Surface plasmonic polaritons(SPPs)break Abbe's diffraction limit in the near field and provide a promising solution for high-resolution nanolithography without reducing illuminating wavelength.However,the resoluti...Surface plasmonic polaritons(SPPs)break Abbe's diffraction limit in the near field and provide a promising solution for high-resolution nanolithography without reducing illuminating wavelength.However,the resolution of the normal plasmonic lithography method based on ultraviolet exposure of a photoresist heavily relies on the size of the elaborate nanostructures,which usually require precise nanofabrication.Meanwhile,a high-cost pulsed laser is required as the light source to further reduce the lithography linewidth.Here,we establish a highresolution and low-cost scanning probe nanolithography system based on the infrared surface plasmons.An easy-fabrication probe is designed by tailoring four concentric annular slits with a moderate width of 200 nm,which couples the incident radially polarized beam into SPPs,resulting in an ultra-strong spot at the tip apex.Such superfocusing mode is demonstrated to apply to the thermal field through the optical-thermal effect so as to cause the heat accumulation with a more restricted heating area,which is utilized for the thermal probe nanolithography.Experimental results indicate that the subwavelength feature with a linewidth down to 13 nm is realized using an inexpensive 1064 nm wavelength continuous-wave laser.Our scheme shows great potential in fabrication of planar optical elements with small size and high flexibility,and can also find extensive applications in areas such as single-molecule spectra,biological detection,and optical microscopy.展开更多
基金National Key Research&Development Program of China(2023YFB3811400)Young Scientists Fund of National Natural Science Foundation of China(52303368)Financial Program of BJAST(25CE-YS-05,25CB011-03)。
文摘Surface plasmonic polaritons(SPPs)break Abbe's diffraction limit in the near field and provide a promising solution for high-resolution nanolithography without reducing illuminating wavelength.However,the resolution of the normal plasmonic lithography method based on ultraviolet exposure of a photoresist heavily relies on the size of the elaborate nanostructures,which usually require precise nanofabrication.Meanwhile,a high-cost pulsed laser is required as the light source to further reduce the lithography linewidth.Here,we establish a highresolution and low-cost scanning probe nanolithography system based on the infrared surface plasmons.An easy-fabrication probe is designed by tailoring four concentric annular slits with a moderate width of 200 nm,which couples the incident radially polarized beam into SPPs,resulting in an ultra-strong spot at the tip apex.Such superfocusing mode is demonstrated to apply to the thermal field through the optical-thermal effect so as to cause the heat accumulation with a more restricted heating area,which is utilized for the thermal probe nanolithography.Experimental results indicate that the subwavelength feature with a linewidth down to 13 nm is realized using an inexpensive 1064 nm wavelength continuous-wave laser.Our scheme shows great potential in fabrication of planar optical elements with small size and high flexibility,and can also find extensive applications in areas such as single-molecule spectra,biological detection,and optical microscopy.
