We present a bulk micromachined in-plane capacitive accelerometer fabricated with an improved process flow,by etching only one-fifth of the wafer thickness at the back of the silicon while forming the bar-structure el...We present a bulk micromachined in-plane capacitive accelerometer fabricated with an improved process flow,by etching only one-fifth of the wafer thickness at the back of the silicon while forming the bar-structure electrode for the sensing capacitor.The improved flow greatly lowers the footing effect during deep reactive ion etching(DRIE),and increases the proof mass by 54% compared to the traditional way,resulting in both improved device quality and a higher yield rate.Acceleration in the X direction is sensed capacitively by varying the overlapped area of a differential capacitor pair,which eliminates the nonlinear behavior by fixing the parallel-plate gap.The damping coefficient of the sensing motion is low due to the slide-film damping.A large proof mass is made using DRIE,which also ensures that dimensions of the spring beams in the Y and Z directions can be made large to lower cross axis coupling and increase the pull-in voltage.The theoretical Brownian noise floor is 0.47 μg/Hz1/2 at room temperature and atmospheric pressure.The tested frequency response of a prototype complies with the low damping design scheme.Output data for input acceleration from ?1 g to 1 g are recorded by a digital multimeter and show very good linearity.The tested random bias of the prototype is 130 μg at an averaging time of around 6 s.展开更多
基金Project(No.NCET-06-0514)supported by the Program for New Century Excellent Talents in University,China
文摘We present a bulk micromachined in-plane capacitive accelerometer fabricated with an improved process flow,by etching only one-fifth of the wafer thickness at the back of the silicon while forming the bar-structure electrode for the sensing capacitor.The improved flow greatly lowers the footing effect during deep reactive ion etching(DRIE),and increases the proof mass by 54% compared to the traditional way,resulting in both improved device quality and a higher yield rate.Acceleration in the X direction is sensed capacitively by varying the overlapped area of a differential capacitor pair,which eliminates the nonlinear behavior by fixing the parallel-plate gap.The damping coefficient of the sensing motion is low due to the slide-film damping.A large proof mass is made using DRIE,which also ensures that dimensions of the spring beams in the Y and Z directions can be made large to lower cross axis coupling and increase the pull-in voltage.The theoretical Brownian noise floor is 0.47 μg/Hz1/2 at room temperature and atmospheric pressure.The tested frequency response of a prototype complies with the low damping design scheme.Output data for input acceleration from ?1 g to 1 g are recorded by a digital multimeter and show very good linearity.The tested random bias of the prototype is 130 μg at an averaging time of around 6 s.
