Theoretical analysis and experimental study on the thickness distribution of Ta_(2)O_(5) film evaporated on the inner-face of a hemispherical substrate are demonstrated. It is derived that the value of n/R and L/R inf...Theoretical analysis and experimental study on the thickness distribution of Ta_(2)O_(5) film evaporated on the inner-face of a hemispherical substrate are demonstrated. It is derived that the value of n/R and L/R influence the film thickness distribution(where R is the radius of the hemisphere, n and L are the horizontal distance and vertical height between the evaporation source and the center of the hemisphere, respectively). The whole hemispherical substrate can be coated when n≤L+R, otherwise there is a "blind area" on the substrate when the substrate is self-rotating. A hemispherical composite substrate with a radius of 200 mm is coated with Ta_(2)O_(5) protective film under a certain configuration, the thickness of Ta_(2)O_(5) film at the edge is 0.372 times the film at the vertex which shows that the evaporation characteristics of Ta_(2)O_(5) tend to be a point source.展开更多
基金supported by the Foundation of Science and Technology on Vacuum Technology and Physics Laboratory (No.ZD171902)。
文摘Theoretical analysis and experimental study on the thickness distribution of Ta_(2)O_(5) film evaporated on the inner-face of a hemispherical substrate are demonstrated. It is derived that the value of n/R and L/R influence the film thickness distribution(where R is the radius of the hemisphere, n and L are the horizontal distance and vertical height between the evaporation source and the center of the hemisphere, respectively). The whole hemispherical substrate can be coated when n≤L+R, otherwise there is a "blind area" on the substrate when the substrate is self-rotating. A hemispherical composite substrate with a radius of 200 mm is coated with Ta_(2)O_(5) protective film under a certain configuration, the thickness of Ta_(2)O_(5) film at the edge is 0.372 times the film at the vertex which shows that the evaporation characteristics of Ta_(2)O_(5) tend to be a point source.
