Mo/Si multilayers were fabricated by using magnetron sputtering method at different background pressures:6×10-5 Torr,3×10-5 Torr,and 3×10-6 Torr.The reflectivity of the Mo/Si multilayers increased from ...Mo/Si multilayers were fabricated by using magnetron sputtering method at different background pressures:6×10-5 Torr,3×10-5 Torr,and 3×10-6 Torr.The reflectivity of the Mo/Si multilayers increased from 1.93% to 16.63%,and the center wavelength revealed a blue shift to 0.12 nm with the decrease of background pressure.Grazing incident X-ray diffraction(GIXRD) indicated that multilayers fabricated at high background pressure possessed better periodic structure and thinner Mo-on-Si interlayers.Low crystallization degree in(110) preferred the orientation of Mo layers and serious interdiffusion in the Mo/Si multilayers fabricated at low background pressure were observed by transmission electron microscopy(TEM).According to quantitative analysis of microstructural parameters,the Mo layers thickness and thickness ratio of Mo/Si multilayers both decreased and approached the design value gradually by the decrease of background pressure.In addition,the thicknesses of Mo-on-Si and Si-on-Mo interlayers were 1.17 nm and 0.85 nm respectively.It is suggested that the influence of background pressures on the microstructure has a critical role in determining the optical properties of Mo/Si multilayers.展开更多
基金supported by the National Natural Sciences Foundation of China (Grant No.50671042)the Open Project of State Key Laboratory of Applied Optics (Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences) (Grant No.201004)the Ph.D.Innovation Programs Foundation of Jiangsu Province (Grant No.CXZZ12_0671)
文摘Mo/Si multilayers were fabricated by using magnetron sputtering method at different background pressures:6×10-5 Torr,3×10-5 Torr,and 3×10-6 Torr.The reflectivity of the Mo/Si multilayers increased from 1.93% to 16.63%,and the center wavelength revealed a blue shift to 0.12 nm with the decrease of background pressure.Grazing incident X-ray diffraction(GIXRD) indicated that multilayers fabricated at high background pressure possessed better periodic structure and thinner Mo-on-Si interlayers.Low crystallization degree in(110) preferred the orientation of Mo layers and serious interdiffusion in the Mo/Si multilayers fabricated at low background pressure were observed by transmission electron microscopy(TEM).According to quantitative analysis of microstructural parameters,the Mo layers thickness and thickness ratio of Mo/Si multilayers both decreased and approached the design value gradually by the decrease of background pressure.In addition,the thicknesses of Mo-on-Si and Si-on-Mo interlayers were 1.17 nm and 0.85 nm respectively.It is suggested that the influence of background pressures on the microstructure has a critical role in determining the optical properties of Mo/Si multilayers.
