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Atomic layer deposition of ultrathin layered TiO_2 on Pt/C cathode catalyst for extended durability in polymer electrolyte fuel cells
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作者 Sangho Chung Myounghoon Choun +2 位作者 Beomgyun Jeong Jae Kwang Lee Jaeyoung Lee 《Journal of Energy Chemistry》 SCIE EI CAS CSCD 2016年第2期256-262,共7页
This study shows the preparation of a TiO2 coated Pt/C(TiO2/Pt/C) by atomic layer deposition(ALD),and the examination of the possibility for TiO2/Pt/C to be used as a durable cathode catalyst in polymer electrolyt... This study shows the preparation of a TiO2 coated Pt/C(TiO2/Pt/C) by atomic layer deposition(ALD),and the examination of the possibility for TiO2/Pt/C to be used as a durable cathode catalyst in polymer electrolyte fuel cells(PEFCs). Cyclic voltammetry results revealed that TiO2/Pt/C catalyst which has 2 nm protective layer showed similar activity for the oxygen reduction reaction compared to Pt/C catalysts and they also had good durability. TiO2/Pt/C prepared by 10 ALD cycles degraded 70% after 2000 Accelerated degradation test, while Pt/C corroded 92% in the same conditions. TiO2 ultrathin layer by ALD is able to achieve a good balance between the durability and activity, leading to TiO2/Pt/C as a promising cathode catalyst for PEFCs. The mechanism of the TiO2 protective layer used to prevent the degradation of Pt/C is discussed. 展开更多
关键词 Polymer electrolyte hydrogen fuel cells Atomic layer deposition Gas diffusion layer Protective layer Titanium dioxide
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A Novel Duplex Low-temperature Chromizing Process at 500℃ 被引量:3
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作者 Huiliang CAO Cuilan WU +2 位作者 Jiangwen LIU Chengping LUO Ganfeng ZOU 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2007年第6期823-827,共5页
An optimized low-temperature chromizing process at 500℃ was realized on a plain medium-carbon steel with 0.45 wt pct carbon via a duplex chromizing process which consists of a precursor plasma nitriding, and a follow... An optimized low-temperature chromizing process at 500℃ was realized on a plain medium-carbon steel with 0.45 wt pct carbon via a duplex chromizing process which consists of a precursor plasma nitriding, and a followed salt bath thermoreactive deposition and diffusion (TRD) chromizing process. CrN layer with a thin diffusion layer underneath was formed. The duplex chromizing process was studied by optical microscopy (OM), scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD), and transmission electron microscopy (TEM). It was found that the chromizing speed at 500℃ was successfully enhanced by adding more Cr-Fe powders into the salt bath, and the CrN layer formed at the cost of the prior nitride compound layer. A CrN layer with average 8.1/~m in thickness and 1382 HV0.01 in microhardness was formed on the substrate by duplex chromizing at 500℃ for 24 h. Further more, the CrN layer consisted of nanocrystalline CrN grains. 展开更多
关键词 Chromizing Plasma nitriding Thermoreactive deposition and diffusion (TRD) CRN
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Scaling relation of domain competition on(2+1)-dimensional ballistic deposition model with surface diffusion
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作者 Kenyu Osada Hiroyasu Katsuno +1 位作者 Toshiharu Irisawa Yukio Saito 《Journal of Semiconductors》 EI CAS CSCD 2016年第9期12-17,共6页
During heteroepitaxial overlayer growth multiple crystal domains nucleated on a substrate surface compete with each other in such a manner that a domain covered by neighboring ones stops growing.The number density of ... During heteroepitaxial overlayer growth multiple crystal domains nucleated on a substrate surface compete with each other in such a manner that a domain covered by neighboring ones stops growing.The number density of active domains ρ decreases as the height h increases.A simple scaling argument leads to a scaling law of ρ~ h^(-γ) with a coarsening exponent γ=d/z,where d is the dimension of the substrate surface and z the dynamic exponent of a growth front.This scaling relation is confirmed by performing kinetic Monte Carlo simulations of the ballistic deposition model on a two-dimensional(d=2) surface,even when an isolated deposited particle diffuses on a crystal surface. 展开更多
关键词 domain competition ballistic deposition model Kardar-Parisi-Zhang universality class surface diffusion
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Theoretical study on aerosol deposition in a circular tube due to diffusion and thermophoresis in plug laminar flow neglecting coagulation
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作者 Xiaolin Liu Yijie Zhang +1 位作者 Yongwei Gao Xuming Wang 《Particuology》 2025年第9期198-206,共9页
Aerosol deposition from the plug laminar flow regime in a circular tube due to diffusion and thermophoresis is studied theoretically, and the aerosol concentration, mean concentration or deposition efficiency, and She... Aerosol deposition from the plug laminar flow regime in a circular tube due to diffusion and thermophoresis is studied theoretically, and the aerosol concentration, mean concentration or deposition efficiency, and Sherwood number are calculated and analyzed by using the analytical solutions based on the detailed comparison with the previous studies. The results show that aerosol concentration distributions for both mechanisms of individual diffusion and combined consideration of diffusion and thermophoresis are symmetrical. However, the axial concentration for the case of diffusion alone is maximal, the maximal values for deposition parameter larger than zero, which appears in the region of non-dimensional radial coordinate from 0 to 1. The large influence of thermophoresis on aerosol mean concentration is found from the detailed comparison, and the bigger of the transport distance and the deposition parameter, the smaller of the aerosol mean concentration. The Sherwood number decreases with the increase of axial coordinate for deposition parameter equal and larger than zero, and the bigger of the deposition parameter, the larger of the deposition velocity. 展开更多
关键词 Thermophoresis diffusional deposition Circular tube Plug flow
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