We report the fabrication of 4-inch nano patterned wafer by two-beam laser interference lithography and analyze the uniformity in detail. The profile of the dots array with a period of 800 nm divided into five regions...We report the fabrication of 4-inch nano patterned wafer by two-beam laser interference lithography and analyze the uniformity in detail. The profile of the dots array with a period of 800 nm divided into five regions is characterized by a scanning electron microscope. The average size in each region ranges from 270 nm to 320 nm,and the deviation is almost 4%, which is approaching the applicable value of 3% in the industrial process. We simulate the two-beam laser interference lithography system with MATLAB software and then calculate the distribution of light intensity around the 4 inch area. The experimental data fit very well with the calculated results. Analysis of the experimental data and calculated data indicates that laser beam quality and space filter play important roles in achieving a periodical nanoscale pattern with high uniformity and large area. There is the potential to obtain more practical applications.展开更多
Large-area gratings play a crucial role in various engineering fields.However,traditional interference lithography is limited by the size of optical component apertures,making large-area fabrication a challenging task...Large-area gratings play a crucial role in various engineering fields.However,traditional interference lithography is limited by the size of optical component apertures,making large-area fabrication a challenging task.Here,a method for fabricating laser interference lithography pattern arrays with a global alignment reference strategy is proposed.This approach enables alignment of each area of the laser interference lithography pattern arrays,including phase,period,and tilt angle.Two reference gratings are utilized:one is detached from the substrate,while the other remains fixed to it.To achieve global alignment,the exposure area is adjusted by alternating between moving the beam and the substrate.In our experiment,a 3×3 regions grating array was fabricated,and the−1st-order diffraction wavefront measured by the Fizeau interferometer exhibited good continuity.This technique enables effective and efficient alignment with high accuracy across any region in an interference lithography pattern array on large substrates.It can also serve as a common technique for fabricating various types of periodic structures by rotating the substrate.展开更多
ZnO is a typical direct wide-bandgap semiconductor material, which has various morphologies and unique physical and chemical properties, and is widely used in the fields of energy, information technology, biomedicine,...ZnO is a typical direct wide-bandgap semiconductor material, which has various morphologies and unique physical and chemical properties, and is widely used in the fields of energy, information technology, biomedicine, and others. The precise design and controllable fabrication of nanostructures have gradually become important avenues to further enhancing the performance of Zn O-based functional nanodevices. This paper introduces the continuous development of patterning technologies, provides a comprehensive review of the optical lithography and laser interference lithography techniques for the controllable fabrication of Zn O nanostructures, and elaborates on the potential applications of such patterned Zn O nanostructures in solar energy, water splitting, light emission devices, and nanogenerators. Patterned Zn O nanostructures with highly controllable morphology and structure possess discrete three-dimensional space structure, enlarged surface area, and improved light capture ability, which realize the efficient carrier regulation,achieve highly efficient energy conversion, and meet the diverse requirements of functional nanodevices. The patterning techniques proposed for the precise design of Zn O nanostructures not only have important guiding significance for the controllable fabrication of complex nanostructures of other materials, but also open up a new route for the further development of functional nanostructures.展开更多
基金Supported by the Scientific Equipment Research Program of Chinese Academy of Sciences under Grant No 2014Y4201449
文摘We report the fabrication of 4-inch nano patterned wafer by two-beam laser interference lithography and analyze the uniformity in detail. The profile of the dots array with a period of 800 nm divided into five regions is characterized by a scanning electron microscope. The average size in each region ranges from 270 nm to 320 nm,and the deviation is almost 4%, which is approaching the applicable value of 3% in the industrial process. We simulate the two-beam laser interference lithography system with MATLAB software and then calculate the distribution of light intensity around the 4 inch area. The experimental data fit very well with the calculated results. Analysis of the experimental data and calculated data indicates that laser beam quality and space filter play important roles in achieving a periodical nanoscale pattern with high uniformity and large area. There is the potential to obtain more practical applications.
基金supported by the National Natural Science Foundation of China(no.62275142)the Shenzhen Stable Supporting Program(no.WDZC20231124201906001).
文摘Large-area gratings play a crucial role in various engineering fields.However,traditional interference lithography is limited by the size of optical component apertures,making large-area fabrication a challenging task.Here,a method for fabricating laser interference lithography pattern arrays with a global alignment reference strategy is proposed.This approach enables alignment of each area of the laser interference lithography pattern arrays,including phase,period,and tilt angle.Two reference gratings are utilized:one is detached from the substrate,while the other remains fixed to it.To achieve global alignment,the exposure area is adjusted by alternating between moving the beam and the substrate.In our experiment,a 3×3 regions grating array was fabricated,and the−1st-order diffraction wavefront measured by the Fizeau interferometer exhibited good continuity.This technique enables effective and efficient alignment with high accuracy across any region in an interference lithography pattern array on large substrates.It can also serve as a common technique for fabricating various types of periodic structures by rotating the substrate.
基金supported by the National Key Research and Development Program of China(2013CB932602 and 2016YFA0202701)the Program of Introducing Talents of Discipline to Universities(B14003)+2 种基金the National Natural Science Foundation of China(51527802,51232001,51372020 and 51602020)Beijing Municipal Science&Technology Commission(Z151100003315021)China Postdoctoral Science Foundation(2016M600039)
文摘ZnO is a typical direct wide-bandgap semiconductor material, which has various morphologies and unique physical and chemical properties, and is widely used in the fields of energy, information technology, biomedicine, and others. The precise design and controllable fabrication of nanostructures have gradually become important avenues to further enhancing the performance of Zn O-based functional nanodevices. This paper introduces the continuous development of patterning technologies, provides a comprehensive review of the optical lithography and laser interference lithography techniques for the controllable fabrication of Zn O nanostructures, and elaborates on the potential applications of such patterned Zn O nanostructures in solar energy, water splitting, light emission devices, and nanogenerators. Patterned Zn O nanostructures with highly controllable morphology and structure possess discrete three-dimensional space structure, enlarged surface area, and improved light capture ability, which realize the efficient carrier regulation,achieve highly efficient energy conversion, and meet the diverse requirements of functional nanodevices. The patterning techniques proposed for the precise design of Zn O nanostructures not only have important guiding significance for the controllable fabrication of complex nanostructures of other materials, but also open up a new route for the further development of functional nanostructures.
