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Silicon Deep Etching Techniques for MEMS Devices
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作者 WUYing OUYi-hong +1 位作者 JIANGYong-qing LIBin 《Semiconductor Photonics and Technology》 CAS 2003年第4期226-229,共4页
Silicon deep etching technique is the key fabrication step in the development of MEMS. The mask selectivity and the lateral etching control are the two primary factors that decide the result of deep etching process. T... Silicon deep etching technique is the key fabrication step in the development of MEMS. The mask selectivity and the lateral etching control are the two primary factors that decide the result of deep etching process. These two factors are studied in this paper. The experimental results show that the higher selectivity can be gotten when F - gas is used as etching gas and Al is introduced as mask layer. The lateral etching problems can be solved by adjusting the etching condition, such as increasing the RF power, changing the gas composition and flow volume of etching machine. 展开更多
关键词 deep etching techniques MEMS plasma etching
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Microscale Crystalline Rare-Earth Doped Resonators for Strain-Coupled Optomechanics
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作者 Jean-François Motte Nicolas Galland +7 位作者 Jérôme Debray Alban Ferrier Philippe Goldner Nemenja Lucic Shuo Zhang Bess Fang Yann Le Coq Signe Seidelin 《Journal of Modern Physics》 2019年第11期1342-1352,共11页
Rare-earth ion doped crystals for hybrid quantum technologies are an area of growing interest in the solid-state physics community. We have earlier theoretically proposed a hybrid scheme of a mechanical resonator whic... Rare-earth ion doped crystals for hybrid quantum technologies are an area of growing interest in the solid-state physics community. We have earlier theoretically proposed a hybrid scheme of a mechanical resonator which is fabricated out of a rare-earth doped mono-crystalline structure. The rare-earth ion dopants have absorption energies which are sensitive to crystal strain, and it is thus possible to couple the ions to the bending motion of the crystal cantilever. This type of resonator can be useful for either investigating the laws of quantum physics with material objects or for applications such as sensitive force-sensors. Here, we present the design and fabrication method based on focused-ion-beam etching techniques which we have successfully employed in order to create such microscale resonators, as well as the design of the environment which will allow studying the quantum behavior of the resonators. 展开更多
关键词 Rare-Earth Doped Crystals Mechanical Resonators OPTOMECHANICS Quantum Physics Strain-Coupling Spectral Hole Burning Focused-Ion-Beam etching techniques
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Observation of etch pits in Fe-36wt%Ni Invar alloy 被引量:3
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作者 Dong-zhu Lu Min-jie Wu 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2014年第7期682-686,共5页
To indirectly investigate the dislocation behavior of Fe-36wt%Ni Invar alloy by the etch pit method, polished Invar specimens were etched by a solution containing 4 g copper sulfate, 20 mL hydrochloric acid, and 20 mL... To indirectly investigate the dislocation behavior of Fe-36wt%Ni Invar alloy by the etch pit method, polished Invar specimens were etched by a solution containing 4 g copper sulfate, 20 mL hydrochloric acid, and 20 mL deionized water for 2 min. Etch pits in the etched surfaces were observed. All the etch pits in one specific grain exhibited similar shapes, which are closely related to the grain orienta-tions. These etch pits were characterized as dislocation etch pits. It was observed that etch pits arranged along grain boundaries, gathered at grain tips and strip-like etch pit clusters passed through a number of grains in the pure Invar specimens. After the addition of a small amount of alloying elements, the identification of a single dislocation etch pit is challenging compared with the pure Invar alloy. Thus, the observation of etch pits facilitates the investigation on the dislocation behavior of the pure Invar alloy. In addition, alloying elements may affect the densities and sizes of etch pits. 展开更多
关键词 Invar alloy dislocations etch pit technique alloying elements
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Improvement of silicon etching resolution using the confined etchant layer technique
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作者 Zu, YB Xie, L +3 位作者 Tian, ZW Xie, ZX Mu, JQ Mao, BW 《Chinese Science Bulletin》 SCIE EI CAS 1997年第15期1318-1319,共2页
WHEN scanning electrochemical microscopy (SECM) with feedback mode is used to etchcertain surface, the etchant molecules generated at a microelectrode diffuse to the surface andreact therein with the surface species, ... WHEN scanning electrochemical microscopy (SECM) with feedback mode is used to etchcertain surface, the etchant molecules generated at a microelectrode diffuse to the surface andreact therein with the surface species, resulting in local etching pattern. It is noted that theetching resolution of SECM is dominantly determined by the size of the microelectrode.However, many experimental results have shown the significant influence of the lateral diffu-sion of etchant on the etching resolution. Therefore, a thin diffusion layer of the 展开更多
关键词 AS SECM Improvement of silicon etching resolution using the confined etchant layer technique CELT
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High-efficiency ultraviolet generation in a resonance-free anti-resonant hollow-core fiber 被引量:1
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作者 DAIQI XIONG YUXI WANG +4 位作者 RUHAI BAI ZHIXUN WANG ALEXANDER SI KAI YONG KAICHENG LIANG WONKEUN CHANG 《Photonics Research》 2025年第8期2377-2383,共7页
We report the first demonstration of high-efficiency ultraviolet(UV)pulse generation in a resonance-free anti-resonant hollow-core fiber(AR-HCF).Using the wet-etching technique,we successfully reduced the cladding-tub... We report the first demonstration of high-efficiency ultraviolet(UV)pulse generation in a resonance-free anti-resonant hollow-core fiber(AR-HCF).Using the wet-etching technique,we successfully reduced the cladding-tube wall thickness of the AR-HCF to 115 nm,thereby eliminating all cladding-induced structural resonances between the near-infrared pump and the deep UV wavelengths.This structural modification fundamentally suppresses competing conversion to other phase-matching points induced by structural resonances and mitigates the pump spectral broadening limitation,achieving a UV conversion efficiency as high as 12%—twice that of previous demonstrations in gas-filled AR-HCFs.This UV conversion efficiency is comparable to that of meter-scale gas-filled capillaries that require pump pulse energy of hundreds of microjoules while also maintaining the AR-HCF's inherent advantages of centimeter-scale compactness and low pump energy at the few microjoule level. 展开更多
关键词 uv pulse generation wet etching technique structural resona structural resonances uv conversion efficiency resonance free anti resonant hollow core fiber high efficiency ultraviolet generation structural modification
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Competitive Roles of Conductivity and Lithiophility in Composite Lithium Metal Anode
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作者 Wenbo Tang Nailu Shen +13 位作者 Xiaosong Xiong He Liu Xin Sun Jiaxin Guo Feng Jiang Tao Wang Yuan Ma Yiren Zhong Jiarui He Zhi Zhu Long Kong Gulnur Kalimuldina XinBing Cheng Yuping Wu 《Energy Material Advances》 CSCD 2024年第1期432-440,共9页
For the three-dimensional conductive host,the uneven lithium deposition and the dependence on the pore structure and lithiophility are a great challenge for lithium metal anodes.Herein,we employed facial chemical etch... For the three-dimensional conductive host,the uneven lithium deposition and the dependence on the pore structure and lithiophility are a great challenge for lithium metal anodes.Herein,we employed facial chemical etching techniques on brass foil to fabricate three-dimensional copper hosts with diverse pore structures and lithiophilities,thus intending to understand the lithium depositing mechanisms in porous hosts.The copper host with a more pronounced pore structure exhibits the lower polarization voltage induced by its large specific surface area,which reduces the local current density and provides a great deal of pathway for lithium ion diffusion.Meanwhile,it exhibits high nucleation overpotential and a short lifespan due to a reduced number of favorable lithium nucleation sites caused by the reduced lithiophilic zinc sites and a marked increase in the routes between nucleation sites.Therefore,the appropriate pore structure needs a consideration of efficient balance between the nucleation overpotential,the polarization voltage,and Coulombic efficiency.This insight underscores the pivotal role of well-suited pore structures in three-dimensional hosts,providing profound guidance for the efficient design of advanced host for lithium metal anode. 展开更多
关键词 copper host polarization voltage porous hoststhe CONDUCTIVITY facial chemical etching techniques lithium metal anodeshereinwe pore structure brass foil
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