Atomic force microscope(AFM)systems rely on silicon(Si)probes for precise nanoscale characterization across diverse environments.However,fabricating high-aspect-ratio(HAR)and sharp Si tips and optimizing the handle ge...Atomic force microscope(AFM)systems rely on silicon(Si)probes for precise nanoscale characterization across diverse environments.However,fabricating high-aspect-ratio(HAR)and sharp Si tips and optimizing the handle geometries remain significant challenges.Conventional HAR probe fabrication methods lack scalability,precision,and cost efficiency,while cuboid-shaped handles risk obstructing laser detection and limiting compatibility.This study presents an innovative batch-fabrication strategy for high-performance Si AFM probes that integrate ultra-sharp HAR tips,rectangular cantilevers,and universally compatible stair-shaped handles.Notably,the tip fabrication process employs only low-cost microscale ultraviolet(UV)lithography,while still achieving nanoscale structural resolution.The fabricated probes exhibit a tip apex radius of 5 nm and a half-cone angle of 7.5°,enabling high-resolution and highfidelity imaging.The novel stair-shaped handle geometry is introduced and fabricated via a single-step dry etching process,which provides unobstructed laser detection and ensures compatibility with a broad range of commercial AFM platforms.Durability testing demonstrates stable scanning performance for up to 8 hours within the 100 nm precision range,confirming the mechanical reliability of the design.This scalable,reproducible,and high-yield fabrication strategy represents a significant advancement in HAR AFM probe development,providing enhanced performance and extended applicability for diverse nanoscale imaging applications.展开更多
基金funded by the Canada Foundation for Innovation the Ontario Ministry of Research and Innovation,and Industry Canada.
文摘Atomic force microscope(AFM)systems rely on silicon(Si)probes for precise nanoscale characterization across diverse environments.However,fabricating high-aspect-ratio(HAR)and sharp Si tips and optimizing the handle geometries remain significant challenges.Conventional HAR probe fabrication methods lack scalability,precision,and cost efficiency,while cuboid-shaped handles risk obstructing laser detection and limiting compatibility.This study presents an innovative batch-fabrication strategy for high-performance Si AFM probes that integrate ultra-sharp HAR tips,rectangular cantilevers,and universally compatible stair-shaped handles.Notably,the tip fabrication process employs only low-cost microscale ultraviolet(UV)lithography,while still achieving nanoscale structural resolution.The fabricated probes exhibit a tip apex radius of 5 nm and a half-cone angle of 7.5°,enabling high-resolution and highfidelity imaging.The novel stair-shaped handle geometry is introduced and fabricated via a single-step dry etching process,which provides unobstructed laser detection and ensures compatibility with a broad range of commercial AFM platforms.Durability testing demonstrates stable scanning performance for up to 8 hours within the 100 nm precision range,confirming the mechanical reliability of the design.This scalable,reproducible,and high-yield fabrication strategy represents a significant advancement in HAR AFM probe development,providing enhanced performance and extended applicability for diverse nanoscale imaging applications.
