The dependence of interface structure and mechanical properties on the modulation layer thickness of VN/TiN−Ni nano-multilayered films deposited on Si substrates using a reactive magnetron sputtering technique was sys...The dependence of interface structure and mechanical properties on the modulation layer thickness of VN/TiN−Ni nano-multilayered films deposited on Si substrates using a reactive magnetron sputtering technique was systematically investigated. The films were characterized using X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy, transmission electron microscopy, and nanoindentation. The results show that the TiN−Ni layer grows epitaxially on the VN layer, forming a coherent interface between the two sublayers. When the deposition time ratio of the two sublayers (TTiN−Ni꞉TVN) is 10꞉12, the films exhibit remarkable mechanical properties, with hardness, elastic modulus, and fracture toughness values of 25.9 GPa, 317 GPa, and 1.88 MPa·m^(1/2), respectively. Meanwhile, fracture toughness is improved by approximately 50% compared to the VN monolithic film. This enhancement is attributed to the coherent interface between the sublayers and the phase separation in the TiN−Ni layer.展开更多
基金financially supported by the National Natural Science Foundation of China(No.51971148)the Key Project Foundation of Hanjiang Normal University,China(No.XJ2024A09)+1 种基金the Excellent Young and Middle-aged Science and Technology Innovation Team Project in Higher Education Institutions of Hubei Province,China(No.T2020024)the Shanghai Engineering Research Center of High-Performance Medical Device Materials,China(No.20DZ2255500)。
文摘The dependence of interface structure and mechanical properties on the modulation layer thickness of VN/TiN−Ni nano-multilayered films deposited on Si substrates using a reactive magnetron sputtering technique was systematically investigated. The films were characterized using X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy, transmission electron microscopy, and nanoindentation. The results show that the TiN−Ni layer grows epitaxially on the VN layer, forming a coherent interface between the two sublayers. When the deposition time ratio of the two sublayers (TTiN−Ni꞉TVN) is 10꞉12, the films exhibit remarkable mechanical properties, with hardness, elastic modulus, and fracture toughness values of 25.9 GPa, 317 GPa, and 1.88 MPa·m^(1/2), respectively. Meanwhile, fracture toughness is improved by approximately 50% compared to the VN monolithic film. This enhancement is attributed to the coherent interface between the sublayers and the phase separation in the TiN−Ni layer.
