How to manufacture the high magnetic induction grain-oriented silicon steel(Hi-B steel)by the process featured with the primary recrystallization annealing was demonstrated,during which nitriding and decarburizing w...How to manufacture the high magnetic induction grain-oriented silicon steel(Hi-B steel)by the process featured with the primary recrystallization annealing was demonstrated,during which nitriding and decarburizing were simultaneously realized in laboratory.By the techniques of optical microscope,scanning electronic microscope and electron backscattered diffraction,both the microstructure and the texture in the samples were characterized.The samples had been subjected to nitriding to different nitrogen contents at two specified temperatures using the two defined microstructural parameters:the grain size inhomogeneity factorσ*and the texture factor AR.The former is the ratio of the mean value to standard deviation of grain sizes;the latter is the ratio of the total volume fraction of the harmful textures to that of beneficial textures including {110}〈001〉.When the N content increased from 0.0055%to 0.0330%after the annealing at both 835 and 875°C,the resultant recrystallized grain size decreased butσ*changed little;whilst the rise of annealing temperature from 835 to 875°C resulted in the increase in both grain size andσ*.Moreover,either the injected N content or temperature had insignificant influence on the components of primary recrystallization texture developed during annealing.However,the increase of temperature led to the decreases in both intensity and volume fraction of{001}〈120〉and{110}〈001〉textures but increases in the{114}〈481〉andγfiber textures and the resultant decrease of AR.展开更多
The surface oxide layer of grain-oriented electrical steels was investigated by scanning electron microscopy.The formation mechanism and the influence on the glass film of the surface oxide layer were analyzed by the ...The surface oxide layer of grain-oriented electrical steels was investigated by scanning electron microscopy.The formation mechanism and the influence on the glass film of the surface oxide layer were analyzed by the calculation of thermodynamics and kinetics.The surface oxide layer with 2.3μm in thickness is mainly composed of SiO_(2),a small amount of FeO and Fe_(2)SiO_(4).During the formation of surface oxide layer,the restriction factor was the diffusion of O in the oxide layer.At the initial stage of the decarburization annealing,FeO would be formed on the surface layer.SiO_(2) and silicate particles rapidly nucleated,grew and formed a granular oxide layer in the subsurface.As the oxidation layer thickens,the nucleation of new particles decreases,and the growth of oxide particles would be dominant.A lamellar oxide layer was formed between the surface oxide layer and the steel matrix,and eventually formed a typical three-layer structure.During the high temperature annealing,MgO mainly reacted with SiO_(2) and Fe_(2)SiO_(4) in the surface oxide layer to form Mg2SiO_(4) and Fe_(2)SiO_(4) would respond first,thus forming the glass film with average thickness of 4.87μm.展开更多
基金financially sponsored by the State Key Special Project of Key Basic Material Technical Promotion and Industrialization(2016YFB0300305)
文摘How to manufacture the high magnetic induction grain-oriented silicon steel(Hi-B steel)by the process featured with the primary recrystallization annealing was demonstrated,during which nitriding and decarburizing were simultaneously realized in laboratory.By the techniques of optical microscope,scanning electronic microscope and electron backscattered diffraction,both the microstructure and the texture in the samples were characterized.The samples had been subjected to nitriding to different nitrogen contents at two specified temperatures using the two defined microstructural parameters:the grain size inhomogeneity factorσ*and the texture factor AR.The former is the ratio of the mean value to standard deviation of grain sizes;the latter is the ratio of the total volume fraction of the harmful textures to that of beneficial textures including {110}〈001〉.When the N content increased from 0.0055%to 0.0330%after the annealing at both 835 and 875°C,the resultant recrystallized grain size decreased butσ*changed little;whilst the rise of annealing temperature from 835 to 875°C resulted in the increase in both grain size andσ*.Moreover,either the injected N content or temperature had insignificant influence on the components of primary recrystallization texture developed during annealing.However,the increase of temperature led to the decreases in both intensity and volume fraction of{001}〈120〉and{110}〈001〉textures but increases in the{114}〈481〉andγfiber textures and the resultant decrease of AR.
基金Financial supports from National Key Research and Development Program(No.2016YFB0300305)National Natural Science Foundation of China(No.51804003)are gratefully acknowledged.
文摘The surface oxide layer of grain-oriented electrical steels was investigated by scanning electron microscopy.The formation mechanism and the influence on the glass film of the surface oxide layer were analyzed by the calculation of thermodynamics and kinetics.The surface oxide layer with 2.3μm in thickness is mainly composed of SiO_(2),a small amount of FeO and Fe_(2)SiO_(4).During the formation of surface oxide layer,the restriction factor was the diffusion of O in the oxide layer.At the initial stage of the decarburization annealing,FeO would be formed on the surface layer.SiO_(2) and silicate particles rapidly nucleated,grew and formed a granular oxide layer in the subsurface.As the oxidation layer thickens,the nucleation of new particles decreases,and the growth of oxide particles would be dominant.A lamellar oxide layer was formed between the surface oxide layer and the steel matrix,and eventually formed a typical three-layer structure.During the high temperature annealing,MgO mainly reacted with SiO_(2) and Fe_(2)SiO_(4) in the surface oxide layer to form Mg2SiO_(4) and Fe_(2)SiO_(4) would respond first,thus forming the glass film with average thickness of 4.87μm.