High-pressure research has emerged as a pivotal approach for advancing our understanding and development of optoelectronic materials,which are vital for a wide range of applications,including photovoltaics,light-emitt...High-pressure research has emerged as a pivotal approach for advancing our understanding and development of optoelectronic materials,which are vital for a wide range of applications,including photovoltaics,light-emitting devices,and photodetectors.This review highlights various in situ characterization methods employed in high-pressure research to investigate the optical,electronic,and structural properties of optoelectronic materials.We explore the advances that have been made in techniques such as X-ray diffraction,absorption spectroscopy,nonlinear optics,photoluminescence spectroscopy,Raman spectroscopy,and photoresponse measurement,emphasizing how these methods have enhanced the elucidation of structural transitions,bandgap modulation,performance optimization,and carrier dynamics engineering.These insights underscore the pivotal role of high-pressure techniques in optimizing and tailoring optoelectronic materials for future applications.展开更多
基金supported by the National Nature Science Foundation of China(NSFC)(Grant Nos.22275004,62274040,and 62304046)the Shanghai Science and Technology Committee(Grant No.22JC1410300)+2 种基金the Shanghai Key Laboratory of Novel Extreme Condition Materials(Grant No.22dz2260800)the National Key Research and Development Program of China(Grant No.2022YFE0137400)the Shanghai Science and Technology Innovationaction Plan(Grant No.24DZ3001200).
文摘High-pressure research has emerged as a pivotal approach for advancing our understanding and development of optoelectronic materials,which are vital for a wide range of applications,including photovoltaics,light-emitting devices,and photodetectors.This review highlights various in situ characterization methods employed in high-pressure research to investigate the optical,electronic,and structural properties of optoelectronic materials.We explore the advances that have been made in techniques such as X-ray diffraction,absorption spectroscopy,nonlinear optics,photoluminescence spectroscopy,Raman spectroscopy,and photoresponse measurement,emphasizing how these methods have enhanced the elucidation of structural transitions,bandgap modulation,performance optimization,and carrier dynamics engineering.These insights underscore the pivotal role of high-pressure techniques in optimizing and tailoring optoelectronic materials for future applications.
