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Investigation of passivation effects in AlGaN/GaN metal-insulator-semiconductor high electron-mobility transistor by gate-drain conductance dispersion study
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作者 毕志伟 胡振华 +9 位作者 毛维 郝跃 冯倩 曹艳荣 高志远 张进成 马晓华 常永明 李志明 梅楠 《Chinese Physics B》 SCIE EI CAS CSCD 2011年第8期394-397,共4页
This paper studies the drain current collapse of A1GaN/GaN metal insulator-semiconductor high electron-mobility transistors (MIS-HEMTs) with NbA10 dielectric by applying dual-pulsed stress to the gate and drain of t... This paper studies the drain current collapse of A1GaN/GaN metal insulator-semiconductor high electron-mobility transistors (MIS-HEMTs) with NbA10 dielectric by applying dual-pulsed stress to the gate and drain of the device. For NbA10 MIS-HEMT, smaller current collapse is found thorough study of the gate-drain conductance dispersion especially when the gate static voltage is -8 V. Through a it is found that the growth of NbA10 can reduce the trap density of the AlGaN surface. Therefore, fewer traps can be filled by gate electrons, and hence the depletion effect in the channel is suppressed effectively. It is proved that the NbAIO gate dielectric can not only decrease gate leakage current but also passivate the A1GaN surface effectively, and weaken the current collapse effect accordingly. 展开更多
关键词 metal insulator-semiconductor high electron-mobility transistor GaN current collapse passivation
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