Lithium-ion capacitors(LICs) of achieving high power and energy density have garnered significant attention. However, the kinetics unbalance between anode and cathode can impede the application of LICs. Vanadium nitri...Lithium-ion capacitors(LICs) of achieving high power and energy density have garnered significant attention. However, the kinetics unbalance between anode and cathode can impede the application of LICs. Vanadium nitride(VN) with a high theoretical specific capacity(~ 1200 m Ah·g^(-1)) is a better pseudocapacitive anode to match the response of cathode in LICs. However, the insertion/extraction of Li-ions in VN's operation results in significant volume expansion. Herein, the VN/N-r GO-5composite that three-dimentional(3D) dicyandiamidederived-carbon(DDC) tightly wrapped VN quantum dots(VN QDTs) on two-dimentional(2D) reduced graphene oxid(r GO) was prepared by a facile strategy. The VN QDTs can reduce ion diffusion length and improve charge transfer kinetics. The 2D r GO as a template provides support for nanoparticle dispersion and improves electrical conductivity. The 3D DDC tightly encapsulated with VN QDTs mitigates agglomeration of VN particles as well as volume expansion. Correspondingly, the LICs with VN/Nr GO-5 composite as anode and activated carbon(AC) as cathode were fabricated, which exhibits a high energy density and power density. Such strategy provides a perspective for improving the electrochemical properties of LIC anode materials by suppressing volume expansion and enhancing conductivity.展开更多
采用反应磁控溅射制备了Ti Al N/VN纳米多层膜,并使用X射线衍射分析(XRD)、扫描电子显微镜(SEM)、透射电子显微镜(TEM)、纳米压痕仪和多功能摩擦磨损试验机对多层膜的微结构与力学和摩擦学性能进行了表征和分析。研究结果表明:不同调制...采用反应磁控溅射制备了Ti Al N/VN纳米多层膜,并使用X射线衍射分析(XRD)、扫描电子显微镜(SEM)、透射电子显微镜(TEM)、纳米压痕仪和多功能摩擦磨损试验机对多层膜的微结构与力学和摩擦学性能进行了表征和分析。研究结果表明:不同调制周期的Ti Al N/VN多层膜均呈典型的柱状晶生长结构,插入VN层并没有打断Ti Al N涂层柱状晶的生长。在一定调制周期下,Ti Al N/VN纳米多层膜中的Ti Al N和VN层之间能够形成共格生长结构,其硬度和弹性模量相比于Ti Al N单层膜均有显著提升,其中,Ti Al N(10 nm)/VN(10 nm)的硬度和弹性模量最大增量分别达到39.3%和40.9%。Ti Al N/VN纳米多层膜的强化主要与其共格界面生长结构有关。另外,Ti Al N单层膜的摩擦系数较高(~0.9),通过周期性地插入摩擦系数较低的VN层能够使得Ti Al N的摩擦系数大大降低,Ti Al N/VN纳米多层膜的摩擦系数最低为0.4。展开更多
基金financially supported by the National Natural Science Foundation of China (Nos.22005167 and 21905152)Shandong Provincial Natural Science Foundation of China (Nos.ZR2020QB125, ZR2020MB045 and ZR2022QE003)+2 种基金China Postdoctoral Science Foundation (Nos.2021M693256, 2021T140687 and 2022M713249)Qingdao Postdoctoral Applied Research Project, Taishan Scholar Project of Shandong Province of China (No.tsqn202211160)the Youth Innovation Team Project for Talent Introduction and Cultivation in Universities of Shandong Province。
文摘Lithium-ion capacitors(LICs) of achieving high power and energy density have garnered significant attention. However, the kinetics unbalance between anode and cathode can impede the application of LICs. Vanadium nitride(VN) with a high theoretical specific capacity(~ 1200 m Ah·g^(-1)) is a better pseudocapacitive anode to match the response of cathode in LICs. However, the insertion/extraction of Li-ions in VN's operation results in significant volume expansion. Herein, the VN/N-r GO-5composite that three-dimentional(3D) dicyandiamidederived-carbon(DDC) tightly wrapped VN quantum dots(VN QDTs) on two-dimentional(2D) reduced graphene oxid(r GO) was prepared by a facile strategy. The VN QDTs can reduce ion diffusion length and improve charge transfer kinetics. The 2D r GO as a template provides support for nanoparticle dispersion and improves electrical conductivity. The 3D DDC tightly encapsulated with VN QDTs mitigates agglomeration of VN particles as well as volume expansion. Correspondingly, the LICs with VN/Nr GO-5 composite as anode and activated carbon(AC) as cathode were fabricated, which exhibits a high energy density and power density. Such strategy provides a perspective for improving the electrochemical properties of LIC anode materials by suppressing volume expansion and enhancing conductivity.
文摘采用反应磁控溅射制备了Ti Al N/VN纳米多层膜,并使用X射线衍射分析(XRD)、扫描电子显微镜(SEM)、透射电子显微镜(TEM)、纳米压痕仪和多功能摩擦磨损试验机对多层膜的微结构与力学和摩擦学性能进行了表征和分析。研究结果表明:不同调制周期的Ti Al N/VN多层膜均呈典型的柱状晶生长结构,插入VN层并没有打断Ti Al N涂层柱状晶的生长。在一定调制周期下,Ti Al N/VN纳米多层膜中的Ti Al N和VN层之间能够形成共格生长结构,其硬度和弹性模量相比于Ti Al N单层膜均有显著提升,其中,Ti Al N(10 nm)/VN(10 nm)的硬度和弹性模量最大增量分别达到39.3%和40.9%。Ti Al N/VN纳米多层膜的强化主要与其共格界面生长结构有关。另外,Ti Al N单层膜的摩擦系数较高(~0.9),通过周期性地插入摩擦系数较低的VN层能够使得Ti Al N的摩擦系数大大降低,Ti Al N/VN纳米多层膜的摩擦系数最低为0.4。
