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Physical analysis of normally-off ALD Al_(2)O_(3)/GaN MOSFET with different substrates using self-terminating thermal oxidation-assisted wet etching technique
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作者 Cheng-Yu Huang Jin-Yan Wang +8 位作者 Bin Zhang Zhen Fu Fang Liu Mao-Jun Wang Meng-Jun Li Xin Wang Chen Wang Jia-Yin He Yan-Dong He 《Chinese Physics B》 SCIE EI CAS CSCD 2022年第9期511-518,共8页
Based on the self-terminating thermal oxidation-assisted wet etching technique,two kinds of enhancement mode Al_(2)O_(3)/GaN MOSFETs(metal-oxide-semiconductor field-effect transistors)separately with sapphire substrat... Based on the self-terminating thermal oxidation-assisted wet etching technique,two kinds of enhancement mode Al_(2)O_(3)/GaN MOSFETs(metal-oxide-semiconductor field-effect transistors)separately with sapphire substrate and Si sub-strate are prepared.It is found that the performance of sapphire substrate device is better than that of silicon substrate.Comparing these two devices,the maximum drain current of sapphire substrate device(401 mA/mm)is 1.76 times that of silicon substrate device(228 mA/mm),and the field-effect mobility(μ_(FEmax))of sapphire substrate device(176 cm^(2)/V·s)is 1.83 times that of silicon substrate device(96 cm^(2)/V·s).The conductive resistance of silicon substrate device is 21.2Ω-mm,while that of sapphire substrate device is only 15.2Ω·mm,which is 61%that of silicon substrate device.The significant difference in performance between sapphire substrate and Si substrate is related to the differences in interface and border trap near Al_(2)O_(3)/GaN interface.Experimental studies show that(i)interface/border trap density in the sapphire substrate device is one order of magnitude lower than in the Si substrate device,(ii)Both the border traps in Al_(2)O_(3) dielectric near Al_(2)O_(3)/GaN and the interface traps in Al_(2)O_(3)/GaN interface have a significantly effect on device channel mobility,and(iii)the properties of gallium nitride materials on different substrates are different due to wet etching.The research results in this work provide a reference for further optimizing the performances of silicon substrate devices. 展开更多
关键词 atomic layer deposition Al_(2)O_(3)/GaN MOSFET NORMALLY-OFF interface/border traps thermal oxidation-assisted wet etching
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Nano-hollow carbon-supported high-entropy alloy catalysts for energy-saving seawater electrolysis
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作者 Quan Zhang Zhiwei Wang +6 位作者 Lehua Wang Zongchen Wei Longchao Zhuo Yifan Liu Imran Shakir Guangzhi Hu Xijun Liu 《Nano Research Energy》 2025年第4期85-97,共13页
Electrolyzing seawater to produce hydrogen can not only address the issue of freshwater scarcity but also provide an abundant raw material for hydrogen production.However,seawater electrolysis for hydrogen production ... Electrolyzing seawater to produce hydrogen can not only address the issue of freshwater scarcity but also provide an abundant raw material for hydrogen production.However,seawater electrolysis for hydrogen production still faces numerous risks and challenges at present.This study focuses on a systematic investigation of FeNiCo-based highentropy alloy(HEA)nanocatalysts supported on carbon skeletons.By precisely regulating the morphological structure of the carbon skeleton,a carbon support with a large specific surface area and abundant active sites can be obtained.Simultaneously,the elemental composition of the HEA nanoparticles is adjusted to optimize its seawater electrolysis performance.An energy-saving strategy of coupling the anode sulfur oxidation reaction(SOR)with the cathode hydrogen evolution reaction(HER)is employed to assist seawater electrolysis.In alkaline seawater,at a current density of 10 mA·cm^(−2),the overpotential of the HER is only 22 mV,and the overpotential of the oxygen evolution reaction(OER)is 264 mV.It also exhibits excellent performance in acidic seawater.In a two-electrode seawater electrolysis system,an applied voltage of 1.55 V is required to reach a current density of 10 mA·cm^(−2).More importantly,when using SOR to assist alkaline seawater electrolysis,the applied voltage is successfully reduced to 0.82 V. 展开更多
关键词 high-entropy alloys hydrogen production sulfion oxidation-assisted electrolysis seawater splitting
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