3)as robust high-performance thermoelectrics for power generation and cooling
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作者 Qi Zhao Zhen Fan +8 位作者 Yi Wang Qiulin Liu Xuejuan Dong Xiaowei Wu Zhicheng Shan Hangtian Zhu Zhiliang Li Shufang Wang Huaizhou Zhao 《Journal of Materiomics》 2025年第6期226-234,共9页
High-strength high-performance p-type(Bi,Sb)_(2)Te_(3)are of pivotal importance for near-room-temperature thermoelectric conversions,the reliable synthesis and fabrication has been viewed of imperative priority.It is ... High-strength high-performance p-type(Bi,Sb)_(2)Te_(3)are of pivotal importance for near-room-temperature thermoelectric conversions,the reliable synthesis and fabrication has been viewed of imperative priority.It is known that the energy-favorable formation of anti-site Sb_(Te)’and vacancy v_(Sb)'''acceptor defects from high-temperature syntheses results in additional charge carriers and scattering centers for electrical and phonon transport.However,how p-type(Bi,Sb)_(2)Te_(3)with minimal lattice defects function remains to be scrutinized.Herein,we present the synergistic enhancements of mechanical robustness and thermoelectric property in crystallographic-defect-suppressed pristine(Bi,Sb)_(2)TeBi_(2)Te_(3)through a simple mechanical alloying combined with spark-plasma-sintering(SPS)process.The Sb_(Te)’and v_(Sb)'''acceptor defects were efficiently restrained,contributing to markedly increased charge carrier mobilities.A slightly enlarged band gap of 0.24 eV underpinned enhanced thermoelectric performance for pristine Bi_(0.3)Sb_(1.7)Te_(3)over a wide temperature range,delivering high zT300 K of 1.16 and zT_(ave)of 1.21 over 300-473 K.Interestingly,the confined in-situ grain coarsening during SPS with uniform dispersive nanopores readily endowed an ultra-high compressive strength of 206 MPa,surpassing that of reported(Bi,Sb)_(2)Te_(3)so far.A 7-pair module(coupled with n-Bi_(2)Te_(3))was fabricated,demonstrating a competitiveΔT over 70 K at T_(hot)=300 K.Furthermore,a power-generation module coupled with n-Mg_(3)SbBi registered a cutting-edge thermoelectric conversion efficiency of 9.5%at a temperature gradient of 250 K.The strategy eliminates the need of complex processing nor extrinsic doping for pristine(Bi,Sb)_(2)Te_(3),demonstrating great potentials in thermoelectric power generation and cooling applications. 展开更多
关键词 p-type(bi Sb)_(2)Te_(3) Thermoelectric Mechanial strength Defect suppression Band gap modulation
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成核剂单羟基双对正丁基苯甲酸铝的合成研究
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作者 王冬美 陈娆 +1 位作者 王若男 肇薇 《塑料助剂》 2017年第3期23-26,38,共5页
采用置换/羟基化反应制得聚烯烃增强型成核剂单羟基双对正丁基苯甲酸铝。成核剂合成的最佳工艺条件为:对正丁基苯甲酸与氯化铝摩尔比为2∶1~2.5∶1,反应温度为55±5℃,反应时间不低于1.5 h,搅拌转速不低于300 r/min,产品最高收率为9... 采用置换/羟基化反应制得聚烯烃增强型成核剂单羟基双对正丁基苯甲酸铝。成核剂合成的最佳工艺条件为:对正丁基苯甲酸与氯化铝摩尔比为2∶1~2.5∶1,反应温度为55±5℃,反应时间不低于1.5 h,搅拌转速不低于300 r/min,产品最高收率为97.8%。合成的成核剂经过洗涤、干燥、粉碎后,外观为雪白色粉末,经差热分析,分解温度在250℃左右。 展开更多
关键词 增强型 成核剂 聚烯烃 单羟基双对正丁基苯甲酸铝 合成
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