A long life election spin resonance (ESR) signal at g=2.0006 was observed in the normal lens epithelium and cortical fibers. During ultraviolet (UV) exposure, a new ESR signal at g = 2.0060 was found in the lens epith...A long life election spin resonance (ESR) signal at g=2.0006 was observed in the normal lens epithelium and cortical fibers. During ultraviolet (UV) exposure, a new ESR signal at g = 2.0060 was found in the lens epithelium. But this specific signal was not detected in the lens cortical fibers. This suggested that lens epithelial cells were more susceptible to the free radical formation which was induced by UV light. By means of ESR spin probe oxymetry, the oxygen uptake of lens epithelial cells was meas...展开更多
The effect of ultraviolet radiation on entomopathogenic fungi can be very prejudicial for causing damage to the conidia. Formulations can help protecting these fungal structures against radiation. The objective of thi...The effect of ultraviolet radiation on entomopathogenic fungi can be very prejudicial for causing damage to the conidia. Formulations can help protecting these fungal structures against radiation. The objective of this study was to evaluate the effect of UV radiation on pure and encapsulated conidia <i>Beauveria bassiana</i> and <i>Metarhizium anisopliae sensu lato</i>, and to evaluate their pathogenicity on the sugarcane borer, <i>Diatraea saccharalis</i>. The pure conidia and the sodium alginate capsules containing the fungi were submitted to the ultraviolet radiation in different temperatures and exposure times. On the pure conidia, the radiation had a deleterious effect after 5 minutes of exposure, going from 94% to 52% germination for <i>B. bassiana</i> and from 96% to 54% for <i>M. anisopliae</i>. The alginate formulation protected the <i>B. bassiana</i> conidia against the radiation in all times they were evaluated (15 minutes to 48 hours), because, even after exposure, the fungi remained viable. The dry encapsulated conidia <i>B. bassiana</i> caused 79.6% mortality of the studied pest and the <i>M. anisopliae</i> caused only 10%.展开更多
The effect of ultraviolet radiation on entomopathogenic fungi can be very prejudicial for causing damage to the conidia. Formulations can help protecting these fungal structures against radiation. The objective of thi...The effect of ultraviolet radiation on entomopathogenic fungi can be very prejudicial for causing damage to the conidia. Formulations can help protecting these fungal structures against radiation. The objective of this study was to evaluate the effect of UV radiation on pure and encapsulated conidia Beauveria bassiana and Metarhizium anisopliae sensu lato, and to evaluate their pathogenicity on the sugarcane borer, Diatraea saccharalis. The pure conidia and the sodium alginate capsules containing the fungi were submitted to the ultraviolet radiation in different temperatures and exposure times. On the pure conidia, the radiation had a deleterious effect after 5 minutes of exposure, going from 94% to 52% germination for B. bassiana and from 96% to 54% for M. anisopliae. The alginate formulation protected the B. bassiana conidia against the radiation in all times they were evaluated (15 minutes to 48 hours), because, even after exposure, the fungi remained viable. The dry encapsulated conidia B. bassiana caused 79.6% mortality of the studied pest and the M. anisopliae caused only 10%.展开更多
AIM： To investigate the prevalence of and risk factors for lens opacities in populations living at two different altitudes in China.·METHODS： A total of 813 subjects aged ≥40y in Lhasa（Tibet Autonomous Region...AIM： To investigate the prevalence of and risk factors for lens opacities in populations living at two different altitudes in China.·METHODS： A total of 813 subjects aged ≥40y in Lhasa（Tibet Autonomous Region, China. Altitude： 3658 m） and Shaoxing（Zhejiang Province, China. Altitude： 15 m） were underwent eye examinations and interviewed in this cross-sectional study. Participants＇ lens opacities were graded according to the Lens Opacities Classification System II（LOCS II） and the types of opacities with LOCS II scores ≥2 were determined. Univariate and stepwise logistic regression were used to evaluate the associations of independent risk factors with lens opacities.· RESULTS： Lens opacities were significantly more prevalent in the high-altitude than in the low-altitude area（χ2=10.54, P 〈0.001）. Lens opacities appear to develop earlier in people living at high than at low altitude. The main types of lens opacity in Lhasa and Shaoxing were mixed（23.81%） and cortical（17.87%）,respectively. Independent risk factors associated with all lens opacities were age, ultraviolet（UV） radiation exposure,and educational level. Compared with participants aged40-49 y, the risk of lens opacities increased gradually from 2 to 85 times per 10 y [odds ratio（OR）=2.168-84.731,P 〈0.05）. The risk of lens opacities was about two times greater in participants with the highest UV exposure than in those with the lowest exposure（OR=2.606, P =0.001）.Educational level was inversely associated with lensopacities; literacy deceased the risk by about 25%compared with illiteracy（OR=0.758, P =0.041）.·CONCLUSION： Old age, higher UV exposure and lower educational level are important risk factors for the development of lens opacities. Lens opacities are more prevalent among high-altitude than low-altitude inhabitants.展开更多
Surface plasmonic polaritons(SPPs)break Abbe's diffraction limit in the near field and provide a promising solution for high-resolution nanolithography without reducing illuminating wavelength.However,the resoluti...Surface plasmonic polaritons(SPPs)break Abbe's diffraction limit in the near field and provide a promising solution for high-resolution nanolithography without reducing illuminating wavelength.However,the resolution of the normal plasmonic lithography method based on ultraviolet exposure of a photoresist heavily relies on the size of the elaborate nanostructures,which usually require precise nanofabrication.Meanwhile,a high-cost pulsed laser is required as the light source to further reduce the lithography linewidth.Here,we establish a highresolution and low-cost scanning probe nanolithography system based on the infrared surface plasmons.An easy-fabrication probe is designed by tailoring four concentric annular slits with a moderate width of 200 nm,which couples the incident radially polarized beam into SPPs,resulting in an ultra-strong spot at the tip apex.Such superfocusing mode is demonstrated to apply to the thermal field through the optical-thermal effect so as to cause the heat accumulation with a more restricted heating area,which is utilized for the thermal probe nanolithography.Experimental results indicate that the subwavelength feature with a linewidth down to 13 nm is realized using an inexpensive 1064 nm wavelength continuous-wave laser.Our scheme shows great potential in fabrication of planar optical elements with small size and high flexibility,and can also find extensive applications in areas such as single-molecule spectra,biological detection,and optical microscopy.展开更多
基金The work was sponsored by National Natural Science Foundation of China (NSFC)
文摘A long life election spin resonance (ESR) signal at g=2.0006 was observed in the normal lens epithelium and cortical fibers. During ultraviolet (UV) exposure, a new ESR signal at g = 2.0060 was found in the lens epithelium. But this specific signal was not detected in the lens cortical fibers. This suggested that lens epithelial cells were more susceptible to the free radical formation which was induced by UV light. By means of ESR spin probe oxymetry, the oxygen uptake of lens epithelial cells was meas...
文摘The effect of ultraviolet radiation on entomopathogenic fungi can be very prejudicial for causing damage to the conidia. Formulations can help protecting these fungal structures against radiation. The objective of this study was to evaluate the effect of UV radiation on pure and encapsulated conidia <i>Beauveria bassiana</i> and <i>Metarhizium anisopliae sensu lato</i>, and to evaluate their pathogenicity on the sugarcane borer, <i>Diatraea saccharalis</i>. The pure conidia and the sodium alginate capsules containing the fungi were submitted to the ultraviolet radiation in different temperatures and exposure times. On the pure conidia, the radiation had a deleterious effect after 5 minutes of exposure, going from 94% to 52% germination for <i>B. bassiana</i> and from 96% to 54% for <i>M. anisopliae</i>. The alginate formulation protected the <i>B. bassiana</i> conidia against the radiation in all times they were evaluated (15 minutes to 48 hours), because, even after exposure, the fungi remained viable. The dry encapsulated conidia <i>B. bassiana</i> caused 79.6% mortality of the studied pest and the <i>M. anisopliae</i> caused only 10%.
文摘The effect of ultraviolet radiation on entomopathogenic fungi can be very prejudicial for causing damage to the conidia. Formulations can help protecting these fungal structures against radiation. The objective of this study was to evaluate the effect of UV radiation on pure and encapsulated conidia Beauveria bassiana and Metarhizium anisopliae sensu lato, and to evaluate their pathogenicity on the sugarcane borer, Diatraea saccharalis. The pure conidia and the sodium alginate capsules containing the fungi were submitted to the ultraviolet radiation in different temperatures and exposure times. On the pure conidia, the radiation had a deleterious effect after 5 minutes of exposure, going from 94% to 52% germination for B. bassiana and from 96% to 54% for M. anisopliae. The alginate formulation protected the B. bassiana conidia against the radiation in all times they were evaluated (15 minutes to 48 hours), because, even after exposure, the fungi remained viable. The dry encapsulated conidia B. bassiana caused 79.6% mortality of the studied pest and the M. anisopliae caused only 10%.
基金Supported by the Natural Science Foundation of Liaoning Province,China(No.2014021009)
文摘AIM： To investigate the prevalence of and risk factors for lens opacities in populations living at two different altitudes in China.·METHODS： A total of 813 subjects aged ≥40y in Lhasa（Tibet Autonomous Region, China. Altitude： 3658 m） and Shaoxing（Zhejiang Province, China. Altitude： 15 m） were underwent eye examinations and interviewed in this cross-sectional study. Participants＇ lens opacities were graded according to the Lens Opacities Classification System II（LOCS II） and the types of opacities with LOCS II scores ≥2 were determined. Univariate and stepwise logistic regression were used to evaluate the associations of independent risk factors with lens opacities.· RESULTS： Lens opacities were significantly more prevalent in the high-altitude than in the low-altitude area（χ2=10.54, P 〈0.001）. Lens opacities appear to develop earlier in people living at high than at low altitude. The main types of lens opacity in Lhasa and Shaoxing were mixed（23.81%） and cortical（17.87%）,respectively. Independent risk factors associated with all lens opacities were age, ultraviolet（UV） radiation exposure,and educational level. Compared with participants aged40-49 y, the risk of lens opacities increased gradually from 2 to 85 times per 10 y [odds ratio（OR）=2.168-84.731,P 〈0.05）. The risk of lens opacities was about two times greater in participants with the highest UV exposure than in those with the lowest exposure（OR=2.606, P =0.001）.Educational level was inversely associated with lensopacities; literacy deceased the risk by about 25%compared with illiteracy（OR=0.758, P =0.041）.·CONCLUSION： Old age, higher UV exposure and lower educational level are important risk factors for the development of lens opacities. Lens opacities are more prevalent among high-altitude than low-altitude inhabitants.
基金National Key Research&Development Program of China(2023YFB3811400)Young Scientists Fund of National Natural Science Foundation of China(52303368)Financial Program of BJAST(25CE-YS-05,25CB011-03)。
文摘Surface plasmonic polaritons(SPPs)break Abbe's diffraction limit in the near field and provide a promising solution for high-resolution nanolithography without reducing illuminating wavelength.However,the resolution of the normal plasmonic lithography method based on ultraviolet exposure of a photoresist heavily relies on the size of the elaborate nanostructures,which usually require precise nanofabrication.Meanwhile,a high-cost pulsed laser is required as the light source to further reduce the lithography linewidth.Here,we establish a highresolution and low-cost scanning probe nanolithography system based on the infrared surface plasmons.An easy-fabrication probe is designed by tailoring four concentric annular slits with a moderate width of 200 nm,which couples the incident radially polarized beam into SPPs,resulting in an ultra-strong spot at the tip apex.Such superfocusing mode is demonstrated to apply to the thermal field through the optical-thermal effect so as to cause the heat accumulation with a more restricted heating area,which is utilized for the thermal probe nanolithography.Experimental results indicate that the subwavelength feature with a linewidth down to 13 nm is realized using an inexpensive 1064 nm wavelength continuous-wave laser.Our scheme shows great potential in fabrication of planar optical elements with small size and high flexibility,and can also find extensive applications in areas such as single-molecule spectra,biological detection,and optical microscopy.
