Metalization is widely used in integrated circuit devices to connect millions of devices together. The success of metallization depends strongly on diffusion barrier technology, due to the interactions of metals with ...Metalization is widely used in integrated circuit devices to connect millions of devices together. The success of metallization depends strongly on diffusion barrier technology, due to the interactions of metals with surrounding materials. As device dimension further shrinks, diffusion barrier technology is facing more challenges and opening up new opportunities, particularly for chemical vapor deposition (CVD) process technology. CVD is attracting increased attention in advanced metallization mainly due to its capability in producing conformal thin films. In this review, we will focus our discussion on CVD processes for three most important classes of diffusion barriers: Ti, W and Ta-based diffusion banters. Examples from current literature will be examined.展开更多
Swimming has become a popular exercising and recreational activity in China but little is known about the disinfection by-products （DBPs） concentration levels in the pools. This study was conducted as a survey of th...Swimming has become a popular exercising and recreational activity in China but little is known about the disinfection by-products （DBPs） concentration levels in the pools. This study was conducted as a survey of the DBPs in China swimming pools, and to establish the correlations between the DBP concentrations and the pool water quality parameters. A total of 14 public indoor and outdoor pools in Beijing were included in the survey. Results showed that the median concentrations for total tfihalomethanes （TTHM）, nine haloacetic acids （HAA9）, chloral hydrate （CH）, four haloacetonitriles （HAN4）, 1,1- dichloropropanone, 1,1,1-trichloropropanone and trichlor- onitromethane were 33.8, 109.1, 30.1, 3.2, 0.3, 0.6 pg＇L-1 and below detection limit, respectively. The TTHM and HAA9 levels were in the same magnitude of that in many regions of the world. The levels of CH and nitrogenous DBPs were greatly higher than and were comparable to that in typical drinking water, respectively. Disinfection by chlorine dioxide or trichloroisocyanuric acid could sub- stantially lower the DBP levels. The outdoor pools had higher TTHM and HAA9 levels, but lower trihaloacetic acids （THAA） levels than the indoor pools. The TTHM and HAA9 concentrations could be moderately correlated with the free chlorine and total chlorine residuals but not with the total organic carbon （TOC） contents. When the DBP concentration levels from other survey studies were also included for statistical analysis, a good correlation could be established between the TTHM levels and the TOC concentration. The influence of chlorine residual on DBP levels could also be significant.展开更多
文摘Metalization is widely used in integrated circuit devices to connect millions of devices together. The success of metallization depends strongly on diffusion barrier technology, due to the interactions of metals with surrounding materials. As device dimension further shrinks, diffusion barrier technology is facing more challenges and opening up new opportunities, particularly for chemical vapor deposition (CVD) process technology. CVD is attracting increased attention in advanced metallization mainly due to its capability in producing conformal thin films. In this review, we will focus our discussion on CVD processes for three most important classes of diffusion barriers: Ti, W and Ta-based diffusion banters. Examples from current literature will be examined.
文摘Swimming has become a popular exercising and recreational activity in China but little is known about the disinfection by-products （DBPs） concentration levels in the pools. This study was conducted as a survey of the DBPs in China swimming pools, and to establish the correlations between the DBP concentrations and the pool water quality parameters. A total of 14 public indoor and outdoor pools in Beijing were included in the survey. Results showed that the median concentrations for total tfihalomethanes （TTHM）, nine haloacetic acids （HAA9）, chloral hydrate （CH）, four haloacetonitriles （HAN4）, 1,1- dichloropropanone, 1,1,1-trichloropropanone and trichlor- onitromethane were 33.8, 109.1, 30.1, 3.2, 0.3, 0.6 pg＇L-1 and below detection limit, respectively. The TTHM and HAA9 levels were in the same magnitude of that in many regions of the world. The levels of CH and nitrogenous DBPs were greatly higher than and were comparable to that in typical drinking water, respectively. Disinfection by chlorine dioxide or trichloroisocyanuric acid could sub- stantially lower the DBP levels. The outdoor pools had higher TTHM and HAA9 levels, but lower trihaloacetic acids （THAA） levels than the indoor pools. The TTHM and HAA9 concentrations could be moderately correlated with the free chlorine and total chlorine residuals but not with the total organic carbon （TOC） contents. When the DBP concentration levels from other survey studies were also included for statistical analysis, a good correlation could be established between the TTHM levels and the TOC concentration. The influence of chlorine residual on DBP levels could also be significant.
