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On-line detection of additive concentrations in acidic copper plating solution for metal interconnection by an electrochemical microfluidic workstation
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作者 Yi Zhao Ju-Xing Zeng +7 位作者 Jia-Qiang Yang Tao Song Ren Hu Jian-Jia Su Bo Zhang Fang-Zu Yang Dongping Zhan Lianhuan Han 《Industrial Chemistry & Materials》 2025年第5期607-617,共11页
On-line detection of additive concentrations in acidic copper(Cu)electroplating solution,including the suppressor,accelerator and leveler,is crucial for the industrial production of integrated circuit metal interconne... On-line detection of additive concentrations in acidic copper(Cu)electroplating solution,including the suppressor,accelerator and leveler,is crucial for the industrial production of integrated circuit metal interconnections.For this purpose,a portable electrochemical microfluidic workstation(EMW)is developed.The polymer electrochemical microfluidic chip is designed and fabricated by 3D printing,in which a liquid mixer is integrated with an electrochemical microcell.The asymmetrically distributed herringbone microstructures in the microchannels(width:400μm,height:300μm,length:4 cm)ensure the highly efficient mixture of solutions.In the electrochemical microcell,a 12.5μm radius platinum ultramicroelectrode(Pt UME)acts as the working electrode.Based on the suppressing or accelerating effects of the additives on Cu electroplating,the calibration curves can be obtained by the stripping charge of electrodeposited Cu.Thus,the concentration of each additive in the acidic Cu electroplating solution can be detected on line and adjusted in time.The solution volume needed for each additive is approximately 220μL.The detection error is lower than 10%,meeting the analytic requirements in industry.The automated EMW has the potential to replace the current manual cyclic voltammetry stripping(CVS)employed in lab analysis. 展开更多
关键词 Electrochemical microfluidic workstation On-line detection of additive concentration Microfluidic chip ULTRAMICROELECTRODE acidic copper electroplating
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