Two kinds of novel sulfhydryl functionalized covalent organic frameworks were fabricated as adsorbents for the removal of ultra-trace concentrations of Hg^(2+)from water.The two kinds of sulfhydryl functionalized cova...Two kinds of novel sulfhydryl functionalized covalent organic frameworks were fabricated as adsorbents for the removal of ultra-trace concentrations of Hg^(2+)from water.The two kinds of sulfhydryl functionalized covalent organic frameworks were obtained via a thiol-ene click reaction between the thiol groups of trithiocyanuric acid(TTC)or bismuththiol(BMT)and vinyl groups on the surface of covalent organic frameworks.The material structure was characterized by XRD,SEM,EDS,FT-IR,BET,and TG analysis.Due to their rich sulfur content,both adsorbents(COF-SH-1 and COF-SH-2)exhibited a high level of selective Hg^(2+)removal from aqueous solution with maximum adsorption capacities of 763.4 mg g^(-1) and526.3 mg g^(-1),respectively.Furthermore,in the presence of ultra-low concentrations of Hg^(2+)both materials exhibited excellent performance,achieving rapid Hg^(2+)removal at concentrations from 10μg L^(-1) to less than 0.02 ng L^(-1).Analysis of the adsorption mechanism indicates that the sulfur containing chelating groups exhibit a strong binding capacity for Hg^(2+).Results show that the structure determines the performance,with the amount of adsorption sites being related to the adsorption capacity.Therefore,as sulfhydryl functionalized covalent organic frameworks contain an abundance of adsorption sites,these materials can effectively achieve the removal of ultra-low trace Hg^(2+)concentrations and have promising future application potential for the environmental detection of heavy metals.展开更多
The semiconductor manufacturing industry imposes stringent requirements on the metal ion content of photoresist resin monomers.Tris(2-carboxyethyl)isocyanurate(H_(3)tci),a critical raw material for photoresist resin m...The semiconductor manufacturing industry imposes stringent requirements on the metal ion content of photoresist resin monomers.Tris(2-carboxyethyl)isocyanurate(H_(3)tci),a critical raw material for photoresist resin monomers,inevitably incorporates metal ions during production.However,its inherent carboxyethyl groups form stable coordination complexes with Cr(Ⅲ),hindering the semiconductor-grade resin monomer production.To achieve the ultra-deep removal of Cr(Ⅲ)at ultra-trace concentrations,inspired by the hard–soft-acid–base theory,we systematically modulated the electron-rich sulfonic acid group on polymers via controlled sulfonation conditions to achieve a novel series of adsorption materials(St)with ultra-high Cr(Ⅲ)adsorption affinity.The adsorption–recrystallization process using 6 g of St-V-15 could reduce the Cr(Ⅲ)concentration in a solution containing 1 g of H_(3)tci from 840 ppb to 27.5 ppb.Furthermore,St-V-15 exhibited a maximum adsorption capacity of 145 mg g^(−1)calculated using the Langmuir model and a rapid initial adsorption rate of 82.92 mg g^(−1)min^(−1)at 333 K.Additionally,St-V-15 demonstrated exceptional selectivity for Cr(Ⅲ)over competing ions(e.g.,K(Ⅰ),Mg(Ⅱ),Na(Ⅰ)and Zn(Ⅱ))and maintained stable performance over at least 10 adsorption–desorption cycles.The superior performance originated from the chelation between Cr(Ⅲ)and the sites of O atoms(S–O and S=O)combined with the electrostatic interaction between deprotonated sulfonic acid groups and Cr(Ⅲ).These results position St-V-15 as a promising adsorption material for ultra-trace Cr(Ⅲ)removal in H_(3)tci,offering a cost-effective solution for semiconductor-grade resin monomer production for the very first time.展开更多
In this paper, a novel micro drop solvent extraction technique jonied with low temperature ETV-ICP-AES for ultra trace element analysis is reported. The apparatus of micro drop solvent extraction was designed, and pre...In this paper, a novel micro drop solvent extraction technique jonied with low temperature ETV-ICP-AES for ultra trace element analysis is reported. The apparatus of micro drop solvent extraction was designed, and preliminary investigation was made for the extraction of ultra trace La by a micro drop of 0.05 mol/L PMBP-benzene(2 μL). It was found that 500-fold concentration of ultra-trace La in 1 mL solution was achieved in 0.2 mL of glass chamber by a single micro drop of PMBP-benzene suspended on the tip of a 10 μL of microsyringe. The future development of micro drop solvent extraction technique in atomic spectrometry was briefly discussed.展开更多
基金financially supported by the Fundamental Research Funds for the Central Universities(531118010314)Environmental Protection Science and Technology Project of Hunan Province(20190011)Key R&D Program of Hunan Province(2019SK2281)。
文摘Two kinds of novel sulfhydryl functionalized covalent organic frameworks were fabricated as adsorbents for the removal of ultra-trace concentrations of Hg^(2+)from water.The two kinds of sulfhydryl functionalized covalent organic frameworks were obtained via a thiol-ene click reaction between the thiol groups of trithiocyanuric acid(TTC)or bismuththiol(BMT)and vinyl groups on the surface of covalent organic frameworks.The material structure was characterized by XRD,SEM,EDS,FT-IR,BET,and TG analysis.Due to their rich sulfur content,both adsorbents(COF-SH-1 and COF-SH-2)exhibited a high level of selective Hg^(2+)removal from aqueous solution with maximum adsorption capacities of 763.4 mg g^(-1) and526.3 mg g^(-1),respectively.Furthermore,in the presence of ultra-low concentrations of Hg^(2+)both materials exhibited excellent performance,achieving rapid Hg^(2+)removal at concentrations from 10μg L^(-1) to less than 0.02 ng L^(-1).Analysis of the adsorption mechanism indicates that the sulfur containing chelating groups exhibit a strong binding capacity for Hg^(2+).Results show that the structure determines the performance,with the amount of adsorption sites being related to the adsorption capacity.Therefore,as sulfhydryl functionalized covalent organic frameworks contain an abundance of adsorption sites,these materials can effectively achieve the removal of ultra-low trace Hg^(2+)concentrations and have promising future application potential for the environmental detection of heavy metals.
基金supported by the National Natural Science Foundation of China(Grant No.22478077,22278077).
文摘The semiconductor manufacturing industry imposes stringent requirements on the metal ion content of photoresist resin monomers.Tris(2-carboxyethyl)isocyanurate(H_(3)tci),a critical raw material for photoresist resin monomers,inevitably incorporates metal ions during production.However,its inherent carboxyethyl groups form stable coordination complexes with Cr(Ⅲ),hindering the semiconductor-grade resin monomer production.To achieve the ultra-deep removal of Cr(Ⅲ)at ultra-trace concentrations,inspired by the hard–soft-acid–base theory,we systematically modulated the electron-rich sulfonic acid group on polymers via controlled sulfonation conditions to achieve a novel series of adsorption materials(St)with ultra-high Cr(Ⅲ)adsorption affinity.The adsorption–recrystallization process using 6 g of St-V-15 could reduce the Cr(Ⅲ)concentration in a solution containing 1 g of H_(3)tci from 840 ppb to 27.5 ppb.Furthermore,St-V-15 exhibited a maximum adsorption capacity of 145 mg g^(−1)calculated using the Langmuir model and a rapid initial adsorption rate of 82.92 mg g^(−1)min^(−1)at 333 K.Additionally,St-V-15 demonstrated exceptional selectivity for Cr(Ⅲ)over competing ions(e.g.,K(Ⅰ),Mg(Ⅱ),Na(Ⅰ)and Zn(Ⅱ))and maintained stable performance over at least 10 adsorption–desorption cycles.The superior performance originated from the chelation between Cr(Ⅲ)and the sites of O atoms(S–O and S=O)combined with the electrostatic interaction between deprotonated sulfonic acid groups and Cr(Ⅲ).These results position St-V-15 as a promising adsorption material for ultra-trace Cr(Ⅲ)removal in H_(3)tci,offering a cost-effective solution for semiconductor-grade resin monomer production for the very first time.
文摘In this paper, a novel micro drop solvent extraction technique jonied with low temperature ETV-ICP-AES for ultra trace element analysis is reported. The apparatus of micro drop solvent extraction was designed, and preliminary investigation was made for the extraction of ultra trace La by a micro drop of 0.05 mol/L PMBP-benzene(2 μL). It was found that 500-fold concentration of ultra-trace La in 1 mL solution was achieved in 0.2 mL of glass chamber by a single micro drop of PMBP-benzene suspended on the tip of a 10 μL of microsyringe. The future development of micro drop solvent extraction technique in atomic spectrometry was briefly discussed.
