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A Compensation Mechanism for Semi-Insulating 6H-SiC Doped with Vanadium
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作者 王超 张义门 +2 位作者 张玉明 王悦湖 徐大庆 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第2期206-209,共4页
A model is presented to describe a compensation mechanism for semi-insulating 6H-SiC grown with the intentional doping of vanadium. Because we found nitrogen to be the principal shallow donor impurity in SiC by second... A model is presented to describe a compensation mechanism for semi-insulating 6H-SiC grown with the intentional doping of vanadium. Because we found nitrogen to be the principal shallow donor impurity in SiC by secondary ion mass spectroscopy (SIMS) measurements, semi-insulating properties in SiC are achieved by compensating the nitrogen donor with the vanadium deep acceptor level. The presence of different vanadium charge states V^3+ and V^4+ is detected by electron paramagnetic resonance and optical absorption measurements,which coincides with the results obtained by SIMS measurements. Both optical absorption and low temperature photoluminescence measurements reveal that the vanadium acceptor level is located at 0.62eV below the conduction band in 6H-SiC. 展开更多
关键词 6H-SIC SEMI-INSULATING vanadium doping COMPENSATION vanadium acceotor level
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