With the continuous decrease in the critical dimensions of integrated circuits, mask optimization has becomethe main challenge in VLSI design. In recent years, thriving machine learning has been gradually introduced i...With the continuous decrease in the critical dimensions of integrated circuits, mask optimization has becomethe main challenge in VLSI design. In recent years, thriving machine learning has been gradually introduced in the field ofoptical proximity correction (OPC). Currently, advanced learning-based frameworks have been limited by low mask printability or large computational overhead. To address these limitations, this paper proposes a learning-based frameworknamed SegNet-OPC, which can generate optimized masks from the target layout at shorter training and turnaround timewith higher mask printability. The proposed framework consists of a backbone network and loss terms suitable for maskoptimization tasks, followed by a fine-tuning network. The framework yields remarkable improvements over conventionalmethods, delivering significantly faster turnaround time and superior mask printability and manufacturability. With just1.25 hours of training, the framework achieves comparable mask complexity while surpassing the state-of-the-art methods,achieving a minimum 3% enhancement in mask printability and an impressive 16.7% improvement in mask manufacturability.展开更多
基金supported by the Special Fund for Research on National Major Research Instruments of China under Grant No.62027815the National Natural Science Foundation of China under Grant Nos.61834006,62274052,and 61404001.
文摘With the continuous decrease in the critical dimensions of integrated circuits, mask optimization has becomethe main challenge in VLSI design. In recent years, thriving machine learning has been gradually introduced in the field ofoptical proximity correction (OPC). Currently, advanced learning-based frameworks have been limited by low mask printability or large computational overhead. To address these limitations, this paper proposes a learning-based frameworknamed SegNet-OPC, which can generate optimized masks from the target layout at shorter training and turnaround timewith higher mask printability. The proposed framework consists of a backbone network and loss terms suitable for maskoptimization tasks, followed by a fine-tuning network. The framework yields remarkable improvements over conventionalmethods, delivering significantly faster turnaround time and superior mask printability and manufacturability. With just1.25 hours of training, the framework achieves comparable mask complexity while surpassing the state-of-the-art methods,achieving a minimum 3% enhancement in mask printability and an impressive 16.7% improvement in mask manufacturability.
