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P-type dopability in Half-Heusler thermoelectric semiconductors
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作者 Lirong Hu Shen Han +2 位作者 Tiejun Zhu Tianqi Deng Chenguang Fu 《npj Computational Materials》 2025年第1期1140-1149,共10页
Half-Heusler(HH)semiconductors with high valence band degeneracy are promising p-type thermoelectric(TE)materials.However,effective p-type doping in HH semiconductors remains challenging,hindering further the explorat... Half-Heusler(HH)semiconductors with high valence band degeneracy are promising p-type thermoelectric(TE)materials.However,effective p-type doping in HH semiconductors remains challenging,hindering further the exploration of high-performance p-type TE materials.In this work,we conduct first-principles calculations to identify the dominant native defects and potential p-type dopants in three representative HH compounds,e.g.,NbFeSb,NbCoSn,and ZrNiSn.Our findings reveal that 4d interstitials underline the p-type dopability.By systematically investigating the extrinsic doping at the three Wyckoff positions in NbFeSb,NbCoSn,and ZrNiSn,respectively,we highlight that the pinned Fermi level serves as an indicator of p-type dopability.The calculation results identify Hf as a p-type dopant in NbCoSn under the Co-poor condition,which is further validated by experiments.A significantly improved p-type TE performance is obtained in Hf-doped NbCoSn.These results could guide the dopant selection and experimental optimization of the p-type TE performance of HH semiconductors. 展开更多
关键词 half heusler semiconductors hh semiconductors thermoelectric materials p type dopants p type dopability native defects d interstitials hh compoundsegnbfesbnbcosnand
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