It is easy to apply lines in design drawings to create different styles, however, there is no guarantee that all the style lines drawn are able to be manufactured. In this paper, we focus on one undeliverable style to...It is easy to apply lines in design drawings to create different styles, however, there is no guarantee that all the style lines drawn are able to be manufactured. In this paper, we focus on one undeliverable style to enhance our understanding of the relationship between the design sketch and the pattern design process. In order to evidence that such style is unworkable, a systematic display of pattern development, and to be reinforced by mathematical evaluation, will be introduced and addressed. When one can easily detect design fault, waste of product development time can be minimized.展开更多
An algorithm is presented for computationally simulating collars and drafting patterns. The collar shape was modeled by three-dimensional Bezier patch. Changing the position of consol points of the patch can interacti...An algorithm is presented for computationally simulating collars and drafting patterns. The collar shape was modeled by three-dimensional Bezier patch. Changing the position of consol points of the patch can interactively control the collar shape. Using triangular surface developing method, patterns of various styles of stand collar and separating collar were drafted. As the subsystem of 3D apparel design system, an interactive collar design system is constructed. To inspect the practical usage, we reproduced the collars using these patterns drafted by the interactive collar design system.Comparing with simulated collars, the system demonstrated well and we found it is more reliable and accurate than the method of handwork.展开更多
文摘It is easy to apply lines in design drawings to create different styles, however, there is no guarantee that all the style lines drawn are able to be manufactured. In this paper, we focus on one undeliverable style to enhance our understanding of the relationship between the design sketch and the pattern design process. In order to evidence that such style is unworkable, a systematic display of pattern development, and to be reinforced by mathematical evaluation, will be introduced and addressed. When one can easily detect design fault, waste of product development time can be minimized.
文摘An algorithm is presented for computationally simulating collars and drafting patterns. The collar shape was modeled by three-dimensional Bezier patch. Changing the position of consol points of the patch can interactively control the collar shape. Using triangular surface developing method, patterns of various styles of stand collar and separating collar were drafted. As the subsystem of 3D apparel design system, an interactive collar design system is constructed. To inspect the practical usage, we reproduced the collars using these patterns drafted by the interactive collar design system.Comparing with simulated collars, the system demonstrated well and we found it is more reliable and accurate than the method of handwork.