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不同技术制备DLC膜的激光损伤特性研究 被引量:9
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作者 徐均琪 苏俊宏 +1 位作者 谢松林 梁海锋 《真空科学与技术学报》 EI CAS CSCD 北大核心 2007年第3期181-184,共4页
随着高能量大功率激光器的发展和激光元件的广泛应用,用于红外窗口表面增透保护的类金刚石薄膜(DLC)的抗激光损伤特性成为评价薄膜质量优劣的一个重要指标。然而,不同的制备方法和技术沉积的DLC薄膜具有各异的微观结构,从而具有不同的... 随着高能量大功率激光器的发展和激光元件的广泛应用,用于红外窗口表面增透保护的类金刚石薄膜(DLC)的抗激光损伤特性成为评价薄膜质量优劣的一个重要指标。然而,不同的制备方法和技术沉积的DLC薄膜具有各异的微观结构,从而具有不同的抗激光损伤特性。本文采用脉冲真空电弧(PVAD)和非平衡磁控溅射(UBMS)技术沉积了DLC膜,对两种DLC膜抗激光损伤特性进行了研究,测试结果表明,两种技术沉积的DLC薄膜激光损伤阈值分别0.6 J/cm2和0.3 J/cm2,PVAD技术比UBMS技术沉积的DLC薄膜具有更高的抗激光损伤阈值。基于实验研究了薄膜光学常数和表面形态,分析了两种技术制备DLC膜激光损伤特性差异的主要原因。结果表明,采用UBMS技术沉积的DLC膜具有较小的折射率和较大的消光系数,薄膜表面存在较多的疵病和缺陷,这些是其激光损伤阈值较低的主要原因。 展开更多
关键词 类金刚石膜(DLC) 脉冲真空电弧沉积(PVAD) 非平衡磁控溅射(UBMS) 激光损伤阈值(LIDT)
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类金刚石薄膜的激光损伤特性及工艺优化 被引量:5
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作者 徐均琪 樊慧庆 +1 位作者 刘卫国 苏俊宏 《光电工程》 EI CAS CSCD 北大核心 2008年第12期45-49,共5页
采用脉冲真空电弧沉积(PVAD)技术制备了类金刚石(DLC)薄膜,并对其抗激光损伤特性进行了研究,优化了制备工艺。对DLC薄膜激光损伤阈值(LIDT)的测试结果表明,随着厚度的增加,薄膜的LIDT开始呈下降趋势,当厚度达到100nm以上时,则趋于一个... 采用脉冲真空电弧沉积(PVAD)技术制备了类金刚石(DLC)薄膜,并对其抗激光损伤特性进行了研究,优化了制备工艺。对DLC薄膜激光损伤阈值(LIDT)的测试结果表明,随着厚度的增加,薄膜的LIDT开始呈下降趋势,当厚度达到100nm以上时,则趋于一个稳定值。正交实验结果的处理和分析表明,在所给定的工艺参数范围内,主回路电压是影响DLC膜抗激光损伤性能的最主要因素,基片温度、清洗时间和脉冲频率则影响较小。为得到较好的抗激光损伤能力,采用PVAD技术制备DLC薄膜的最佳工艺参数为:清洗时间20min、基片温度150℃、脉冲频率5Hz、主回路电压150V。退火处理会使DLC薄膜的激光损伤阈值明显提高。 展开更多
关键词 类金刚石(DLC) 脉冲真空电弧沉积(PVAD) 激光损伤阈值(LIDT) 工艺优化
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强激光辐照对无氢DLC膜光学特性的影响
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作者 徐均琪 陈银凤 +1 位作者 苏俊宏 杭凌侠 《西安工业大学学报》 CAS 2012年第12期959-963,共5页
为了探索类金刚石薄膜激光损伤的原因,研究了在激光作用下类金刚石薄膜的光学性能和结构的变化.采用非平衡磁控溅射(Unbalance Magnetron Sputtering,UBMS)在Si基底上制备了无氢类金刚石薄膜(Diamond-Like Carbon,DLC).利用激光损伤测... 为了探索类金刚石薄膜激光损伤的原因,研究了在激光作用下类金刚石薄膜的光学性能和结构的变化.采用非平衡磁控溅射(Unbalance Magnetron Sputtering,UBMS)在Si基底上制备了无氢类金刚石薄膜(Diamond-Like Carbon,DLC).利用激光损伤测试系统对无氢DLC薄膜进行激光辐照,激光波长为1064nm,脉宽为10ns.对辐照前后进行了透过率、激光损伤阈值(Laser-Induced Damage Threshold,LIDT)及拉曼光谱测试.研究结果表明:当激光辐照能量密度从0升高至0.93J/cm2时,透过率峰值从67.06%降至58.27%;当激光能量密度一定,脉冲次数从0增加至3时,透过率峰值从67.06%降至57.65%,LIDT从0.94降至0.50J/cm2.通过对Raman光谱进行分析认为辐照过程中sp3向sp2的转变是导致透过率和LIDT降低的重要原因. 展开更多
关键词 类金刚石 激光辐照 透过率 RAMAN LIDT
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辐照激光能量对SiO_2薄膜特性及结构的影响 被引量:3
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作者 郭芳 徐均琪 +2 位作者 苏俊宏 党少坤 基玛.格拉索夫 《应用光学》 CAS CSCD 北大核心 2014年第2期348-352,共5页
为了认识SiO2薄膜在激光辐照下的变化,本文以K9玻璃为基底,采用电子束热蒸发方法制备了SiO2薄膜,并将此组在相同实验条件下制备的薄膜加以不同能量的激光辐照,研究在激光辐照前后样片的透射率、折射率、消光系数、膜厚、表面形貌及激光... 为了认识SiO2薄膜在激光辐照下的变化,本文以K9玻璃为基底,采用电子束热蒸发方法制备了SiO2薄膜,并将此组在相同实验条件下制备的薄膜加以不同能量的激光辐照,研究在激光辐照前后样片的透射率、折射率、消光系数、膜厚、表面形貌及激光损伤阈值(LIDT)的变化。结果表明,样片膜厚随激光能量的增加而减小,辐照激光能改善薄膜表面形貌,并使样片LIDT值提高,最终能使样片的LIDT值从16.96J/cm2提高至18.8J/cm2。 展开更多
关键词 SIO2薄膜 辐照激光 激光损伤阈值(LIDT) 影响
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紫外激光双波段高反射镜的研制 被引量:2
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作者 陈恒 熊仕富 +1 位作者 韩建 孙鸿伟 《光电技术应用》 2014年第3期1-4,16,共5页
通过非线性光学频率变换的方式,1 064 nm YAG激光可获得355 nm、266 nm波长的激光。在此系统中工作的反射镜必须同时满足两个波段的高反射。根据薄膜设计理论选择合适的镀膜材料,采用电子束离子辅助沉积工艺,经过参数优化和反复试验,在... 通过非线性光学频率变换的方式,1 064 nm YAG激光可获得355 nm、266 nm波长的激光。在此系统中工作的反射镜必须同时满足两个波段的高反射。根据薄膜设计理论选择合适的镀膜材料,采用电子束离子辅助沉积工艺,经过参数优化和反复试验,在石英基片上制备了355 nm反射率为97.9%,266 nm反射率为96.8%的双波段反射镜,且在紫外波段355 nm的激光损伤阈值为1.76J/cm2,266 nm为1.12 J/cm2。测试结果表明,此反射镜的各项性能满足使用要求。 展开更多
关键词 紫外高反射镜 激光损伤阈值(LIDT) 离子辅助沉积(IAD) 薄膜
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High laser damage threshold coatings and damage testing technology 被引量:5
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作者 MA Ping HU Jian-ping CHEN Song-lin TANG Ming WANG Zhen LI Wei XU Qiao 《光学精密工程》 EI CAS CSCD 北大核心 2005年第4期500-504,共5页
The laser-induced damage threshold(LIDT) of optical coating is a limited factor for development of a high peak power laser. The automatic damage testing facility was built to determine the LIDT of optics at 1 064 nm a... The laser-induced damage threshold(LIDT) of optical coating is a limited factor for development of a high peak power laser. The automatic damage testing facility was built to determine the LIDT of optics at 1 064 nm and 355 nm.. The cleanning and processing procedure of the substrate and coating technique were improved, and the damage resistance of high-reflective coating at 1 064 nm was increased. 展开更多
关键词 激光涂覆技术 LIDT 自动机械 光学仪器 激光仪器
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Annealing Effects on Structural,Optical Properties and Laser-Induced Damage Threshold of MgF2 Thin Films 被引量:4
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作者 Ting-Ting Tan Bang-Jie Liu +1 位作者 Zhi-Hui Wu Zheng-Tang Liu 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2017年第1期73-78,共6页
The chemical structures, optical properties and laser-induced damage thresholds of magnesium fluoride films annealed at different temperatures were investigated. The results showed that the stoichiometry of MgF2 film ... The chemical structures, optical properties and laser-induced damage thresholds of magnesium fluoride films annealed at different temperatures were investigated. The results showed that the stoichiometry of MgF2 film changed a little with the increase in annealing temperature. Analysis of the optical properties indicated that excellent antireflection behavior of the film in the range of 200-400 nm can be obtained by the samples coated with MgF2 film. The refractive index increased and the extinction coefficient decreased with increasing annealing temperature. Compared with the asdeposited films, the laser-induced damage threshold was improved after annealing process and decreased with the increase in annealing temperature, which was probably due to the denser film and more absorption centers under higher annealing temperature. 展开更多
关键词 Annealing temperature Chemical structure Optical properties Laser-induced damage threshold (LIDT) MgF2 films
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Investigation of high power laser coatings 被引量:1
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作者 SHAO Jian-da FAN Zheng-xiu 《光学精密工程》 EI CAS CSCD 北大核心 2005年第4期471-479,共9页
High laser-induced damage threshold and large aperture were focuses on the studies of high power laser coatings. This paper reports the research activities at our center. Several measures were developed for evaluating... High laser-induced damage threshold and large aperture were focuses on the studies of high power laser coatings. This paper reports the research activities at our center. Several measures were developed for evaluating characters of laser damage, including determination of laser induced damage threshold and detection of absorption based on surface thermal lensing technique. Defect was deemed to be the initial source of laser damage, and was the main factor restricting the laser damage resistance of optical coatings. The contribution of several kinds of typical defects to laser damage was analyzed, and some deposition measures were adopted to control and eliminate the origin of defect. Furthermore, some post-treatment methods were also employed to alleviate the influence of the defect and to improve the laser damage resistance. Correction mask was introduced to improve the thickness uniformity, and the thickness uniformity can be amended to less than 1% in the range of Φ650 mm. Preliminary investigation related to surface deformation was also conducted. 展开更多
关键词 激光涂覆技术 LIDT 吸收能力 激光器
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Experimental demonstration of narrow-band rugate minus filters using rapidly alternating deposition technology 被引量:1
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作者 Ying Zhang Yan-Zhi Wang +2 位作者 Jiao-Ling Zhao Jian-Da Shao Shuang-Chen Ruan 《Chinese Physics B》 SCIE EI CAS CSCD 2018年第5期313-317,共5页
The design,fabrication and performance of narrow-band rugate minus filters are investigated in this paper.A method of fabricating graded-index coatings by rapidly alternating deposition of low(Si O_(2))and high(Al_(2)... The design,fabrication and performance of narrow-band rugate minus filters are investigated in this paper.A method of fabricating graded-index coatings by rapidly alternating deposition of low(Si O_(2))and high(Al_(2)O_(3))refractive index materials is presented to fabricate a rugate structure.The narrow-band rugate minus filter design and fabrication approaches are discussed in detail.The experimental results,including transmittance spectrum,surface damage test and damage morphology investigated with a scanning electron microscope,demonstrate the high performance of the as-fabricated spatial filter and confirm the feasibility of the fabrication method for narrow-band rugate minus filters. 展开更多
关键词 rugate structure minus filter NARROW-BAND laser-induced damage threshold(LIDT)
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Optical, Mechanical and Laser-induced Damage Threshold Properties of 1064 nm, 532 nm Frequency-doubled Antireflection Coating for LBO
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作者 谭天亚 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2011年第4期687-689,共3页
1 064 nm, 532 nm frequency-doubled antireflection (AR) coatings with buffer layer of SiO2 between the coating and the substrate were fabricated by the electron beam evaporation technology on the substrate of lithium... 1 064 nm, 532 nm frequency-doubled antireflection (AR) coatings with buffer layer of SiO2 between the coating and the substrate were fabricated by the electron beam evaporation technology on the substrate of lithium triborate (LiB3O5 or LBO) crystals. The residual reflectance of the sample is 0.07% and 0.11% at 1 064 nm and 532 nm, respectively. The adhesion and the laser-induced damage threshold (LIDT) of the sample are greater than 200 mN and 18.6 J/cm2. The strengthening mechanism of adhesion and LIDT of the buffer layer of SiO2 were discussed by considering full plastic indentation and shear theory, and spallation of a plated film induced by thermal shock stress, respectively. 展开更多
关键词 frequency-doubled AR coating LBO ADHESION LIDT buffer layer
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Preparation and laser induced damage properties of rare earth doped BAS glass
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作者 倪亚茹 许仲梓 +2 位作者 陆春华 张焱 张其土 《Journal of Rare Earths》 SCIE EI CAS CSCD 2008年第2期220-224,共5页
Rare earth doped B2O3-Al2O3-SiO2 glass (RExBAS, x=5, 10, 20; RE=La, Sm) were prepared by solid state reaction method. Optical transmission spectra of such glass were characterized by ultraviolet spectrometers, and 1... Rare earth doped B2O3-Al2O3-SiO2 glass (RExBAS, x=5, 10, 20; RE=La, Sm) were prepared by solid state reaction method. Optical transmission spectra of such glass were characterized by ultraviolet spectrometers, and 1064 nm laser induced damage performance was investigated through the method of "1-on-1". The results indicated that there was a strong absorptive peak near 1064 nm in SmxBAS glass, the peak was enhanced with increasing x. While LaxBAS glass was transparent to 1064 nm laser, at the same time, the results of laser induced damage showed that the anti-laser induced damage performance of such glass was strengthened with the addition of rare earth oxide. Furthermore, the laser induced damage threshold (LIDT) of SmxBAS glass was significantly higher than that of LaxBAS glass. Consequently, Sm^3+ doping was favor in the improvement of anti-laser induced damage performance for BAS glass. 展开更多
关键词 BAS glass Sm^3+ La^3+ laser induced damage threshold (LIDT) rare earths
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Reactive flux assisted metal oxide–boron–sulfur routine for syntheses of CsRESiS_(4)(RE=Sm,Gd–Ho):featuring nonlinear optical activity and wide band gaps
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作者 Zhen-Cheng Wu Fang-Xu Tian +4 位作者 Rui Xiao Mao-Yin Ran Wenlong Liu Wen-Tong Chen Sheng-Ping Guo 《Inorganic Chemistry Frontiers》 2026年第2期745-753,共9页
The study of infrared nonlinear optical(NLO)materials with wide band gaps and high laser induced damage thresholds(LIDTs)is an urgent and challenging topic.Here,we report the NLO properties of CsRESiS_(4)(RE=Sm,Gd–Ho... The study of infrared nonlinear optical(NLO)materials with wide band gaps and high laser induced damage thresholds(LIDTs)is an urgent and challenging topic.Here,we report the NLO properties of CsRESiS_(4)(RE=Sm,Gd–Ho),which were synthesized by the reactive flux CsCl assisted RExOy–B–S routine.The structure of CsRESiS_(4),[CsS_(7)]pentagonal bipyramids are orderly arranged to populate the interlayer space created by[RES_(7)]monocapped triangular prisms consolidated[SiS_(4)]tetrahedra.They all exhibit wide band gaps of 3.51–3.95 eV,high LIDTs of 3.6–5.5×AGS,and NLO activity,with CsHoSiS_(4)possessing the largest band gap among rare-earth chalcogenides.The theoretical calculation results indicate that[RES_(7)]monocapped triangular prisms are the main source of NLO activity and have a wide band gap.This work provides an effective case for exploring wide band gap infrared NLO materials. 展开更多
关键词 reactive flux cscl assisted rexoy b s routinethe boron sulfur nonlinear optical activity wide band reactive flux metal oxide laser induced damage thresholds lidts
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沉积速率对H4膜光学带隙及激光损伤特性的影响 被引量:2
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作者 徐均琪 苏俊宏 +1 位作者 杭良毅 基玛.格拉索夫 《光电子.激光》 EI CAS CSCD 北大核心 2016年第10期1054-1059,共6页
采用电子束热蒸发技术在石英基底上制备了H4薄膜,并对其光学和激光损伤特性进行了研究。根据透射率谱计算出薄膜的光学带隙发现,光学带隙随着沉积速率的降低而增大,其值大小在4.66~4.73eV。椭偏测试结果表明,当沉积速率从0.92nm/s、0.1... 采用电子束热蒸发技术在石英基底上制备了H4薄膜,并对其光学和激光损伤特性进行了研究。根据透射率谱计算出薄膜的光学带隙发现,光学带隙随着沉积速率的降低而增大,其值大小在4.66~4.73eV。椭偏测试结果表明,当沉积速率从0.92nm/s、0.17nm/s、0.08nm/s降低到0.03nm/s时,薄膜折射率从1.955 2、1.919 8、1.901 8降低到1.895 4(1 064nm)。所有样品的消光系数量级均优于10-5,说明薄膜表现出极小的吸收。薄膜的激光损伤形貌和激光损伤阈值(LIDT)受沉积速率的影响不大,同一激光能量作用下,薄膜的损伤斑大小基本一致,但0.92nm/s时制备的薄膜,其损伤区与未损伤区存在相互交错现象。当沉积速率从0.03nm/s变化到0.92nm/s时,薄膜激光损伤阈值在16~17J/cm^2(1 064nm,10ns)之间。 展开更多
关键词 薄膜 H4 光学带隙 折射率 激光损伤阈值(LIDT)
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