A novel multi-tube photoreactor with 0.0188m3 valid reaction volume was constructed in pilot-scale. This rectangular reactor consisted of 13 regularly distributed silica glass tubes coating with TiO2 thin film photo-c...A novel multi-tube photoreactor with 0.0188m3 valid reaction volume was constructed in pilot-scale. This rectangular reactor consisted of 13 regularly distributed silica glass tubes coating with TiO2 thin film photo-catalyst. Total active area of TiO2 thin film is 0.3916m2. The ratio of surface area to volume achieves 20.8m-1. Photocatalytic experiment of phenol red demonstrates that the apparent reaction rate constant (k) is 0.074 65 h-1 and 0.16502h-1 for reaction system with and without micro-bubbles mixing. The corresponding apparent quantum efficiency (a) is 8.1771 X 10-7g.J-1 and 4.9036 x 10-7g-J-1, respectively. COD value of reactant could decrease to 17mg.L-1 and high performance liquid chromatography (HPLC) only shows two absorption peaks in 24 h pho-tocatalytic process time, so this photoreactor has good photomineralization effect. Experimental results reveal that photocatalytic destruction of organics is possible by using the multi-tube photoreactor.展开更多
With rapid progressive application of TiO2 thin films, magnetron sputtering becomes a very interesting method to prepare such multi-functional thin films. This paper focuses on influences of various deposition process...With rapid progressive application of TiO2 thin films, magnetron sputtering becomes a very interesting method to prepare such multi-functional thin films. This paper focuses on influences of various deposition processes and deposition rate on the structures and properties of TiO2 thin films. Anatase, rutile or amorphous TiO2 films with various crystalline structures and different photocatalytic, optical and electrical properties can be produced by varying sputtering gases, substrate temperature, annealing process, deposition rate and the characteristics of magnetron sputtering. This may in turn affect the functions of TiO2 films in many applications. Furthermore, TiO2-based composites films can overcome many limitations and improve the properties of TiO2 films.展开更多
TiO2 thin film has attracted considerable attention in recent years, due to its different refractive index and transparency with amorphous and different crysta ls in the visible and near-infrared wavelength region, hi...TiO2 thin film has attracted considerable attention in recent years, due to its different refractive index and transparency with amorphous and different crysta ls in the visible and near-infrared wavelength region, high dielectric constant, wide band gap, high wear resistance and stability, etc, for which make it being used in many fields. This paper aims to investigate the optical characterizatio n of thin film TiO2 on silicon wafer. The TiO2 thin films were prepared by DC re active magnetron sputtering process from Ti target. The reflectivity of the film s was measured by UV-3101PC, and the index of refraction (n) and extinction coef ficient (k) were measured by n & k Analyzer 1200.展开更多
The microstructure properties of the sol-gel derived TiO2 films were studied by the atomic force microscopy (AFM). The films were prepared by dip coating process. The optical properties of the films were explained on ...The microstructure properties of the sol-gel derived TiO2 films were studied by the atomic force microscopy (AFM). The films were prepared by dip coating process. The optical properties of the films were explained on the basis of the microstructure of the films.展开更多
Ag TiO 2 thin films were prepared on glasses.The morphology and structure of Ag TiO 2 films were investigated by XRD, SEM and FT IR.The photocatalytic and hydrophilic properties of Ag TiO 2 thin films were also...Ag TiO 2 thin films were prepared on glasses.The morphology and structure of Ag TiO 2 films were investigated by XRD, SEM and FT IR.The photocatalytic and hydrophilic properties of Ag TiO 2 thin films were also evaluated by examining photocatalytic degradation dichlorophos under sunlight illumination and the change of contact angle respectively.The research results show that the Ag TiO 2 thin film is mainly composed of 20-100nm Ag and TiO 2 particles.The Ag TiO 2 thin films possess a super hydrophilic ability and higher photocatalytic activity than that of pure TiO 2 thin film.展开更多
TiO2 thin film was prepared on Si substrate by plasma chemical vapor deposition （PCVD） system and the morphologies of ZiO2 thin film were controlled by adjusting the initial precursor concentration. As the initial t...TiO2 thin film was prepared on Si substrate by plasma chemical vapor deposition （PCVD） system and the morphologies of ZiO2 thin film were controlled by adjusting the initial precursor concentration. As the initial titanium tetra-isopropoxide （TTIP） concentration increases in PCVD reactor, the shapes of TiO2 particles generated in PCVD reactor change from the spherical small-sized particles around 20 nm and spherical large-sized particles around 60 nm to aggregate particles around 100 nm. The TiO2 particles with different shapes deposit on the substrate and become the main building blocks of resulting TiO2 thin film. We observed the TiO2 thin film with smooth morphology at low initial TTIP concentration, granular morphology at medium initial TTIP concentration, and columnar morphology at high initial TTIP concentration. It is proposed that we can prepare the TiO2 thin film with controlled morphologies in one-step process just by adjusting the initial precursor concentration in PCVD .展开更多
Uniform crystalline TiO2 thin films were coated on silica glass fibers by liquid phase deposition from aqueous solution of ammonium hexafluorotitanate at low temperature. TiO2 thin films and nanopowders were prepared ...Uniform crystalline TiO2 thin films were coated on silica glass fibers by liquid phase deposition from aqueous solution of ammonium hexafluorotitanate at low temperature. TiO2 thin films and nanopowders were prepared by adding H3BO3 into （NH4）2TiF6 solution supersaturated with anatase nano-crystalline TiO2 at 40 ℃. The effects of the deposition conditions on the surface morphology, section morphology, thickness of the deposited TiO2 thin films were investigated. The results indicate that the growth rate and particle size of the thin films were controlled by both the deposition conditions and the amount of anatase nano-crystalline TiO2.展开更多
This paper experimentally and theoretically investigates the effect of the underlayer medium on tuning of the surface plasmon resonance （SPR） wavelength of silver island films, and the effect of substrate temperatur...This paper experimentally and theoretically investigates the effect of the underlayer medium on tuning of the surface plasmon resonance （SPR） wavelength of silver island films, and the effect of substrate temperature on the morphologies and optical properties of the films. From the absorption spectra of single Ag with various thickness and overcoated （Ag/TiO2） films deposited on glass substrates at various substrate temperatures by RF magnetron sputtering, we demonstrate that the surface plasmon resonance wavelength can be made tunable by changing the underlayer medium, the thickness of metal layer and the substrate temperature. By varying substrate temperatures, the interparticle coupling effects on plasmon resonances of nanosilver particles enhance as the spacing between the particles reduces. When the substrate temperature is up to 500 ℃, the absorption peak decreases sharply and shifts to shorter wavelength side due to the severe coalescence between silver islands in the film.展开更多
Transparent TiO2 thin films were successfully prepared on high purity silica substrates by DC reactive magnetron sputtering method and annealed at different temperatures. The effects of the annealing temperature （300...Transparent TiO2 thin films were successfully prepared on high purity silica substrates by DC reactive magnetron sputtering method and annealed at different temperatures. The effects of the annealing temperature （300-600 ℃） on crystalline structure, morphology, and photocatalytic activity of the TiO2 thin films were discussed. The photocatalytic activity of the films was evaluated by photodegradation of methylene blue solution. With increasing annealing temperature, the photocatalytic activity of the TiO2 thin films gradually increased because of the improvement of crystallization of anatase TiO2 thin films. At 500 ℃, the TiO2 thin film shows the highest photocatalytic activity due to the improvement of crystallization of anatase TiO2 thin films. When the annealing temperature increases to 600 ℃, the photocatalytic activity of thin film decreases owing to the formation of rutile phase and the decrease of surface area.展开更多
Laser induced periodic surface structures(LIPSS)represent a kind of top down approach to produce highly reproducible nano/microstructures without going for any sophisticated process of lithography.This method is much ...Laser induced periodic surface structures(LIPSS)represent a kind of top down approach to produce highly reproducible nano/microstructures without going for any sophisticated process of lithography.This method is much simpler and cost effective.In this work,LIPSS on Si surfaces were generated using femtosecond laser pulses of 800 nm wavelength.Photocatalytic substrates were prepared by depositing TiO2 thin films on top of the structured and unstructured Si wafer.The coatings were produced by sputtering from a Ti target in two different types of oxygen atmospheres.In first case,the oxygen pressure within the sputtering chamber was chosen to be high(3×10^–2 mbar)whereas it was one order of magnitude lower in second case(2.1×10^–3 mbar).In photocatalytic dye decomposition study of Methylene blue dye it was found that in the presence of LIPSS the activity can be enhanced by 2.1 and 3.3 times with high pressure and low pressure grown TiO2 thin films,respectively.The increase in photocatalytic activity is attributed to the enlargement of effective surface area.In comparative study,the dye decomposition rates of TiO2 thin films grown on LIPSS are found to be much higher than the value for standard reference thin film material Pilkington Activ^TM.展开更多
Ag-TiO2 nanostructured thin films with silver volume fraction of 0–20% were deposited on silicon and quartz substrates by RF magnetron sputtering and annealed in ambient air at 950°C for 1 h. The phase structure...Ag-TiO2 nanostructured thin films with silver volume fraction of 0–20% were deposited on silicon and quartz substrates by RF magnetron sputtering and annealed in ambient air at 950°C for 1 h. The phase structure and surface topography of the films were characterized by X-ray diffractometer and transmission electron microscope. Photocatalytic activity of the films was evaluated by light induced degradation of methyl orange (C14H14N3NaO3S) solution using a high pressure mercury lamp as lamp-house. The relation of photocatalytic activity and silver content was studied in detail. It was found that silver content influences phase structure of TiO2 thin films, and silver in the films is metallic Ag (Ag0). With increasing silver content from 0 to 20 vol%, photocatalytic activity of the films increases first and then decreases. A suitable amount (2.5–5 vol%) silver addition can significantly enhance the photocatalytic activity of TiO2 films. The enhanced photocatalytic activity was mainly attributed to the extension of visible light absorption region of the films, the presence of anatase phase, the increase of oxy-gen anion radicals O2? and reactive center of surface Ti3+, and the better separation between electrons and holes on the films surface.展开更多
Abstract： Surface roughness by peaks and depressions on the surface of titanium dioxide （TiO2） thin film, which was widely used for an antireflection coating of optical systems, caused the extinction coefficient in...Abstract： Surface roughness by peaks and depressions on the surface of titanium dioxide （TiO2） thin film, which was widely used for an antireflection coating of optical systems, caused the extinction coefficient increase and affected the properties of optical system. Chemical mechanical polishing （CMP） is a very important method for surface smoothing. In this polishing experiment, we used self-formulated weakly alkaline slurry. Other process parameters were working pressure, slurry flow rate, head speed, and platen speed. In order to get the best surface roughness （1.16 A, the scanned area was 10 × 10 μm2） and a higher polishing rate （60.8 nm/min）, the optimal parameters were： pressure, 1 psi; slurry flow rate, 250 mL/min; polishing head speed, 80 rpm; platen speed, 87 rpm.展开更多
A chemical mechanical polishing （CMP） process was selected to smooth TiO2 thin film surface and improve the removal rate. Meanwhile, the optimal process conditions were used in TiO2 thin film CME The effects of sili...A chemical mechanical polishing （CMP） process was selected to smooth TiO2 thin film surface and improve the removal rate. Meanwhile, the optimal process conditions were used in TiO2 thin film CME The effects of silica sols concentration, slurry pH, chelating agent and active agent concentration on surface roughness and material removal rate were investigated. Our experimental results indicated that we got lower surface roughness （1.26 A, the scanned area was 10 × 10 μm2） and higher polishing rate （65.6 nm/min）, the optimal parameters were： silica sols concentration 8.0%, pH value 9.0, active agent concentration 50 mL/L, chelating agent concentration 10 mL/L, respectively.展开更多
基金Supported by the Natural Science Foundation of Jiangsu Province (JH01-010).
文摘A novel multi-tube photoreactor with 0.0188m3 valid reaction volume was constructed in pilot-scale. This rectangular reactor consisted of 13 regularly distributed silica glass tubes coating with TiO2 thin film photo-catalyst. Total active area of TiO2 thin film is 0.3916m2. The ratio of surface area to volume achieves 20.8m-1. Photocatalytic experiment of phenol red demonstrates that the apparent reaction rate constant (k) is 0.074 65 h-1 and 0.16502h-1 for reaction system with and without micro-bubbles mixing. The corresponding apparent quantum efficiency (a) is 8.1771 X 10-7g.J-1 and 4.9036 x 10-7g-J-1, respectively. COD value of reactant could decrease to 17mg.L-1 and high performance liquid chromatography (HPLC) only shows two absorption peaks in 24 h pho-tocatalytic process time, so this photoreactor has good photomineralization effect. Experimental results reveal that photocatalytic destruction of organics is possible by using the multi-tube photoreactor.
文摘With rapid progressive application of TiO2 thin films, magnetron sputtering becomes a very interesting method to prepare such multi-functional thin films. This paper focuses on influences of various deposition processes and deposition rate on the structures and properties of TiO2 thin films. Anatase, rutile or amorphous TiO2 films with various crystalline structures and different photocatalytic, optical and electrical properties can be produced by varying sputtering gases, substrate temperature, annealing process, deposition rate and the characteristics of magnetron sputtering. This may in turn affect the functions of TiO2 films in many applications. Furthermore, TiO2-based composites films can overcome many limitations and improve the properties of TiO2 films.
基金This work was supported by the National Natural Science Foundation of China(No,50376067)the Plan for Science&Technology Development of Guangzhou(2001-Z-117-01).
文摘TiO2 thin film has attracted considerable attention in recent years, due to its different refractive index and transparency with amorphous and different crysta ls in the visible and near-infrared wavelength region, high dielectric constant, wide band gap, high wear resistance and stability, etc, for which make it being used in many fields. This paper aims to investigate the optical characterizatio n of thin film TiO2 on silicon wafer. The TiO2 thin films were prepared by DC re active magnetron sputtering process from Ti target. The reflectivity of the film s was measured by UV-3101PC, and the index of refraction (n) and extinction coef ficient (k) were measured by n & k Analyzer 1200.
基金We are very grateful to the National Natural Science of Foundation of China(No.69978017,59802007)Shanghai Education Committee(No JW99-TJ-03)for their help and financial supports
文摘The microstructure properties of the sol-gel derived TiO2 films were studied by the atomic force microscopy (AFM). The films were prepared by dip coating process. The optical properties of the films were explained on the basis of the microstructure of the films.
文摘Ag TiO 2 thin films were prepared on glasses.The morphology and structure of Ag TiO 2 films were investigated by XRD, SEM and FT IR.The photocatalytic and hydrophilic properties of Ag TiO 2 thin films were also evaluated by examining photocatalytic degradation dichlorophos under sunlight illumination and the change of contact angle respectively.The research results show that the Ag TiO 2 thin film is mainly composed of 20-100nm Ag and TiO 2 particles.The Ag TiO 2 thin films possess a super hydrophilic ability and higher photocatalytic activity than that of pure TiO 2 thin film.
基金supported by the Regional Innovation Center for Environmental Technology of Thermal Plasma(ETTP) at Inha University, designated by MKE(2009)supported from the Central Laboratory of Kangwon National University
文摘TiO2 thin film was prepared on Si substrate by plasma chemical vapor deposition （PCVD） system and the morphologies of ZiO2 thin film were controlled by adjusting the initial precursor concentration. As the initial titanium tetra-isopropoxide （TTIP） concentration increases in PCVD reactor, the shapes of TiO2 particles generated in PCVD reactor change from the spherical small-sized particles around 20 nm and spherical large-sized particles around 60 nm to aggregate particles around 100 nm. The TiO2 particles with different shapes deposit on the substrate and become the main building blocks of resulting TiO2 thin film. We observed the TiO2 thin film with smooth morphology at low initial TTIP concentration, granular morphology at medium initial TTIP concentration, and columnar morphology at high initial TTIP concentration. It is proposed that we can prepare the TiO2 thin film with controlled morphologies in one-step process just by adjusting the initial precursor concentration in PCVD .
文摘Uniform crystalline TiO2 thin films were coated on silica glass fibers by liquid phase deposition from aqueous solution of ammonium hexafluorotitanate at low temperature. TiO2 thin films and nanopowders were prepared by adding H3BO3 into （NH4）2TiF6 solution supersaturated with anatase nano-crystalline TiO2 at 40 ℃. The effects of the deposition conditions on the surface morphology, section morphology, thickness of the deposited TiO2 thin films were investigated. The results indicate that the growth rate and particle size of the thin films were controlled by both the deposition conditions and the amount of anatase nano-crystalline TiO2.
基金Project supported by the Distinguished Youth Foundation of Hunan Province,China (Grant No. 03JJY1008)the Science Foundation for Post-doctorate of China,(Grant No. 2004035083)the Natural Science Foundation of Hunan Province,China(Grant No. 06JJ2034)
文摘This paper experimentally and theoretically investigates the effect of the underlayer medium on tuning of the surface plasmon resonance （SPR） wavelength of silver island films, and the effect of substrate temperature on the morphologies and optical properties of the films. From the absorption spectra of single Ag with various thickness and overcoated （Ag/TiO2） films deposited on glass substrates at various substrate temperatures by RF magnetron sputtering, we demonstrate that the surface plasmon resonance wavelength can be made tunable by changing the underlayer medium, the thickness of metal layer and the substrate temperature. By varying substrate temperatures, the interparticle coupling effects on plasmon resonances of nanosilver particles enhance as the spacing between the particles reduces. When the substrate temperature is up to 500 ℃, the absorption peak decreases sharply and shifts to shorter wavelength side due to the severe coalescence between silver islands in the film.
基金Supported by the National Natural Foundation of Science(11004052)the Foundation of Hubei Educational Committee (Q20101403)
文摘Transparent TiO2 thin films were successfully prepared on high purity silica substrates by DC reactive magnetron sputtering method and annealed at different temperatures. The effects of the annealing temperature （300-600 ℃） on crystalline structure, morphology, and photocatalytic activity of the TiO2 thin films were discussed. The photocatalytic activity of the films was evaluated by photodegradation of methylene blue solution. With increasing annealing temperature, the photocatalytic activity of the TiO2 thin films gradually increased because of the improvement of crystallization of anatase TiO2 thin films. At 500 ℃, the TiO2 thin film shows the highest photocatalytic activity due to the improvement of crystallization of anatase TiO2 thin films. When the annealing temperature increases to 600 ℃, the photocatalytic activity of thin film decreases owing to the formation of rutile phase and the decrease of surface area.
基金The project was supported by the National Key Basic Research Program of China(973)(2012CB720100)National Natural Science Foundation of China(20973124)~~
基金Deutsche Forschungsgemeinschaft (DFG), Germany (Grant number GR 1782/12)Science and Engineering Research Board (SERB), India (Grant number EMR/2015/001175)
文摘Laser induced periodic surface structures(LIPSS)represent a kind of top down approach to produce highly reproducible nano/microstructures without going for any sophisticated process of lithography.This method is much simpler and cost effective.In this work,LIPSS on Si surfaces were generated using femtosecond laser pulses of 800 nm wavelength.Photocatalytic substrates were prepared by depositing TiO2 thin films on top of the structured and unstructured Si wafer.The coatings were produced by sputtering from a Ti target in two different types of oxygen atmospheres.In first case,the oxygen pressure within the sputtering chamber was chosen to be high(3×10^–2 mbar)whereas it was one order of magnitude lower in second case(2.1×10^–3 mbar).In photocatalytic dye decomposition study of Methylene blue dye it was found that in the presence of LIPSS the activity can be enhanced by 2.1 and 3.3 times with high pressure and low pressure grown TiO2 thin films,respectively.The increase in photocatalytic activity is attributed to the enlargement of effective surface area.In comparative study,the dye decomposition rates of TiO2 thin films grown on LIPSS are found to be much higher than the value for standard reference thin film material Pilkington Activ^TM.
基金supported by the National Natural Science Foundation of China (Grant No 50872001)the Scientific Research Foundation of Edu-cation Commission of Anhui Province of China (Grant Nos KJ2009A006Z and KJ2007B132)the Doctor Scientific Research Starting Foundation of Anhui University of China, and the Foundation of Construction of Quality Project of Anhui University of China (Grant No XJ200907)
文摘Ag-TiO2 nanostructured thin films with silver volume fraction of 0–20% were deposited on silicon and quartz substrates by RF magnetron sputtering and annealed in ambient air at 950°C for 1 h. The phase structure and surface topography of the films were characterized by X-ray diffractometer and transmission electron microscope. Photocatalytic activity of the films was evaluated by light induced degradation of methyl orange (C14H14N3NaO3S) solution using a high pressure mercury lamp as lamp-house. The relation of photocatalytic activity and silver content was studied in detail. It was found that silver content influences phase structure of TiO2 thin films, and silver in the films is metallic Ag (Ag0). With increasing silver content from 0 to 20 vol%, photocatalytic activity of the films increases first and then decreases. A suitable amount (2.5–5 vol%) silver addition can significantly enhance the photocatalytic activity of TiO2 films. The enhanced photocatalytic activity was mainly attributed to the extension of visible light absorption region of the films, the presence of anatase phase, the increase of oxy-gen anion radicals O2? and reactive center of surface Ti3+, and the better separation between electrons and holes on the films surface.
基金Project supported by the Natural Science Foundation of Hebei Province(No.E2013202247)the Science and Technology Plan Project of Hebei Province(Nos.Z2010112,10213936)the Hebei Provincal Department of Education Fund(No.2011128)
文摘Abstract： Surface roughness by peaks and depressions on the surface of titanium dioxide （TiO2） thin film, which was widely used for an antireflection coating of optical systems, caused the extinction coefficient increase and affected the properties of optical system. Chemical mechanical polishing （CMP） is a very important method for surface smoothing. In this polishing experiment, we used self-formulated weakly alkaline slurry. Other process parameters were working pressure, slurry flow rate, head speed, and platen speed. In order to get the best surface roughness （1.16 A, the scanned area was 10 × 10 μm2） and a higher polishing rate （60.8 nm/min）, the optimal parameters were： pressure, 1 psi; slurry flow rate, 250 mL/min; polishing head speed, 80 rpm; platen speed, 87 rpm.
基金Project supported by the Natural Science Foundation of Hebei Province(No.E2013202247)the Science and Technology Plan Project of Hebei Province(Nos.Z2010112,10213936)the Hebei Province Department of Education Fund(No.2011128)
文摘A chemical mechanical polishing （CMP） process was selected to smooth TiO2 thin film surface and improve the removal rate. Meanwhile, the optimal process conditions were used in TiO2 thin film CME The effects of silica sols concentration, slurry pH, chelating agent and active agent concentration on surface roughness and material removal rate were investigated. Our experimental results indicated that we got lower surface roughness （1.26 A, the scanned area was 10 × 10 μm2） and higher polishing rate （65.6 nm/min）, the optimal parameters were： silica sols concentration 8.0%, pH value 9.0, active agent concentration 50 mL/L, chelating agent concentration 10 mL/L, respectively.
