In order to obtain uniform exposure in variably shaped electron beam lithography,the beam current density and edge resolution on the target must not change for different spotshapes and sizes.The key to the goal is the...In order to obtain uniform exposure in variably shaped electron beam lithography,the beam current density and edge resolution on the target must not change for different spotshapes and sizes.The key to the goal is the appropriate design of shaping deflectors.A linearand rotation compensation approach is presented.Values of linear and rotation compensationfactors versus the distances between electron source image and centers of deflectors are measuredon an experimental electron beam column with variable spot shaping.The experimental resultsare in good agreement with the calculated ones.展开更多
Analytical expressions are given for computing the magnetic potential and charac-teristic functions produced by the non-radial deflectors.These expressions are useful for designingthe defiectors such as those used in ...Analytical expressions are given for computing the magnetic potential and charac-teristic functions produced by the non-radial deflectors.These expressions are useful for designingthe defiectors such as those used in the color picture tubes and the electron beam lithographysystem.The computing results are in agreement with the measured values.展开更多
文摘In order to obtain uniform exposure in variably shaped electron beam lithography,the beam current density and edge resolution on the target must not change for different spotshapes and sizes.The key to the goal is the appropriate design of shaping deflectors.A linearand rotation compensation approach is presented.Values of linear and rotation compensationfactors versus the distances between electron source image and centers of deflectors are measuredon an experimental electron beam column with variable spot shaping.The experimental resultsare in good agreement with the calculated ones.
文摘Analytical expressions are given for computing the magnetic potential and charac-teristic functions produced by the non-radial deflectors.These expressions are useful for designingthe defiectors such as those used in the color picture tubes and the electron beam lithographysystem.The computing results are in agreement with the measured values.
