The application of indium requires high purity indium as material.5N high purity indium had been prepared by the method of acombination of chemically smelting and electrolysis. Smelting timewas 10 min, the abstraction...The application of indium requires high purity indium as material.5N high purity indium had been prepared by the method of acombination of chemically smelting and electrolysis. Smelting timewas 10 min, the abstraction rate of cadmium was 80/100-90/100 whenused solution of I_2-KI and glycerine to smelt indium. 4N metalindium was used as anode, high purity indium as cathode, In-2(SO_4)_3-H_2SO_4 system as electrolyte, and In content is 100 g/L, pH2-3 and current density 80-100 a/m^2.展开更多
基金This project is financially supported by Chinese Key Project of Science and Technology (No.96-119-04-01)
文摘The application of indium requires high purity indium as material.5N high purity indium had been prepared by the method of acombination of chemically smelting and electrolysis. Smelting timewas 10 min, the abstraction rate of cadmium was 80/100-90/100 whenused solution of I_2-KI and glycerine to smelt indium. 4N metalindium was used as anode, high purity indium as cathode, In-2(SO_4)_3-H_2SO_4 system as electrolyte, and In content is 100 g/L, pH2-3 and current density 80-100 a/m^2.
